NL7205052A - - Google Patents

Info

Publication number
NL7205052A
NL7205052A NL7205052A NL7205052A NL7205052A NL 7205052 A NL7205052 A NL 7205052A NL 7205052 A NL7205052 A NL 7205052A NL 7205052 A NL7205052 A NL 7205052A NL 7205052 A NL7205052 A NL 7205052A
Authority
NL
Netherlands
Application number
NL7205052A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7205052A publication Critical patent/NL7205052A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4803Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
    • H01L21/4807Ceramic parts
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Power Engineering (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Insulating Materials (AREA)
  • Laminated Bodies (AREA)
NL7205052A 1971-04-16 1972-04-14 NL7205052A (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13466571A 1971-04-16 1971-04-16

Publications (1)

Publication Number Publication Date
NL7205052A true NL7205052A (en:Method) 1972-10-18

Family

ID=22464389

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7205052A NL7205052A (en:Method) 1971-04-16 1972-04-14

Country Status (11)

Country Link
US (1) US3791861A (en:Method)
JP (1) JPS5143570B1 (en:Method)
BE (1) BE782119A (en:Method)
CA (1) CA929280A (en:Method)
CH (1) CH584960A5 (en:Method)
DE (1) DE2217573C3 (en:Method)
FR (1) FR2133777B1 (en:Method)
GB (1) GB1389326A (en:Method)
IT (1) IT954427B (en:Method)
NL (1) NL7205052A (en:Method)
SE (1) SE378972B (en:Method)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2727364A1 (de) * 1977-06-16 1979-01-04 Siemens Ag Verfahren zur herstellung von keramiksubstraten
US5011568A (en) * 1990-06-11 1991-04-30 Iowa State University Research Foundation, Inc. Use of sol-gel derived tantalum oxide as a protective coating for etching silicon
US5425909A (en) * 1992-07-20 1995-06-20 Industrial Technology Research Institute Heat treatment for particle reinforced alumina ceramic composite
US5856235A (en) * 1995-04-12 1999-01-05 Northrop Grumman Corporation Process of vacuum annealing a thin film metallization on high purity alumina
US5691004A (en) * 1996-07-11 1997-11-25 Ford Global Technologies, Inc. Method of treating light metal cylinder bore walls to receive thermal sprayed metal coatings
JPH10167859A (ja) * 1996-12-05 1998-06-23 Ngk Insulators Ltd セラミックス部品およびその製造方法
US6641939B1 (en) 1998-07-01 2003-11-04 The Morgan Crucible Company Plc Transition metal oxide doped alumina and methods of making and using
KR102105639B1 (ko) * 2019-03-28 2020-04-28 주식회사 엘지화학 면역 검사 장치 및 면역 검사 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2885310A (en) * 1954-09-13 1959-05-05 Ohmite Mfg Company Method and apparatus for making film resistors
US2901381A (en) * 1956-10-12 1959-08-25 Bell Telephone Labor Inc Method of making electrical resistors
US3032397A (en) * 1957-01-25 1962-05-01 Du Pont Preparation of metal nitride pigment flakes
US3212918A (en) * 1962-05-28 1965-10-19 Ibm Electroless plating process
GB1247007A (en) * 1968-04-04 1971-09-22 Atomic Energy Authority Uk Improvements in or relating to electroless plating processes
JPS502607B1 (en:Method) * 1968-08-10 1975-01-28

Also Published As

Publication number Publication date
JPS4743969A (en:Method) 1972-12-20
DE2217573B2 (de) 1974-02-14
CA929280A (en) 1973-06-26
SE378972B (en:Method) 1975-09-15
IT954427B (it) 1973-08-30
DE2217573A1 (de) 1972-11-02
DE2217573C3 (de) 1978-03-09
FR2133777A1 (en:Method) 1972-12-01
CH584960A5 (en:Method) 1977-02-15
JPS5143570B1 (en:Method) 1976-11-22
BE782119A (fr) 1972-07-31
FR2133777B1 (en:Method) 1974-12-20
GB1389326A (en) 1975-04-03
US3791861A (en) 1974-02-12

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Legal Events

Date Code Title Description
BV The patent application has lapsed