NL2023879A - Apparatus for and method of controlling introduction of euv target material into an euv chamber - Google Patents

Apparatus for and method of controlling introduction of euv target material into an euv chamber Download PDF

Info

Publication number
NL2023879A
NL2023879A NL2023879A NL2023879A NL2023879A NL 2023879 A NL2023879 A NL 2023879A NL 2023879 A NL2023879 A NL 2023879A NL 2023879 A NL2023879 A NL 2023879A NL 2023879 A NL2023879 A NL 2023879A
Authority
NL
Netherlands
Prior art keywords
euv
target material
chamber
controlling introduction
introduction
Prior art date
Application number
NL2023879A
Other languages
English (en)
Inventor
Wilhelmus Driessen Theodorus
Uwe Herbert Trees Dietmar
Romeo Estomih Mushi Simon
Andrew Sams Benjamin
Medina Oseguera Alfonso
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2023879A publication Critical patent/NL2023879A/nl

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/005—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state containing a metal as principal radiation generating component
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/006—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state details of the ejection system, e.g. constructional details of the nozzle

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)

Claims (1)

1. Een inrichting ingericht voor het belichten van een substraat.
NL2023879A 2018-09-26 2019-09-23 Apparatus for and method of controlling introduction of euv target material into an euv chamber NL2023879A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862736651P 2018-09-26 2018-09-26
US201962901340P 2019-09-17 2019-09-17

Publications (1)

Publication Number Publication Date
NL2023879A true NL2023879A (en) 2020-05-01

Family

ID=68172277

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2023879A NL2023879A (en) 2018-09-26 2019-09-23 Apparatus for and method of controlling introduction of euv target material into an euv chamber

Country Status (5)

Country Link
EP (1) EP3858114A1 (nl)
KR (1) KR20210063349A (nl)
CN (1) CN112772000A (nl)
NL (1) NL2023879A (nl)
WO (1) WO2020069001A1 (nl)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118476317A (zh) * 2021-12-29 2024-08-09 Asml荷兰有限公司 极紫外光源中的碎片减少

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7405416B2 (en) 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
DE102004037521B4 (de) * 2004-07-30 2011-02-10 Xtreme Technologies Gmbh Vorrichtung zur Bereitstellung von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
JP5156192B2 (ja) * 2006-01-24 2013-03-06 ギガフォトン株式会社 極端紫外光源装置
US8513629B2 (en) 2011-05-13 2013-08-20 Cymer, Llc Droplet generator with actuator induced nozzle cleaning
JP5001055B2 (ja) * 2007-04-20 2012-08-15 株式会社小松製作所 極端紫外光源装置
US7872245B2 (en) 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
DE102009020776B4 (de) * 2009-05-08 2011-07-28 XTREME technologies GmbH, 37077 Anordnung zur kontinuierlichen Erzeugung von flüssigem Zinn als Emittermaterial in EUV-Strahlungsquellen
US8263953B2 (en) * 2010-04-09 2012-09-11 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma EUV light source
JP6283684B2 (ja) * 2013-11-07 2018-02-21 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光生成装置の制御方法
US9338870B2 (en) * 2013-12-30 2016-05-10 Asml Netherlands B.V. Extreme ultraviolet light source
US9232623B2 (en) * 2014-01-22 2016-01-05 Asml Netherlands B.V. Extreme ultraviolet light source

Also Published As

Publication number Publication date
EP3858114A1 (en) 2021-08-04
WO2020069001A1 (en) 2020-04-02
CN112772000A (zh) 2021-05-07
KR20210063349A (ko) 2021-06-01

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