NL6807439A - - Google Patents

Info

Publication number
NL6807439A
NL6807439A NL6807439A NL6807439A NL6807439A NL 6807439 A NL6807439 A NL 6807439A NL 6807439 A NL6807439 A NL 6807439A NL 6807439 A NL6807439 A NL 6807439A NL 6807439 A NL6807439 A NL 6807439A
Authority
NL
Netherlands
Application number
NL6807439A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL6807439A priority Critical patent/NL6807439A/xx
Priority to GB26485/69A priority patent/GB1269156A/en
Priority to US827510A priority patent/US3638231A/en
Priority to CA052646A priority patent/CA921548A/en
Priority to DE19691926849 priority patent/DE1926849A1/de
Publication of NL6807439A publication Critical patent/NL6807439A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H01J2237/1514—Prisms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S101/00—Printing
    • Y10S101/37—Printing employing electrostatic force
NL6807439A 1968-05-27 1968-05-27 NL6807439A (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
NL6807439A NL6807439A (de) 1968-05-27 1968-05-27
GB26485/69A GB1269156A (en) 1968-05-27 1969-05-23 Electron beam apparatus for recording image elements
US827510A US3638231A (en) 1968-05-27 1969-05-26 Device for recording with electron rays
CA052646A CA921548A (en) 1968-05-27 1969-05-27 Device for recording with electron rays
DE19691926849 DE1926849A1 (de) 1968-05-27 1969-05-27 Vorrichtung zur Registrierung mit Elektronenstrahlen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6807439A NL6807439A (de) 1968-05-27 1968-05-27

Publications (1)

Publication Number Publication Date
NL6807439A true NL6807439A (de) 1969-12-01

Family

ID=19803740

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6807439A NL6807439A (de) 1968-05-27 1968-05-27

Country Status (5)

Country Link
US (1) US3638231A (de)
CA (1) CA921548A (de)
DE (1) DE1926849A1 (de)
GB (1) GB1269156A (de)
NL (1) NL6807439A (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1301030B (de) * 1967-10-19 1969-08-14 Hakle Werke Hans Klenk Halter fuer Papierrollen
US4041532A (en) * 1971-04-28 1977-08-09 Decca Limited Of Decca House Method of recording wide-band signals on a thermoplastic film by use of a beam of electrons
US3750189A (en) * 1971-10-18 1973-07-31 Ibm Light scanning and printing system
DE2241850C3 (de) * 1972-08-25 1978-06-29 European Rotogravure Association, 8000 Muenchen Verfahren zur Herstellung von Druckformen mittels eines Energiestrahles
US4000440A (en) * 1974-07-26 1976-12-28 International Business Machines Corporation Method and apparatus for controlling brightness and alignment of a beam of charged particles
JPS5129091A (ja) * 1974-09-06 1976-03-11 Kogyo Gijutsuin Pataankeiseisochi
US4010318A (en) * 1975-05-20 1977-03-01 Rca Corporation Probe forming electron optical column having means for examining magnified image of the probe source
US3956635A (en) * 1975-06-13 1976-05-11 International Business Machines Corporation Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
US4393312A (en) * 1976-02-05 1983-07-12 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
GB1523033A (en) * 1976-03-03 1978-08-31 Crosfield Electronics Ltd Image reproducing systems
JPS52126760U (de) * 1976-03-24 1977-09-27
JPS52122083A (en) * 1976-04-02 1977-10-13 Jeol Ltd Electron beam exposing device
NL177578C (nl) * 1976-05-14 1985-10-16 Thomson Csf Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel.
JPS6051261B2 (ja) * 1976-05-26 1985-11-13 株式会社東芝 荷電粒子ビ−ム描画装置
JPS52151568A (en) * 1976-06-11 1977-12-16 Jeol Ltd Electron beam exposure apparatus
DE2627632A1 (de) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung
FR2361190A1 (fr) * 1976-08-09 1978-03-10 Zeiss Carl Fa Procede et dispositif d'usinage a froid par faisceau electronique
JPS5625233Y2 (de) * 1976-09-01 1981-06-15
JPS6040186B2 (ja) * 1976-11-04 1985-09-10 富士通株式会社 磁場形成装置
CA1166766A (en) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Method and apparatus for forming a variable size electron beam
FR2412939A1 (fr) * 1977-12-23 1979-07-20 Anvar Implanteur d'ions a fort courant
US4277685A (en) * 1978-06-12 1981-07-07 Ohio-Nuclear, Inc. Adjustable collimator
JPS54101982U (de) * 1978-10-12 1979-07-18
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
DE2947444C2 (de) * 1979-11-24 1983-12-08 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Elektronenstrahl-Gravierverfahren
WO1982001787A1 (en) * 1980-11-22 1982-05-27 Grieger Dieter Method for engraving by means of an electron beam
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker
DE3138896A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen
NL8602196A (nl) * 1986-08-29 1988-03-16 Philips Nv Geladen deeltjes bestralingsapparaat met optisch vervormbaar bundel begrenzend diafragma.
GB8911392D0 (en) * 1989-05-18 1989-07-05 Humphreys Colin J Fabrication of electronic devices
WO2011071015A1 (ja) * 2009-12-11 2011-06-16 株式会社日立製作所 電子線バイプリズム装置および電子線装置
EP2365514B1 (de) * 2010-03-10 2015-08-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Doppelstrahlige Ladungsträgerstrahlsäule und Betriebsverfahren dafür

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3118050A (en) * 1960-04-06 1964-01-14 Alloyd Electronics Corp Electron beam devices and processes
US3113896A (en) * 1961-01-31 1963-12-10 Space Technology Lab Inc Electron beam masking for etching electrical circuits
DE1301209B (de) * 1964-07-24 1969-08-14 Steigerwald Strahltech Verfahren zum Abtragen, insbesondere zum Perforieren von flexiblen Kunststoffen
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns

Also Published As

Publication number Publication date
CA921548A (en) 1973-02-20
US3638231A (en) 1972-01-25
DE1926849A1 (de) 1969-12-11
GB1269156A (en) 1972-04-06

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