CH537987A - Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten - Google Patents
Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen SchichtenInfo
- Publication number
- CH537987A CH537987A CH199871A CH199871A CH537987A CH 537987 A CH537987 A CH 537987A CH 199871 A CH199871 A CH 199871A CH 199871 A CH199871 A CH 199871A CH 537987 A CH537987 A CH 537987A
- Authority
- CH
- Switzerland
- Prior art keywords
- thin layers
- during vacuum
- vapor deposition
- monitoring vapor
- vacuum deposition
- Prior art date
Links
- 238000012544 monitoring process Methods 0.000 title 1
- 238000001771 vacuum deposition Methods 0.000 title 1
- 238000007740 vapor deposition Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
- G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH199871A CH537987A (de) | 1971-02-10 | 1971-02-10 | Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten |
| NL7106221A NL7106221A (OSRAM) | 1971-02-10 | 1971-05-06 | |
| DE19722204333 DE2204333A1 (de) | 1971-02-10 | 1972-01-31 | Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten |
| GB529372A GB1315647A (en) | 1971-02-10 | 1972-02-04 | Deposition from the vapour phase in vacuo of layers |
| FR7204062A FR2126761A5 (OSRAM) | 1971-02-10 | 1972-02-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH199871A CH537987A (de) | 1971-02-10 | 1971-02-10 | Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH537987A true CH537987A (de) | 1973-06-15 |
Family
ID=4223501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH199871A CH537987A (de) | 1971-02-10 | 1971-02-10 | Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten |
Country Status (5)
| Country | Link |
|---|---|
| CH (1) | CH537987A (OSRAM) |
| DE (1) | DE2204333A1 (OSRAM) |
| FR (1) | FR2126761A5 (OSRAM) |
| GB (1) | GB1315647A (OSRAM) |
| NL (1) | NL7106221A (OSRAM) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH644722A5 (de) * | 1980-07-21 | 1984-08-15 | Balzers Hochvakuum | Schwingquarzmesskopf. |
| JP4210261B2 (ja) | 2002-10-25 | 2009-01-14 | サントル ドゥ ルシェルシュ ピュブリク − ガブリエル リップマン | 分析目的で超高真空下で中性セシウムをインサイチュ堆積するための方法および装置 |
| CN108027348A (zh) * | 2015-09-21 | 2018-05-11 | 应用材料公司 | 用于测量沉积速率的测量组件及用于其的方法 |
| KR20180067463A (ko) * | 2016-10-25 | 2018-06-20 | 어플라이드 머티어리얼스, 인코포레이티드 | 증착 레이트를 측정하기 위한 측정 조립체, 증발 소스, 증착 장치, 및 이를 위한 방법 |
-
1971
- 1971-02-10 CH CH199871A patent/CH537987A/de not_active IP Right Cessation
- 1971-05-06 NL NL7106221A patent/NL7106221A/xx unknown
-
1972
- 1972-01-31 DE DE19722204333 patent/DE2204333A1/de active Pending
- 1972-02-04 GB GB529372A patent/GB1315647A/en not_active Expired
- 1972-02-08 FR FR7204062A patent/FR2126761A5/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1315647A (en) | 1973-05-02 |
| FR2126761A5 (OSRAM) | 1972-10-06 |
| DE2204333A1 (de) | 1972-08-17 |
| NL7106221A (OSRAM) | 1972-08-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |