NL7007310A - - Google Patents
Info
- Publication number
- NL7007310A NL7007310A NL7007310A NL7007310A NL7007310A NL 7007310 A NL7007310 A NL 7007310A NL 7007310 A NL7007310 A NL 7007310A NL 7007310 A NL7007310 A NL 7007310A NL 7007310 A NL7007310 A NL 7007310A
- Authority
- NL
- Netherlands
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US83633469A | 1969-06-25 | 1969-06-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7007310A true NL7007310A (cg-RX-API-DMAC10.html) | 1970-12-29 |
Family
ID=25271741
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7007310A NL7007310A (cg-RX-API-DMAC10.html) | 1969-06-25 | 1970-05-20 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3563202A (cg-RX-API-DMAC10.html) |
| DE (1) | DE2030688A1 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2052433A5 (cg-RX-API-DMAC10.html) |
| NL (1) | NL7007310A (cg-RX-API-DMAC10.html) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3908585A (en) * | 1974-04-25 | 1975-09-30 | Goodyear Tire & Rubber | Apparatus using super-heated vapor for drying solvent-treated tire cord fabric |
| US4023523A (en) * | 1975-04-23 | 1977-05-17 | Xerox Corporation | Coater hardware and method for obtaining uniform photoconductive layers on a xerographic photoreceptor |
| DE2916080C2 (de) * | 1979-04-20 | 1984-12-06 | Kišinevskij Gosudarstvennyj universitet imeni V.I. Lenina, Kišinev | Verfahren zum Molekular-Aufdampfen von Halbleiterschichten und Vorrichtung zur Durchführung dieses Verfahrens |
| CA1219547A (en) * | 1983-04-04 | 1987-03-24 | Prem Nath | Apparatus for and method of continuously depositing a highly conductive, highly transmissive film |
| DE3530106A1 (de) * | 1985-08-23 | 1987-02-26 | Kempten Elektroschmelz Gmbh | Aufdampfgut zum aufdampfen anorganischer verbindungen mittels einer photonen-erzeugenden strahlungsheizquelle in kontinuierlich betriebenen vakuumbedampfungsanlagen |
| US4776299A (en) * | 1986-05-15 | 1988-10-11 | The United States Of America As Represented By The United States Department Of Energy | Source replenishment device for vacuum deposition |
| FR2611746B1 (fr) * | 1987-03-06 | 1989-06-30 | Centre Nat Etd Spatiales | Dispositif d'evaporation sous vide d'un metal en continu |
| JP2612602B2 (ja) * | 1987-12-17 | 1997-05-21 | 東洋インキ製造 株式会社 | 連続蒸着フィルムの製造方法および装置 |
| DE4016225C2 (de) * | 1990-05-19 | 1997-08-14 | Leybold Ag | Reihenverdampfer für Vakuumbedampfungsanlagen |
| DE4027034C1 (cg-RX-API-DMAC10.html) * | 1990-08-27 | 1991-09-12 | Leybold Ag, 6450 Hanau, De | |
| US5716206A (en) * | 1995-01-05 | 1998-02-10 | Sumitomo Wiring Systems, Ltd. | Apparatus for heating a wire connection or connector |
| JP4906018B2 (ja) * | 2001-03-12 | 2012-03-28 | 株式会社半導体エネルギー研究所 | 成膜方法、発光装置の作製方法及び成膜装置 |
| DE102004047938B4 (de) * | 2004-10-01 | 2008-10-23 | Leybold Optics Gmbh | Vorrichtung für die Verdampferbeschichtung eines bandförmigen Substrates |
| KR101071605B1 (ko) * | 2006-05-19 | 2011-10-10 | 가부시키가이샤 알박 | 유기 증착 재료용 증착 장치, 유기 박막의 제조 방법 |
| US8236601B2 (en) | 2010-07-02 | 2012-08-07 | Primestar Solar, Inc. | Apparatus and methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device |
| US8241938B2 (en) | 2010-07-02 | 2012-08-14 | Primestar Solar, Inc. | Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device |
| US20120090544A1 (en) * | 2010-10-18 | 2012-04-19 | Kim Mu-Gyeom | Thin film deposition apparatus for continuous deposition, and mask unit and crucible unit included in thin film deposition apparatus |
| KR101785562B1 (ko) * | 2010-10-18 | 2017-10-18 | 삼성디스플레이 주식회사 | 연속 증착이 가능한 박막 증착 장치 및 그 박막 증착 장치에 사용되는 마스크유닛과 도가니유닛 |
| TWI425105B (zh) * | 2011-09-20 | 2014-02-01 | Ind Tech Res Inst | 蒸鍍裝置以及蒸鍍機台 |
| US8673777B2 (en) * | 2011-09-30 | 2014-03-18 | First Solar, Inc. | In-line deposition system and process for deposition of a thin film layer |
| JP6595421B2 (ja) * | 2016-08-24 | 2019-10-23 | 東芝メモリ株式会社 | 気化システム |
-
1969
- 1969-06-25 US US836334A patent/US3563202A/en not_active Expired - Lifetime
-
1970
- 1970-05-20 NL NL7007310A patent/NL7007310A/xx unknown
- 1970-05-26 FR FR7019119A patent/FR2052433A5/fr not_active Expired
- 1970-06-22 DE DE19702030688 patent/DE2030688A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE2030688A1 (de) | 1971-01-14 |
| FR2052433A5 (cg-RX-API-DMAC10.html) | 1971-04-09 |
| US3563202A (en) | 1971-02-16 |