NL7204863A - - Google Patents

Info

Publication number
NL7204863A
NL7204863A NL7204863A NL7204863A NL7204863A NL 7204863 A NL7204863 A NL 7204863A NL 7204863 A NL7204863 A NL 7204863A NL 7204863 A NL7204863 A NL 7204863A NL 7204863 A NL7204863 A NL 7204863A
Authority
NL
Netherlands
Application number
NL7204863A
Other versions
NL155979B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7204863A publication Critical patent/NL7204863A/xx
Publication of NL155979B publication Critical patent/NL155979B/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
NL7204863.A 1971-04-12 1972-04-12 Elektronenkanon van het veldemissie-type. NL155979B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2233871A JPS5323663B1 (enrdf_load_stackoverflow) 1971-04-12 1971-04-12

Publications (2)

Publication Number Publication Date
NL7204863A true NL7204863A (enrdf_load_stackoverflow) 1972-10-16
NL155979B NL155979B (nl) 1978-02-15

Family

ID=12079897

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7204863.A NL155979B (nl) 1971-04-12 1972-04-12 Elektronenkanon van het veldemissie-type.

Country Status (4)

Country Link
US (1) US3786268A (enrdf_load_stackoverflow)
JP (1) JPS5323663B1 (enrdf_load_stackoverflow)
DE (1) DE2217660A1 (enrdf_load_stackoverflow)
NL (1) NL155979B (enrdf_load_stackoverflow)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5420828B2 (enrdf_load_stackoverflow) * 1972-06-09 1979-07-25
DE2851743C2 (de) * 1978-11-30 1980-08-28 Kernforschungsanlage Juelich Gmbh, 5170 Juelich ElektronenstoBspektrometer
JPS57191950A (en) * 1981-05-22 1982-11-25 Hitachi Ltd Charged-particle source
EP0255542A1 (en) * 1986-02-03 1988-02-10 CREWE, Albert V. Electron beam memory system with ultra-compact, high current density electron gun
US4760567A (en) * 1986-08-11 1988-07-26 Electron Beam Memories Electron beam memory system with ultra-compact, high current density electron gun
US4740705A (en) * 1986-08-11 1988-04-26 Electron Beam Memories Axially compact field emission cathode assembly
JP3131339B2 (ja) * 1993-12-22 2001-01-31 三菱電機株式会社 陰極、陰極線管および陰極線管の作動方法
US5848118A (en) * 1997-06-19 1998-12-08 Lear Corporation Method and apparatus for detecting inhomogeneities in seat assemblies
FR2792770A1 (fr) 1999-04-22 2000-10-27 Cit Alcatel Fonctionnement a haute pression d'une cathode froide a emission de champ
EP1760761B1 (en) * 2005-09-05 2017-10-18 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam emitting device and method for operating a charged particle beam emitting device
DE112009001537B8 (de) 2008-06-20 2019-01-24 Hitachi High-Technologies Corporation Vorrichtung mit geladenem Teilchenstrahl und Verfahren zum Steuern der Vorrichtung
US8188451B1 (en) 2008-09-24 2012-05-29 Kla-Tencor Corporation Electron generation and delivery system for contamination sensitive emitters
EP2365511B1 (en) * 2010-03-10 2013-05-08 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Feedback loop for emitter flash cleaning
JP6345273B2 (ja) 2014-12-26 2018-06-20 株式会社日立ハイテクノロジーズ 複合荷電粒子線装置およびその制御方法
JP6762635B1 (ja) * 2020-04-16 2020-09-30 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ 電子銃、電子線適用装置、および、電子ビームの射出方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1246744A (en) * 1969-01-02 1971-09-15 Graham Stuart Plows Electron beam apparatus

Also Published As

Publication number Publication date
NL155979B (nl) 1978-02-15
DE2217660A1 (de) 1972-11-16
JPS5323663B1 (enrdf_load_stackoverflow) 1978-07-15
US3786268A (en) 1974-01-15

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Legal Events

Date Code Title Description
NL80 Information provided on patent owner name for an already discontinued patent

Owner name: HITACHI

V4 Discontinued because of reaching the maximum lifetime of a patent