NL7314156A - - Google Patents

Info

Publication number
NL7314156A
NL7314156A NL7314156A NL7314156A NL7314156A NL 7314156 A NL7314156 A NL 7314156A NL 7314156 A NL7314156 A NL 7314156A NL 7314156 A NL7314156 A NL 7314156A NL 7314156 A NL7314156 A NL 7314156A
Authority
NL
Netherlands
Application number
NL7314156A
Other versions
NL158026B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7314156A publication Critical patent/NL7314156A/xx
Publication of NL158026B publication Critical patent/NL158026B/xx

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/40Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/202Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials for lift-off processes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
NL7314156.A 1972-10-16 1973-10-15 Werkwijze voor het vervaardigen van een geintegreerde halfgeleiderschakeling. NL158026B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47104283A JPS4960870A (https=) 1972-10-16 1972-10-16

Publications (2)

Publication Number Publication Date
NL7314156A true NL7314156A (https=) 1974-04-18
NL158026B NL158026B (nl) 1978-09-15

Family

ID=14376586

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7314156.A NL158026B (nl) 1972-10-16 1973-10-15 Werkwijze voor het vervaardigen van een geintegreerde halfgeleiderschakeling.

Country Status (7)

Country Link
US (1) US3945347A (https=)
JP (1) JPS4960870A (https=)
CA (1) CA989076A (https=)
DE (1) DE2351943B2 (https=)
FR (1) FR2203175B1 (https=)
GB (1) GB1418969A (https=)
NL (1) NL158026B (https=)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4096623A (en) * 1974-07-01 1978-06-27 Siemens Aktiengesellschaft Thyristor and method of producing the same
FR2284981A1 (fr) * 1974-09-10 1976-04-09 Radiotechnique Compelec Procede d'obtention d'un circuit integre semiconducteur
US3985597A (en) * 1975-05-01 1976-10-12 International Business Machines Corporation Process for forming passivated metal interconnection system with a planar surface
US4045594A (en) * 1975-12-31 1977-08-30 Ibm Corporation Planar insulation of conductive patterns by chemical vapor deposition and sputtering
FR2340620A1 (fr) * 1976-02-06 1977-09-02 Ibm Procede de fabrication d'un dispositif integre a grande echelle ayant une surface plane
US4035276A (en) * 1976-04-29 1977-07-12 Ibm Corporation Making coplanar layers of thin films
US4564997A (en) * 1981-04-21 1986-01-21 Nippon-Telegraph And Telephone Public Corporation Semiconductor device and manufacturing process thereof
JPS57176746A (en) * 1981-04-21 1982-10-30 Nippon Telegr & Teleph Corp <Ntt> Semiconductor integrated circuit and manufacture thereof
US4392298A (en) * 1981-07-27 1983-07-12 Bell Telephone Laboratories, Incorporated Integrated circuit device connection process
US4440804A (en) * 1982-08-02 1984-04-03 Fairchild Camera & Instrument Corporation Lift-off process for fabricating self-aligned contacts
JPS5982746A (ja) * 1982-11-04 1984-05-12 Toshiba Corp 半導体装置の電極配線方法
US4631806A (en) * 1985-05-22 1986-12-30 Gte Laboratories Incorporated Method of producing integrated circuit structures
JPH02125422A (ja) * 1988-11-02 1990-05-14 Nec Corp 半導体装置の製造方法
KR0121106B1 (ko) * 1994-02-15 1997-11-10 김주용 반도체 소자의 금속배선 형성방법
US5854128A (en) 1996-04-29 1998-12-29 Micron Technology, Inc. Method for reducing capacitive coupling between conductive lines
TW350099B (en) * 1998-01-26 1999-01-11 United Microelectronics Corp IC microfilm process
DE10208728B4 (de) * 2002-02-28 2009-05-07 Advanced Micro Devices, Inc., Sunnyvale Ein Verfahren zur Herstellung eines Halbleiterelements mit unterschiedlichen Metallsilizidbereichen

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU38614A1 (https=) * 1959-05-06
US3160534A (en) * 1960-10-03 1964-12-08 Gen Telephone & Elect Method of making tunnel diodes
US3266127A (en) * 1964-01-27 1966-08-16 Ibm Method of forming contacts on semiconductors
NL132313C (https=) * 1964-12-17 1900-01-01
US3498833A (en) * 1966-07-08 1970-03-03 Fairchild Camera Instr Co Double masking technique for integrated circuit
US3840982A (en) * 1966-12-28 1974-10-15 Westinghouse Electric Corp Contacts for semiconductor devices, particularly integrated circuits, and methods of making the same
GB1286737A (en) * 1969-10-15 1972-08-23 Itt Multilevel conductive systems
GB1363815A (en) * 1971-12-06 1974-08-21 Tektronix Inc Semiconductor device and method of producing same
US3747200A (en) * 1972-03-31 1973-07-24 Motorola Inc Integrated circuit fabrication method

Also Published As

Publication number Publication date
CA989076A (en) 1976-05-11
DE2351943A1 (de) 1974-05-02
GB1418969A (en) 1975-12-24
US3945347A (en) 1976-03-23
NL158026B (nl) 1978-09-15
DE2351943B2 (de) 1980-08-07
JPS4960870A (https=) 1974-06-13
FR2203175A1 (https=) 1974-05-10
FR2203175B1 (https=) 1977-09-23

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee
NL80 Information provided on patent owner name for an already discontinued patent

Owner name: MATSUS ELEC