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NL294370A
(browse.php)
*
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1963-06-20 |
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DE1224147B
(de)
*
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1963-08-23 |
1966-09-01 |
Kalle Ag |
Verfahren zur Umkehrentwicklung von Diazo-verbindungen enthaltenden Kopierschichten
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GB1052699A
(browse.php)
*
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1963-12-03 |
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CA774047A
(en)
*
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1963-12-09 |
1967-12-19 |
Shipley Company |
Light-sensitive material and process for the development thereof
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DE1471701A1
(de)
*
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1964-03-06 |
1969-02-20 |
Basf Ag |
Verfahren zum Herstellen von Druckformen
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GB1053866A
(browse.php)
*
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1964-08-05 |
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GB1143611A
(browse.php)
*
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1965-03-22 |
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GB1113759A
(en)
*
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1965-12-17 |
1968-05-15 |
Fuji Photo Film Co Ltd |
Lithographic printing plates
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NL136645C
(browse.php)
*
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1966-12-12 |
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US3647443A
(en)
*
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1969-09-12 |
1972-03-07 |
Eastman Kodak Co |
Light-sensitive quinone diazide polymers and polymer compositions
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US3666473A
(en)
*
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1970-10-06 |
1972-05-30 |
Ibm |
Positive photoresists for projection exposure
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US4052217A
(en)
*
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1971-11-09 |
1977-10-04 |
Howson-Algraphy Limited |
Bimetallic lithographic printing plates
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US3865595A
(en)
*
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1972-11-09 |
1975-02-11 |
Howson Algraphy Ltd |
Lithographic printing plates
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US4379827A
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*
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1971-12-08 |
1983-04-12 |
Energy Conversion Devices, Inc. |
Imaging structure with tellurium metal film and energy sensitive material thereon
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US3779778A
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1972-02-09 |
1973-12-18 |
Minnesota Mining & Mfg |
Photosolubilizable compositions and elements
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JPS5024641B2
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1972-10-17 |
1975-08-18 |
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US4012536A
(en)
*
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1972-12-14 |
1977-03-15 |
Rca Corporation |
Electron beam recording medium comprising 1-methylvinyl methyl ketone
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US4018937A
(en)
*
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1972-12-14 |
1977-04-19 |
Rca Corporation |
Electron beam recording comprising polymer of 1-methylvinyl methyl ketone
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US3772016A
(en)
*
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1973-01-30 |
1973-11-13 |
Ibm |
Method of producing multicolor planographic printing surface
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US3950173A
(en)
*
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1973-02-12 |
1976-04-13 |
Rca Corporation |
Electron beam recording article with o-quinone diazide compound
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US4036644A
(en)
*
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1973-03-16 |
1977-07-19 |
International Business Machines Corporation |
Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
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JPS5645127B2
(browse.php)
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1974-02-25 |
1981-10-24 |
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US3982943A
(en)
*
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1974-03-05 |
1976-09-28 |
Ibm Corporation |
Lift-off method of fabricating thin films and a structure utilizable as a lift-off mask
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US4168979A
(en)
*
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1974-03-19 |
1979-09-25 |
Fuji Photo Film Co., Ltd. |
Light-sensitive printing plate with matt overlayer
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JPS50125805A
(browse.php)
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1974-03-19 |
1975-10-03 |
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US4259430A
(en)
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1974-05-01 |
1981-03-31 |
International Business Machines Corporation |
Photoresist O-quinone diazide containing composition and resist mask formation process
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US4007047A
(en)
*
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1974-06-06 |
1977-02-08 |
International Business Machines Corporation |
Modified processing of positive photoresists
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US3958994A
(en)
*
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1974-08-26 |
1976-05-25 |
American Hoechst Corporation |
Photosensitive diazo steel lithoplate structure
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US3979212A
(en)
*
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1974-10-04 |
1976-09-07 |
Printing Developments, Inc. |
Laminated lithographic printing plate
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US4191573A
(en)
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1974-10-09 |
1980-03-04 |
Fuji Photo Film Co., Ltd. |
Photosensitive positive image forming process with two photo-sensitive layers
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US4189320A
(en)
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1975-04-29 |
1980-02-19 |
American Hoechst Corporation |
Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
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1975-05-24 |
1979-11-13 |
Tokyo Ohka Kogyo Kabushiki Kaisha |
Positive-type O-quinone diazide containing photoresist compositions
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US4125661A
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1976-03-19 |
1978-11-14 |
Mona Industries, Inc. |
Laminated plates for chemical milling
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US4040891A
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1976-06-30 |
1977-08-09 |
Ibm Corporation |
Etching process utilizing the same positive photoresist layer for two etching steps
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(en)
*
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1977-12-30 |
1980-07-08 |
International Business Machines Corporation |
Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask
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FR2417795A1
(fr)
*
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1978-02-15 |
1979-09-14 |
Rhone Poulenc Graphic |
Nouveau support de plaques lithographiques et procede de mise en oeuvre
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JPS5562444A
(en)
*
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1978-11-02 |
1980-05-10 |
Konishiroku Photo Ind Co Ltd |
Photosensitive composition
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1979-12-03 |
1981-08-18 |
International Business Machines Corporation |
Lithographic resist composition for a lift-off process
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1980-07-28 |
1982-06-01 |
Bell Telephone Laboratories, Incorporated |
Resist adhesion in integrated circuit processing
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1981-01-07 |
1984-02-14 |
Ovchinnikov Jury M |
Offset printing plate and process for making same
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JPS5858546A
(ja)
*
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1981-10-02 |
1983-04-07 |
Kimoto & Co Ltd |
製版用感光性マスク材料
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1982-04-20 |
1985-02-12 |
Japan Synthetic Rubber Co., Ltd. |
Positive type photosensitive resin composition with at least two o-quinone diazides
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DE3220816A1
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1982-06-03 |
1983-12-08 |
Merck Patent Gmbh, 6100 Darmstadt |
Lichtempfindliche komponenten fuer positiv arbeitende fotoresistmaterialien
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DE3323343A1
(de)
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1983-06-29 |
1985-01-10 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
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JPS6057339A
(ja)
*
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1983-09-08 |
1985-04-03 |
Sumitomo Chem Co Ltd |
ポジ型フォトレジスト組成物
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US4567132A
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1984-03-16 |
1986-01-28 |
International Business Machines Corporation |
Multi-level resist image reversal lithography process
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US4588670A
(en)
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1985-02-28 |
1986-05-13 |
American Hoechst Corporation |
Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist
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US4737437A
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1986-03-27 |
1988-04-12 |
East Shore Chemical Co. |
Light sensitive diazo compound, composition and method of making the composition
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1986-12-23 |
1992-07-07 |
Shipley Company Inc. |
Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
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1987-03-12 |
1993-01-26 |
Mitsubishi Kasei Corporation |
Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
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US4810619A
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1987-08-12 |
1989-03-07 |
General Electric Co. |
Photolithography over reflective substrates comprising a titanium nitride layer
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JPH07119374B2
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1987-11-06 |
1995-12-20 |
関西ペイント株式会社 |
ポジ型感光性カチオン電着塗料組成物
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1988-03-31 |
1991-02-26 |
Morton International, Inc. |
Method of forming resist pattern and thermally stable and highly resolved resist pattern
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EP0338102B1
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1988-04-19 |
1993-03-10 |
International Business Machines Corporation |
Verfahren zur Herstellung von integrierten Halbleiterstrukturen welche Feldeffekttransistoren mit Kanallängen im Submikrometerbereich enthalten
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US4943511A
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1988-08-05 |
1990-07-24 |
Morton Thiokol, Inc. |
High sensitivity mid and deep UV resist
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US4959293A
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1988-10-28 |
1990-09-25 |
J. T. Baker, Inc. |
Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents
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EP0369053B1
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1988-11-17 |
1994-03-02 |
International Business Machines Corporation |
Verfahren zur Herstellung von Masken mit Strukturen im Submikrometerbereich
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1991-08-30 |
1994-03-22 |
Ciba-Geigy Corp. |
Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive
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1997-01-23 |
2007-10-23 |
Sequenom, Inc. |
Systems and methods for preparing and analyzing low volume analyte array elements
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EP1332000B1
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2000-10-30 |
2012-06-20 |
Sequenom, Inc. |
Method for delivery of submicroliter volumes onto a substrate
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2007-09-17 |
2009-07-16 |
Sequenom, Inc. |
Integrated robotic sample transfer device
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