NL6602332A - - Google Patents

Info

Publication number
NL6602332A
NL6602332A NL6602332A NL6602332A NL6602332A NL 6602332 A NL6602332 A NL 6602332A NL 6602332 A NL6602332 A NL 6602332A NL 6602332 A NL6602332 A NL 6602332A NL 6602332 A NL6602332 A NL 6602332A
Authority
NL
Netherlands
Application number
NL6602332A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6602332A publication Critical patent/NL6602332A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4292—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof together with monocarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/52—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • C08L67/06—Unsaturated polyesters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
NL6602332A 1965-02-26 1966-02-23 NL6602332A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8480/65A GB1090142A (en) 1965-02-26 1965-02-26 Photochemical insolubilisation of polymers

Publications (1)

Publication Number Publication Date
NL6602332A true NL6602332A (xx) 1966-05-25

Family

ID=9853276

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6602332A NL6602332A (xx) 1965-02-26 1966-02-23

Country Status (5)

Country Link
US (1) US3427161A (xx)
BE (1) BE677091A (xx)
DE (1) DE1522359A1 (xx)
GB (1) GB1090142A (xx)
NL (1) NL6602332A (xx)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0014012A1 (en) * 1979-01-24 1980-08-06 Agfa-Gevaert N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer

Families Citing this family (109)

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GB1231183A (xx) * 1967-05-12 1971-05-12
US3537853A (en) * 1968-02-21 1970-11-03 Grace W R & Co Process of forming printing plates,including the step of subjecting the mounted transparency to a surface static electricity eliminator
US3645730A (en) * 1968-10-11 1972-02-29 Grace W R & Co Reproduction of images using light sensitive curable liquid polymers
US3560465A (en) * 1969-04-01 1971-02-02 Eastman Kodak Co Preparation of soluble poly(vinyl esters) from high molecular weight acid chlorides
US3650746A (en) * 1969-06-16 1972-03-21 Grace W R & Co Dual image formation on separate supports of photocurable composition
US3658528A (en) * 1969-09-22 1972-04-25 Itek Corp Photochemical figuring of optical elements
US3652272A (en) * 1969-10-31 1972-03-28 Lithoplate Inc Phenoxy photopolymer having no epoxy groups, and article made therefrom
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles
US4001016A (en) * 1971-05-25 1977-01-04 Agfa-Gevaert, A.G. Polymers which can be cross-linked by photopolymerization
GB1408265A (en) 1971-10-18 1975-10-01 Ici Ltd Photopolymerisable composition
USRE28789E (en) * 1972-01-25 1976-04-27 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing cyclic cis-α-dicarbonyl compounds and selected sensitizers
US3787212A (en) * 1972-08-04 1974-01-22 Monsanto Co Polymeric photosensitive compositions and methods using same
US4069123A (en) * 1972-10-24 1978-01-17 National Starch & Chemical Corporation Crosslinked pressure sensitive adhesive compositions
US3961961A (en) * 1972-11-20 1976-06-08 Minnesota Mining And Manufacturing Company Positive or negative developable photosensitive composition
US3847771A (en) * 1973-03-30 1974-11-12 Scm Corp Uv and laser curing of pigmented polymerizable binders
JPS5337902B2 (xx) * 1973-09-04 1978-10-12
US4017652A (en) * 1974-10-23 1977-04-12 Ppg Industries, Inc. Photocatalyst system and ultraviolet light curable coating compositions containing the same
JPS5276397A (en) * 1975-12-22 1977-06-27 Tokyo Ouka Kougiyou Kk Method of making aquaous sensitivs resin
US4070500A (en) * 1976-01-21 1978-01-24 Millmaster Onyx Corporation Radiation-curable compositions and method of coating therewith
JPS51134208A (en) * 1976-03-09 1976-11-20 Toyo Ink Mfg Co Composition of photosensitive coating
DE2625538C2 (de) * 1976-06-05 1984-03-22 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare Überzugsmassen
JPS5994B2 (ja) * 1976-09-14 1984-01-05 富士写真フイルム株式会社 感光性組成物
DE2730898C2 (de) * 1977-07-08 1986-01-16 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare Bindemittel
EP0002321B1 (en) 1977-11-29 1981-10-28 Bexford Limited Photopolymerisable elements and a process for the production of printing plates therefrom
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
ATE10502T1 (de) * 1980-11-05 1984-12-15 Akzo N.V. Photopolymerisierbare zusammensetzung, mischung von photoinitiatoren und haertungsverfahren.
US4460427A (en) * 1981-09-21 1984-07-17 E. I. Dupont De Nemours And Company Process for the preparation of flexible circuits
DE3144905A1 (de) * 1981-11-12 1983-05-19 Basf Ag, 6700 Ludwigshafen Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials
DE3322993A1 (de) * 1983-06-25 1985-01-03 Basf Ag, 6700 Ludwigshafen Verfahren zur acylierung von polyvinylalkoholen und so acylierte produkte enthaltende photopolymerisierbare und/oder photovernetzbare mischungen
DE3322994A1 (de) * 1983-06-25 1985-01-10 Basf Ag, 6700 Ludwigshafen Lichtempfindliches, wasserentwickelbares aufzeichnungsmaterial fuer die herstellung von druck-, reliefformen oder resistmustern
JPS6063532A (ja) * 1983-08-16 1985-04-11 Fuji Photo Film Co Ltd 光重合性組成物
US4592816A (en) 1984-09-26 1986-06-03 Rohm And Haas Company Electrophoretic deposition process
DE3681366D1 (de) 1985-07-31 1991-10-17 Du Pont Optische beschichtungszusammensetzung.
DE3541162A1 (de) * 1985-11-21 1987-05-27 Basf Ag Photoempfindliche aufzeichnungsmaterialien mit elastomeren pfropfcopolymerisat-bindemitteln sowie reliefformen daraus
DE3606155A1 (de) * 1986-02-26 1987-08-27 Basf Ag Photopolymerisierbares gemisch, dieses enthaltendes lichtempfindliches aufzeichnungselement sowie verfahren zur herstellung einer flachdruckform mittels dieses lichtempfindlichen aufzeichnungselements
US4828583A (en) * 1987-04-02 1989-05-09 Minnesota Mining And Manufacturing Company Coated abrasive binder containing ternary photoinitiator system
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
DE3717037A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717038A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717036A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717034A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien, sowie neue chinazolon-4-verbindungen
US5153323A (en) * 1988-09-07 1992-10-06 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a photoinitiator moiety
DE3843505A1 (de) * 1988-12-23 1990-07-05 Hoechst Ag Carbonsaeureester von hydroxylgruppenhaltigen pfropfpolymerisaten und verfahren zu ihrer herstellung
DE3924811A1 (de) * 1989-07-27 1991-01-31 Hoechst Ag Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial
DE69004245T2 (de) * 1990-02-23 1994-05-11 Minnesota Mining & Mfg Semi-thermoplastische Formmasse mit thermostabilem Formerinnerungsvermögen.
US5066231A (en) * 1990-02-23 1991-11-19 Minnesota Mining And Manufacturing Company Dental impression process using polycaprolactone molding composition
US5709548A (en) * 1990-02-23 1998-01-20 Minnesota Mining And Manufacturing Company Dental crown liner composition and methods of preparing provisional applications
DE4102173A1 (de) * 1991-01-25 1992-07-30 Basf Ag Lagerstabile loesung eines carboxylgruppenhaltigen copolymerisats sowie verfahren zur herstellung von photoempfindlichen lacken und offsetdruckplatten
US5683837A (en) * 1994-11-18 1997-11-04 Napp Systems, Inc. Water-soluble compositions for preparation of durable, high-resolution printing plates
US5874197A (en) * 1997-09-18 1999-02-23 E. I. Du Pont De Nemours And Company Thermal assisted photosensitive composition and method thereof
US7344970B2 (en) 2002-04-11 2008-03-18 Shipley Company, L.L.C. Plating method
US7303854B2 (en) * 2003-02-14 2007-12-04 E.I. Du Pont De Nemours And Company Electrode-forming composition for field emission type of display device, and method using such a composition
US20050037278A1 (en) * 2003-08-15 2005-02-17 Jun Koishikawa Photosensitive thick-film paste materials for forming light-transmitting electromagnetic shields, light-transmitting electromagnetic shields formed using the same, and method of manufacture thereof
US7105588B2 (en) * 2003-10-10 2006-09-12 E. I. Du Pont De Nemours And Company Screen printable hydrogel for medical applications
US7683107B2 (en) * 2004-02-09 2010-03-23 E.I. Du Pont De Nemours And Company Ink jet printable thick film compositions and processes
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US7569165B2 (en) * 2005-03-09 2009-08-04 E. I. Du Pont De Nemours And Company Black conductive compositions, black electrodes, and methods of forming thereof
US7579134B2 (en) * 2005-03-15 2009-08-25 E. I. Dupont De Nemours And Company Polyimide composite coverlays and methods and compositions relating thereto
US20060223690A1 (en) * 2005-04-01 2006-10-05 Tsutomu Mutoh Photosensitive thick-film dielectric paste composition and method for making an insulating layer using same
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JP2007012371A (ja) 2005-06-29 2007-01-18 E I Du Pont De Nemours & Co 導電組成物およびプラズマディスプレイの背面基板の製造方法
US20070023388A1 (en) * 2005-07-28 2007-02-01 Nair Kumaran M Conductor composition for use in LTCC photosensitive tape on substrate applications
US7291292B2 (en) * 2005-08-26 2007-11-06 E.I. Du Pont De Nemours And Company Preparation of silver particles using thermomorphic polymers
US20070059459A1 (en) * 2005-09-12 2007-03-15 Haixin Yang Ink jet printable hydrogel for sensor electrode applications
US7666328B2 (en) * 2005-11-22 2010-02-23 E. I. Du Pont De Nemours And Company Thick film conductor composition(s) and processing technology thereof for use in multilayer electronic circuits and devices
US7618766B2 (en) * 2005-12-21 2009-11-17 E. I. Du Pont De Nemours And Company Flame retardant photoimagable coverlay compositions and methods relating thereto
US7645564B2 (en) * 2006-03-03 2010-01-12 Haixin Yang Polymer solutions, aqueous developable thick film compositions, processes of making and electrodes formed thereof
US20070238036A1 (en) * 2006-03-22 2007-10-11 Keiichiro Hayakawa Dielectric, display equipped with dielectric, and method for manufacturing said dielectric
US7678457B2 (en) * 2006-03-23 2010-03-16 E.I. Du Pont De Nemours And Company Dielectric and display device having a dielectric and dielectric manufacturing method
US7678296B2 (en) * 2006-05-04 2010-03-16 E. I. Du Pont De Nemours And Company Black conductive thick film compositions, black electrodes, and methods of forming thereof
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US7608784B2 (en) * 2006-07-13 2009-10-27 E. I. Du Pont De Nemours And Company Photosensitive conductive paste for electrode formation and electrode
US7655864B2 (en) * 2006-07-13 2010-02-02 E.I Du Pont De Nemours And Company Photosensitive conductive paste for electrode formation and electrode
US7527915B2 (en) * 2006-07-19 2009-05-05 E. I. Du Pont De Nemours And Company Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto
JP5303127B2 (ja) * 2007-08-03 2013-10-02 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 黒色バス電極用導電組成物およびプラズマディスプレイパネルの前面板
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US7648655B2 (en) * 2007-10-30 2010-01-19 E. I. Du Pont De Nemours And Company Conductive composition for black bus electrode, and front panel of plasma display panel
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ES2969163T3 (es) 2021-02-11 2024-05-16 Xetos Ag Composición HOE fotopolimerizable
ES2959027T3 (es) 2021-02-11 2024-02-19 Xetos Ag Blanqueamiento mejorado
ES2963992T3 (es) 2021-02-11 2024-04-03 Xetos Ag Sistema 2K
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Publication number Priority date Publication date Assignee Title
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US2949361A (en) * 1956-08-13 1960-08-16 Gen Electric Photosensitive compositions
US3326710A (en) * 1964-04-16 1967-06-20 Sherwin Williams Co Method of curing polyester compositions and coatings containing synergistic combination of photosensitizers and compositions thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0014012A1 (en) * 1979-01-24 1980-08-06 Agfa-Gevaert N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer

Also Published As

Publication number Publication date
BE677091A (xx) 1966-07-18
DE1522359A1 (de) 1969-07-24
GB1090142A (en) 1967-11-08
US3427161A (en) 1969-02-11

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