NL6700219A - - Google Patents

Info

Publication number
NL6700219A
NL6700219A NL6700219A NL6700219A NL6700219A NL 6700219 A NL6700219 A NL 6700219A NL 6700219 A NL6700219 A NL 6700219A NL 6700219 A NL6700219 A NL 6700219A NL 6700219 A NL6700219 A NL 6700219A
Authority
NL
Netherlands
Application number
NL6700219A
Other versions
NL154062B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6700219A publication Critical patent/NL6700219A/xx
Publication of NL154062B publication Critical patent/NL154062B/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/762Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76297Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/051Etching
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/085Isolated-integrated
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/928Front and rear surface processing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/977Thinning or removal of substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)
  • Weting (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Recrystallisation Techniques (AREA)
NL676700219A 1966-01-12 1967-01-06 Werkwijze voor het vervaardigen van een geintegreerde halfgeleiderschakeling, alsmede geintegreerde halfgeleiderschakeling, vervaardigd met deze werkwijze. NL154062B (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US520245A US3357871A (en) 1966-01-12 1966-01-12 Method for fabricating integrated circuits
US522278A US3419956A (en) 1966-01-12 1966-01-21 Technique for obtaining isolated integrated circuits

Publications (2)

Publication Number Publication Date
NL6700219A true NL6700219A (xx) 1967-07-13
NL154062B NL154062B (nl) 1977-07-15

Family

ID=27060085

Family Applications (2)

Application Number Title Priority Date Filing Date
NL676700219A NL154062B (nl) 1966-01-12 1967-01-06 Werkwijze voor het vervaardigen van een geintegreerde halfgeleiderschakeling, alsmede geintegreerde halfgeleiderschakeling, vervaardigd met deze werkwijze.
NL676700993A NL154060B (nl) 1966-01-12 1967-01-20 Werkwijze voor het vervaardigen van een geintegreerde halfgeleiderschakeling met elektrische isolatie.

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL676700993A NL154060B (nl) 1966-01-12 1967-01-20 Werkwijze voor het vervaardigen van een geintegreerde halfgeleiderschakeling met elektrische isolatie.

Country Status (8)

Country Link
US (2) US3357871A (xx)
BE (2) BE691802A (xx)
CH (2) CH451325A (xx)
DE (2) DE1589918B2 (xx)
FR (2) FR1509408A (xx)
GB (2) GB1137577A (xx)
NL (2) NL154062B (xx)
SE (1) SE326504B (xx)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5696402A (en) * 1965-09-28 1997-12-09 Li; Chou H. Integrated circuit device
US3440498A (en) * 1966-03-14 1969-04-22 Nat Semiconductor Corp Contacts for insulation isolated semiconductor integrated circuitry
US3471922A (en) * 1966-06-02 1969-10-14 Raytheon Co Monolithic integrated circuitry with dielectric isolated functional regions
US3575740A (en) * 1967-06-08 1971-04-20 Ibm Method of fabricating planar dielectric isolated integrated circuits
US3460007A (en) * 1967-07-03 1969-08-05 Rca Corp Semiconductor junction device
US3753803A (en) * 1968-12-06 1973-08-21 Hitachi Ltd Method of dividing semiconductor layer into a plurality of isolated regions
US3844858A (en) * 1968-12-31 1974-10-29 Texas Instruments Inc Process for controlling the thickness of a thin layer of semiconductor material and semiconductor substrate
US3755012A (en) * 1971-03-19 1973-08-28 Motorola Inc Controlled anisotropic etching process for fabricating dielectrically isolated field effect transistor
US3969749A (en) * 1974-04-01 1976-07-13 Texas Instruments Incorporated Substrate for dielectric isolated integrated circuit with V-etched depth grooves for lapping guide
US3928094A (en) * 1975-01-16 1975-12-23 Fairchild Camera Instr Co Method of aligning a wafer beneath a mask and system therefor and wafer having a unique alignment pattern
JPS5351970A (en) * 1976-10-21 1978-05-11 Toshiba Corp Manufacture for semiconductor substrate
US4502913A (en) * 1982-06-30 1985-03-05 International Business Machines Corporation Total dielectric isolation for integrated circuits
AU2003234403A1 (en) * 2002-05-16 2003-12-02 Nova Research, Inc. Methods of fabricating magnetoresistive memory devices

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2967344A (en) * 1958-02-14 1961-01-10 Rca Corp Semiconductor devices
FR1217793A (fr) * 1958-12-09 1960-05-05 Perfectionnements à la fabrication des éléments semi-conducteurs
NL252131A (xx) * 1959-06-30
US3179543A (en) * 1961-03-30 1965-04-20 Philips Corp Method of manufacturing plates having funnel-shaped cavities or perforations obtained by etching
GB967002A (en) * 1961-05-05 1964-08-19 Standard Telephones Cables Ltd Improvements in or relating to semiconductor devices
US3290753A (en) * 1963-08-19 1966-12-13 Bell Telephone Labor Inc Method of making semiconductor integrated circuit elements

Also Published As

Publication number Publication date
NL6700993A (xx) 1967-07-24
DE1589918B2 (de) 1971-01-14
CH451326A (de) 1968-05-15
US3357871A (en) 1967-12-12
GB1096484A (en) 1967-12-29
SE326504B (xx) 1970-07-27
BE691802A (xx) 1967-05-29
GB1137577A (en) 1968-12-27
US3419956A (en) 1969-01-07
DE1589918A1 (de) 1970-06-04
FR1509408A (fr) 1968-01-12
FR1507802A (fr) 1967-12-29
NL154060B (nl) 1977-07-15
CH451325A (de) 1968-05-15
BE692869A (xx) 1967-07-03
NL154062B (nl) 1977-07-15
DE1589920B2 (de) 1971-02-18
DE1589920A1 (de) 1970-09-17

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee
NL80 Abbreviated name of patent owner mentioned of already nullified patent

Owner name: INTERNATIONAL