BE782119A - Procede de fabrication de circuits en couche mince - Google Patents
Procede de fabrication de circuits en couche minceInfo
- Publication number
- BE782119A BE782119A BE782119A BE782119A BE782119A BE 782119 A BE782119 A BE 782119A BE 782119 A BE782119 A BE 782119A BE 782119 A BE782119 A BE 782119A BE 782119 A BE782119 A BE 782119A
- Authority
- BE
- Belgium
- Prior art keywords
- manufacturing process
- thin layer
- layer circuits
- circuits manufacturing
- thin
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
- H01L21/4807—Ceramic parts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13466571A | 1971-04-16 | 1971-04-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE782119A true BE782119A (fr) | 1972-07-31 |
Family
ID=22464389
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE782119A BE782119A (fr) | 1971-04-16 | 1972-04-14 | Procede de fabrication de circuits en couche mince |
Country Status (11)
Country | Link |
---|---|
US (1) | US3791861A (fr) |
JP (1) | JPS5143570B1 (fr) |
BE (1) | BE782119A (fr) |
CA (1) | CA929280A (fr) |
CH (1) | CH584960A5 (fr) |
DE (1) | DE2217573C3 (fr) |
FR (1) | FR2133777B1 (fr) |
GB (1) | GB1389326A (fr) |
IT (1) | IT954427B (fr) |
NL (1) | NL7205052A (fr) |
SE (1) | SE378972B (fr) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2727364A1 (de) * | 1977-06-16 | 1979-01-04 | Siemens Ag | Verfahren zur herstellung von keramiksubstraten |
US5011568A (en) * | 1990-06-11 | 1991-04-30 | Iowa State University Research Foundation, Inc. | Use of sol-gel derived tantalum oxide as a protective coating for etching silicon |
US5425909A (en) * | 1992-07-20 | 1995-06-20 | Industrial Technology Research Institute | Heat treatment for particle reinforced alumina ceramic composite |
US5856235A (en) * | 1995-04-12 | 1999-01-05 | Northrop Grumman Corporation | Process of vacuum annealing a thin film metallization on high purity alumina |
US5691004A (en) * | 1996-07-11 | 1997-11-25 | Ford Global Technologies, Inc. | Method of treating light metal cylinder bore walls to receive thermal sprayed metal coatings |
JPH10167859A (ja) * | 1996-12-05 | 1998-06-23 | Ngk Insulators Ltd | セラミックス部品およびその製造方法 |
US6641939B1 (en) | 1998-07-01 | 2003-11-04 | The Morgan Crucible Company Plc | Transition metal oxide doped alumina and methods of making and using |
KR102105639B1 (ko) * | 2019-03-28 | 2020-04-28 | 주식회사 엘지화학 | 면역 검사 장치 및 면역 검사 방법 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2885310A (en) * | 1954-09-13 | 1959-05-05 | Ohmite Mfg Company | Method and apparatus for making film resistors |
US2901381A (en) * | 1956-10-12 | 1959-08-25 | Bell Telephone Labor Inc | Method of making electrical resistors |
US3032397A (en) * | 1957-01-25 | 1962-05-01 | Du Pont | Preparation of metal nitride pigment flakes |
US3212918A (en) * | 1962-05-28 | 1965-10-19 | Ibm | Electroless plating process |
GB1247007A (en) * | 1968-04-04 | 1971-09-22 | Atomic Energy Authority Uk | Improvements in or relating to electroless plating processes |
JPS502607B1 (fr) * | 1968-08-10 | 1975-01-28 |
-
1971
- 1971-04-16 US US00134665A patent/US3791861A/en not_active Expired - Lifetime
- 1971-12-14 CA CA130111A patent/CA929280A/en not_active Expired
-
1972
- 1972-04-07 SE SE7204532A patent/SE378972B/xx unknown
- 1972-04-12 IT IT49558/72A patent/IT954427B/it active
- 1972-04-12 GB GB1680972A patent/GB1389326A/en not_active Expired
- 1972-04-12 DE DE2217573A patent/DE2217573C3/de not_active Expired
- 1972-04-14 FR FR7213279A patent/FR2133777B1/fr not_active Expired
- 1972-04-14 NL NL7205052A patent/NL7205052A/xx not_active Application Discontinuation
- 1972-04-14 BE BE782119A patent/BE782119A/fr unknown
- 1972-04-14 CH CH550772A patent/CH584960A5/xx not_active IP Right Cessation
- 1972-04-17 JP JP47037859A patent/JPS5143570B1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2133777B1 (fr) | 1974-12-20 |
US3791861A (en) | 1974-02-12 |
DE2217573B2 (de) | 1974-02-14 |
NL7205052A (fr) | 1972-10-18 |
GB1389326A (en) | 1975-04-03 |
JPS4743969A (fr) | 1972-12-20 |
JPS5143570B1 (fr) | 1976-11-22 |
DE2217573A1 (de) | 1972-11-02 |
CH584960A5 (fr) | 1977-02-15 |
CA929280A (en) | 1973-06-26 |
FR2133777A1 (fr) | 1972-12-01 |
SE378972B (fr) | 1975-09-15 |
DE2217573C3 (de) | 1978-03-09 |
IT954427B (it) | 1973-08-30 |
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