NL7806765A - Elektrolyt en werkwijze voor het elektrolytisch bekle- den met glanzende metaalafzetsels. - Google Patents

Elektrolyt en werkwijze voor het elektrolytisch bekle- den met glanzende metaalafzetsels.

Info

Publication number
NL7806765A
NL7806765A NL7806765A NL7806765A NL7806765A NL 7806765 A NL7806765 A NL 7806765A NL 7806765 A NL7806765 A NL 7806765A NL 7806765 A NL7806765 A NL 7806765A NL 7806765 A NL7806765 A NL 7806765A
Authority
NL
Netherlands
Prior art keywords
electrolyte
electrolytic coating
metal deposits
glossy metal
glossy
Prior art date
Application number
NL7806765A
Other languages
English (en)
Original Assignee
Oxy Metal Industries Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oxy Metal Industries Corp filed Critical Oxy Metal Industries Corp
Publication of NL7806765A publication Critical patent/NL7806765A/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
NL7806765A 1977-10-03 1978-06-22 Elektrolyt en werkwijze voor het elektrolytisch bekle- den met glanzende metaalafzetsels. NL7806765A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/839,081 US4134802A (en) 1977-10-03 1977-10-03 Electrolyte and method for electrodepositing bright metal deposits

Publications (1)

Publication Number Publication Date
NL7806765A true NL7806765A (nl) 1979-04-05

Family

ID=25278806

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7806765A NL7806765A (nl) 1977-10-03 1978-06-22 Elektrolyt en werkwijze voor het elektrolytisch bekle- den met glanzende metaalafzetsels.

Country Status (7)

Country Link
US (1) US4134802A (nl)
JP (1) JPS5451933A (nl)
CA (1) CA1133417A (nl)
DE (1) DE2830572C2 (nl)
FR (1) FR2404682A1 (nl)
GB (1) GB2015031B (nl)
NL (1) NL7806765A (nl)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376685A (en) * 1981-06-24 1983-03-15 M&T Chemicals Inc. Acid copper electroplating baths containing brightening and leveling additives
GB2124637A (en) * 1982-08-03 1984-02-22 Bip Chemicals Ltd Polyethylene terephthalate moulding compositions
FR2534280A1 (fr) * 1982-10-11 1984-04-13 Inst Physikochimia Bain pour l'electrodeposition de revetements d'alliages brillants de nickel et de fer
US4434030A (en) 1982-11-12 1984-02-28 Institute Po Physikochimia Bath for the electrodeposition of bright nickel iron alloy
US5683568A (en) * 1996-03-29 1997-11-04 University Of Tulsa Electroplating bath for nickel-iron alloys and method
US6752584B2 (en) * 1996-07-15 2004-06-22 Semitool, Inc. Transfer devices for handling microelectronic workpieces within an environment of a processing machine and methods of manufacturing and using such devices in the processing of microelectronic workpieces
US6921467B2 (en) * 1996-07-15 2005-07-26 Semitool, Inc. Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpieces
US5972192A (en) * 1997-07-23 1999-10-26 Advanced Micro Devices, Inc. Pulse electroplating copper or copper alloys
US7244677B2 (en) 1998-02-04 2007-07-17 Semitool. Inc. Method for filling recessed micro-structures with metallization in the production of a microelectronic device
US6632292B1 (en) * 1998-03-13 2003-10-14 Semitool, Inc. Selective treatment of microelectronic workpiece surfaces
US6565729B2 (en) * 1998-03-20 2003-05-20 Semitool, Inc. Method for electrochemically depositing metal on a semiconductor workpiece
TW593731B (en) 1998-03-20 2004-06-21 Semitool Inc Apparatus for applying a metal structure to a workpiece
US6197181B1 (en) 1998-03-20 2001-03-06 Semitool, Inc. Apparatus and method for electrolytically depositing a metal on a microelectronic workpiece
US6497801B1 (en) * 1998-07-10 2002-12-24 Semitool Inc Electroplating apparatus with segmented anode array
US7351315B2 (en) 2003-12-05 2008-04-01 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7585398B2 (en) * 1999-04-13 2009-09-08 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7160421B2 (en) * 1999-04-13 2007-01-09 Semitool, Inc. Turning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7189318B2 (en) * 1999-04-13 2007-03-13 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7020537B2 (en) 1999-04-13 2006-03-28 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US6916412B2 (en) * 1999-04-13 2005-07-12 Semitool, Inc. Adaptable electrochemical processing chamber
US7351314B2 (en) 2003-12-05 2008-04-01 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7264698B2 (en) * 1999-04-13 2007-09-04 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US6368475B1 (en) * 2000-03-21 2002-04-09 Semitool, Inc. Apparatus for electrochemically processing a microelectronic workpiece
US20030038035A1 (en) * 2001-05-30 2003-02-27 Wilson Gregory J. Methods and systems for controlling current in electrochemical processing of microelectronic workpieces
US7438788B2 (en) * 1999-04-13 2008-10-21 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
CN1217034C (zh) * 1999-04-13 2005-08-31 塞米用具公司 具有改进的处理流体流的处理腔的工件处理装置
US20050183959A1 (en) * 2000-04-13 2005-08-25 Wilson Gregory J. Tuning electrodes used in a reactor for electrochemically processing a microelectric workpiece
AU2001259504A1 (en) * 2000-05-24 2001-12-03 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7102763B2 (en) * 2000-07-08 2006-09-05 Semitool, Inc. Methods and apparatus for processing microelectronic workpieces using metrology
AU2002343330A1 (en) 2001-08-31 2003-03-10 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US6893505B2 (en) * 2002-05-08 2005-05-17 Semitool, Inc. Apparatus and method for regulating fluid flows, such as flows of electrochemical processing fluids
US7025866B2 (en) * 2002-08-21 2006-04-11 Micron Technology, Inc. Microelectronic workpiece for electrochemical deposition processing and methods of manufacturing and using such microelectronic workpieces
US20040108212A1 (en) * 2002-12-06 2004-06-10 Lyndon Graham Apparatus and methods for transferring heat during chemical processing of microelectronic workpieces
US7407689B2 (en) * 2003-06-26 2008-08-05 Atotech Deutschland Gmbh Aqueous acidic immersion plating solutions and methods for plating on aluminum and aluminum alloys
JP2005029818A (ja) * 2003-07-09 2005-02-03 Ebara Corp めっき方法
US20050092611A1 (en) * 2003-11-03 2005-05-05 Semitool, Inc. Bath and method for high rate copper deposition
US20080264774A1 (en) * 2007-04-25 2008-10-30 Semitool, Inc. Method for electrochemically depositing metal onto a microelectronic workpiece
WO2011113908A1 (en) * 2010-03-18 2011-09-22 Basf Se Composition for metal electroplating comprising leveling agent
CN103160868A (zh) * 2011-12-17 2013-06-19 鞍钢重型机械有限责任公司 一种用于生产含硫活性镍的电解液及其使用方法
TWI580822B (zh) * 2012-04-19 2017-05-01 迪普索股份有限公司 銅－鎳合金電鍍浴及電鍍方法
CN109548405B (zh) * 2016-06-30 2021-11-16 Ppg工业俄亥俄公司 具有改进的凹坑控制的能电沉积的涂料组合物
CA3028754C (en) * 2016-06-30 2020-11-24 Ppg Industries Ohio, Inc. Electrodepositable coating composition having improved crater control
ES2893760T3 (es) * 2016-06-30 2022-02-10 Ppg Ind Ohio Inc Composición de recubrimiento electrodepositable con control de cráter mejorado

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE819404C (de) * 1949-04-17 1951-10-31 Bayer Ag Verfahren zur Herstellung wasserloeslicher, stickstoffhaltiger Kondensationsprodukte
CA1016488A (en) * 1974-04-01 1977-08-30 Oxy Metal Industries Corporation Electrodeposition of bright nickel-iron deposits
ZA75571B (en) * 1974-04-22 1976-01-28 Oxy Metal Industries Corp Composition for electrodeposition of metal deposits, its method of preparation and uses thereof
SE444822B (sv) * 1975-03-11 1986-05-12 Oxy Metal Industries Corp Bad och medel for elektrolytisk utfellning av koppar
FR2307060A1 (fr) * 1975-04-09 1976-11-05 Popescu Francine Zingage galvanique alcalin brillant

Also Published As

Publication number Publication date
GB2015031B (en) 1982-07-21
FR2404682B1 (nl) 1984-08-03
CA1133417A (en) 1982-10-12
US4134802A (en) 1979-01-16
JPS5451933A (en) 1979-04-24
GB2015031A (en) 1979-09-05
DE2830572C2 (de) 1982-11-04
DE2830572A1 (de) 1979-04-12
JPS5716198B2 (nl) 1982-04-03
FR2404682A1 (fr) 1979-04-27

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Legal Events

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BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
CNR Transfer of rights (patent application after its laying open for public inspection)

Free format text: HOOKER CHEMICALS & PLASTICS CORP. TE WARREN

DNT Communications of changes of names of applicants whose applications have been laid open to public inspection

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