NL6917915A - - Google Patents

Info

Publication number
NL6917915A
NL6917915A NL6917915A NL6917915A NL6917915A NL 6917915 A NL6917915 A NL 6917915A NL 6917915 A NL6917915 A NL 6917915A NL 6917915 A NL6917915 A NL 6917915A NL 6917915 A NL6917915 A NL 6917915A
Authority
NL
Netherlands
Application number
NL6917915A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6917915A publication Critical patent/NL6917915A/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/49—Adaptable interconnections, e.g. fuses or antifuses
    • H10W20/491—Antifuses, i.e. interconnections changeable from non-conductive to conductive
    • H10W20/492—Antifuses, i.e. interconnections changeable from non-conductive to conductive changeable by the use of an external beam, e.g. laser beam or ion beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/93—Ternary or quaternary semiconductor comprised of elements from three different groups, e.g. I-III-V
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/934—Sheet resistance, i.e. dopant parameters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
NL6917915A 1968-11-29 1969-11-28 NL6917915A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US77967468A 1968-11-29 1968-11-29

Publications (1)

Publication Number Publication Date
NL6917915A true NL6917915A (https=) 1970-06-02

Family

ID=25117159

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6917915A NL6917915A (https=) 1968-11-29 1969-11-28

Country Status (8)

Country Link
US (1) US3634927A (https=)
BE (1) BE742303A (https=)
CH (1) CH505474A (https=)
DE (1) DE1959438C3 (https=)
FR (1) FR2024592A1 (https=)
GB (1) GB1297924A (https=)
NL (1) NL6917915A (https=)
SE (1) SE365095B (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3827073A (en) * 1969-05-01 1974-07-30 Texas Instruments Inc Gated bilateral switching semiconductor device
JPS5130437B1 (https=) * 1970-03-25 1976-09-01
US3721838A (en) * 1970-12-21 1973-03-20 Ibm Repairable semiconductor circuit element and method of manufacture
FR2137184B1 (https=) * 1971-05-14 1976-03-19 Commissariat Energie Atomique
US3740620A (en) * 1971-06-22 1973-06-19 Ibm Storage system having heterojunction-homojunction devices
US3818252A (en) * 1971-12-20 1974-06-18 Hitachi Ltd Universal logical integrated circuit
US3795977A (en) * 1971-12-30 1974-03-12 Ibm Methods for fabricating bistable resistors
US3801910A (en) * 1972-07-03 1974-04-02 Ibm Externally accessing mechanical difficult to access circuit nodes using photo-responsive conductors in integrated circuits
US3864715A (en) * 1972-12-22 1975-02-04 Du Pont Diode array-forming electrical element
US3913216A (en) * 1973-06-20 1975-10-21 Signetics Corp Method for fabricating a precision aligned semiconductor array
US4159461A (en) * 1977-11-22 1979-06-26 Stackpole Components Co. Resistor network having horizontal geometry
US4240094A (en) * 1978-03-20 1980-12-16 Harris Corporation Laser-configured logic array
US4296424A (en) * 1978-03-27 1981-10-20 Asahi Kasei Kogyo Kabushiki Kaisha Compound semiconductor device having a semiconductor-converted conductive region
DE2824308A1 (de) * 1978-06-02 1979-12-13 Siemens Ag Verfahren zum einpraegen einer spannung mit einem elektronenstrahl
US4803528A (en) * 1980-07-28 1989-02-07 General Electric Company Insulating film having electrically conducting portions
DE3032306A1 (de) * 1980-08-27 1982-04-08 Siemens AG, 1000 Berlin und 8000 München Monolithisch integrierte schaltung mit zu- und/oder abschaltbaren schaltungsteilen
US4479088A (en) * 1981-01-16 1984-10-23 Burroughs Corporation Wafer including test lead connected to ground for testing networks thereon
EP0075454B1 (en) * 1981-09-18 1987-11-25 Fujitsu Limited Semiconductor device having new conductive interconnection structure and method for manufacturing the same
FR2522200A1 (fr) * 1982-02-23 1983-08-26 Centre Nat Rech Scient Microcircuits et procede de fabrication, notamment pour technologie a effet josephson
FR2535887A1 (fr) * 1982-11-04 1984-05-11 Thomson Csf Procede de fabrication d'une structure logique integree programmee selon une configuration preetablie fixe
GB8512532D0 (en) * 1985-05-17 1985-06-19 Pa Consulting Services Electrical circuit interconnection
US5367208A (en) * 1986-09-19 1994-11-22 Actel Corporation Reconfigurable programmable interconnect architecture
GB2212978A (en) * 1987-11-30 1989-08-02 Plessey Co Plc An integrated circuit having a patch array
JPH01184942A (ja) * 1988-01-20 1989-07-24 Toshiba Corp トリミング素子とその電気短絡方法
US4916514A (en) * 1988-05-31 1990-04-10 Unisys Corporation Integrated circuit employing dummy conductors for planarity
US5502315A (en) * 1989-09-07 1996-03-26 Quicklogic Corporation Electrically programmable interconnect structure having a PECVD amorphous silicon element
US5989943A (en) * 1989-09-07 1999-11-23 Quicklogic Corporation Method for fabrication of programmable interconnect structure
JPH1154301A (ja) * 1997-08-07 1999-02-26 Murata Mfg Co Ltd チップ型サーミスタ
TW492103B (en) 2000-06-02 2002-06-21 Koninkl Philips Electronics Nv Electronic device, and method of patterning a first layer
US8049299B2 (en) * 2009-02-25 2011-11-01 Freescale Semiconductor, Inc. Antifuses with curved breakdown regions

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3077578A (en) * 1958-06-27 1963-02-12 Massachusetts Inst Technology Semiconductor switching matrix
DE1215754B (de) * 1964-02-24 1966-05-05 Danfoss As Elektronischer Schalter
US3390012A (en) * 1964-05-14 1968-06-25 Texas Instruments Inc Method of making dielectric bodies having conducting portions
US3423646A (en) * 1965-02-01 1969-01-21 Sperry Rand Corp Computer logic device consisting of an array of tunneling diodes,isolators and short circuits
US3549432A (en) * 1968-07-15 1970-12-22 Texas Instruments Inc Multilayer microelectronic circuitry techniques

Also Published As

Publication number Publication date
DE1959438C3 (de) 1975-10-23
BE742303A (https=) 1970-05-04
DE1959438A1 (de) 1970-06-18
GB1297924A (https=) 1972-11-29
DE1959438B2 (de) 1975-03-06
FR2024592A1 (https=) 1970-08-28
SE365095B (https=) 1974-03-11
CH505474A (de) 1971-03-31
US3634927A (en) 1972-01-18

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