NL7215272A - - Google Patents

Info

Publication number
NL7215272A
NL7215272A NL7215272A NL7215272A NL7215272A NL 7215272 A NL7215272 A NL 7215272A NL 7215272 A NL7215272 A NL 7215272A NL 7215272 A NL7215272 A NL 7215272A NL 7215272 A NL7215272 A NL 7215272A
Authority
NL
Netherlands
Application number
NL7215272A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7215272A publication Critical patent/NL7215272A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
NL7215272A 1972-02-03 1972-11-10 NL7215272A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22308272A 1972-02-03 1972-02-03

Publications (1)

Publication Number Publication Date
NL7215272A true NL7215272A (fr) 1973-08-07

Family

ID=22834951

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7215272A NL7215272A (fr) 1972-02-03 1972-11-10

Country Status (8)

Country Link
JP (1) JPS4887904A (fr)
BE (1) BE791212A (fr)
CA (1) CA981507A (fr)
DE (1) DE2259180A1 (fr)
FR (1) FR2171724A5 (fr)
GB (1) GB1387350A (fr)
IT (1) IT972853B (fr)
NL (1) NL7215272A (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228370B2 (fr) * 1972-03-06 1977-07-26
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
DE3038605A1 (de) * 1980-10-13 1982-06-03 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von reliefkopien
JPS5890636A (ja) * 1981-11-24 1983-05-30 Fuji Photo Film Co Ltd 光重合性組成物を用いた感光材料による画像形成方法および現像ユニツト
US4389482A (en) * 1981-12-14 1983-06-21 International Business Machines Corporation Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
DE3731333A1 (de) * 1987-09-15 1989-03-30 Schering Ag Verfahren zur herstellung von leiternetzwerken
JPH1026834A (ja) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd 画像形成方法
US11581187B2 (en) * 2018-12-20 2023-02-14 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Method of heating SOC film on wafer by electromagnetic wave generator and heating apparatus using the same

Also Published As

Publication number Publication date
DE2259180A1 (de) 1973-08-09
FR2171724A5 (fr) 1973-09-21
BE791212A (fr) 1973-03-01
GB1387350A (en) 1975-03-19
JPS4887904A (fr) 1973-11-19
IT972853B (it) 1974-05-31
CA981507A (en) 1976-01-13

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Legal Events

Date Code Title Description
BV The patent application has lapsed