NL7106221A - - Google Patents
Info
- Publication number
- NL7106221A NL7106221A NL7106221A NL7106221A NL7106221A NL 7106221 A NL7106221 A NL 7106221A NL 7106221 A NL7106221 A NL 7106221A NL 7106221 A NL7106221 A NL 7106221A NL 7106221 A NL7106221 A NL 7106221A
- Authority
- NL
- Netherlands
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
- G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH199871A CH537987A (de) | 1971-02-10 | 1971-02-10 | Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7106221A true NL7106221A (OSRAM) | 1972-08-14 |
Family
ID=4223501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7106221A NL7106221A (OSRAM) | 1971-02-10 | 1971-05-06 |
Country Status (5)
| Country | Link |
|---|---|
| CH (1) | CH537987A (OSRAM) |
| DE (1) | DE2204333A1 (OSRAM) |
| FR (1) | FR2126761A5 (OSRAM) |
| GB (1) | GB1315647A (OSRAM) |
| NL (1) | NL7106221A (OSRAM) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH644722A5 (de) * | 1980-07-21 | 1984-08-15 | Balzers Hochvakuum | Schwingquarzmesskopf. |
| JP4210261B2 (ja) | 2002-10-25 | 2009-01-14 | サントル ドゥ ルシェルシュ ピュブリク − ガブリエル リップマン | 分析目的で超高真空下で中性セシウムをインサイチュ堆積するための方法および装置 |
| CN108027348A (zh) * | 2015-09-21 | 2018-05-11 | 应用材料公司 | 用于测量沉积速率的测量组件及用于其的方法 |
| KR20180067463A (ko) * | 2016-10-25 | 2018-06-20 | 어플라이드 머티어리얼스, 인코포레이티드 | 증착 레이트를 측정하기 위한 측정 조립체, 증발 소스, 증착 장치, 및 이를 위한 방법 |
-
1971
- 1971-02-10 CH CH199871A patent/CH537987A/de not_active IP Right Cessation
- 1971-05-06 NL NL7106221A patent/NL7106221A/xx unknown
-
1972
- 1972-01-31 DE DE19722204333 patent/DE2204333A1/de active Pending
- 1972-02-04 GB GB529372A patent/GB1315647A/en not_active Expired
- 1972-02-08 FR FR7204062A patent/FR2126761A5/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1315647A (en) | 1973-05-02 |
| FR2126761A5 (OSRAM) | 1972-10-06 |
| DE2204333A1 (de) | 1972-08-17 |
| CH537987A (de) | 1973-06-15 |