NL7405307A - - Google Patents

Info

Publication number
NL7405307A
NL7405307A NL7405307A NL7405307A NL7405307A NL 7405307 A NL7405307 A NL 7405307A NL 7405307 A NL7405307 A NL 7405307A NL 7405307 A NL7405307 A NL 7405307A NL 7405307 A NL7405307 A NL 7405307A
Authority
NL
Netherlands
Application number
NL7405307A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7405307A publication Critical patent/NL7405307A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/20—Measuring radiation intensity with scintillation detectors
    • G01T1/202—Measuring radiation intensity with scintillation detectors the detector being a crystal
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Measurement Of Radiation (AREA)
NL7405307A 1973-04-24 1974-04-19 NL7405307A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00354039A US3842271A (en) 1973-04-24 1973-04-24 Scanning electron microscope

Publications (1)

Publication Number Publication Date
NL7405307A true NL7405307A (en) 1974-10-28

Family

ID=23391641

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7405307A NL7405307A (en) 1973-04-24 1974-04-19

Country Status (11)

Country Link
US (1) US3842271A (en)
JP (1) JPS5014273A (en)
AU (1) AU474023B2 (en)
CA (1) CA1006990A (en)
DD (1) DD113660A5 (en)
DE (1) DE2417319A1 (en)
FR (1) FR2227632B1 (en)
GB (1) GB1436278A (en)
IT (1) IT1004276B (en)
NL (1) NL7405307A (en)
SE (1) SE388721B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7902963A (en) * 1979-04-13 1980-10-15 Philips Nv DETECTOR FOR ELECTRON MICROSCOPE.
JPH0687410B2 (en) * 1986-08-01 1994-11-02 エレクトロ‐スキャン コーポレーション Scanning electron microscope and method of electron microscopically imaging the surface of a sample.
JPH0766766B2 (en) * 1989-03-30 1995-07-19 株式会社日立製作所 electronic microscope
DE69104082T2 (en) * 1990-02-23 1995-03-30 Ibm Multi-detector system for sample analysis using high-energy backscattered electrons.
WO2000079565A1 (en) * 1999-06-22 2000-12-28 Philips Electron Optics B.V. Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current
KR100917387B1 (en) * 2001-01-31 2009-09-17 하마마츠 포토닉스 가부시키가이샤 Electron beam detector, scanning type electron microscope, mass spectrometer, and ion detector
EP2088614B1 (en) * 2008-02-08 2010-12-15 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Beam current calibration system
US9190241B2 (en) 2013-03-25 2015-11-17 Hermes-Microvision, Inc. Charged particle beam apparatus
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US10393887B2 (en) * 2015-07-19 2019-08-27 Afo Research, Inc. Fluorine resistant, radiation resistant, and radiation detection glass systems

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3052637A (en) * 1961-06-05 1962-09-04 Adli M Bishay Glass composition and process of making
US3472997A (en) * 1966-08-26 1969-10-14 Us Navy Secondary electron collection system

Also Published As

Publication number Publication date
SE388721B (en) 1976-10-11
AU474023B2 (en) 1976-07-08
US3842271A (en) 1974-10-15
AU6763374A (en) 1975-10-09
CA1006990A (en) 1977-03-15
DD113660A5 (en) 1975-06-12
FR2227632B1 (en) 1978-03-31
JPS5014273A (en) 1975-02-14
IT1004276B (en) 1976-07-10
FR2227632A1 (en) 1974-11-22
GB1436278A (en) 1976-05-19
DE2417319A1 (en) 1974-11-07

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BV The patent application has lapsed