NL2023704A - A Level Sensor and a Lithographic Apparatus incorporating a Level Sensor - Google Patents

A Level Sensor and a Lithographic Apparatus incorporating a Level Sensor Download PDF

Info

Publication number
NL2023704A
NL2023704A NL2023704A NL2023704A NL2023704A NL 2023704 A NL2023704 A NL 2023704A NL 2023704 A NL2023704 A NL 2023704A NL 2023704 A NL2023704 A NL 2023704A NL 2023704 A NL2023704 A NL 2023704A
Authority
NL
Netherlands
Prior art keywords
measurement
temperature
sensor
gap
outlet
Prior art date
Application number
NL2023704A
Other languages
English (en)
Dutch (nl)
Inventor
Hendrikus Martinus Johannes Bloks Ruud
Gertrudis Cornelis Kunnen Johan
Harry Lyons Joseph
Srivastava Sudhir
Zaal Oxana
Original Assignee
Asml Netherlands Bv
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv, Asml Holding Nv filed Critical Asml Netherlands Bv
Publication of NL2023704A publication Critical patent/NL2023704A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B13/00—Measuring arrangements characterised by the use of fluids
    • G01B13/02—Measuring arrangements characterised by the use of fluids for measuring length, width or thickness
    • G01B13/06—Measuring arrangements characterised by the use of fluids for measuring length, width or thickness for measuring thickness
    • G01B13/065—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B13/00—Measuring arrangements characterised by the use of fluids
    • G01B13/12—Measuring arrangements characterised by the use of fluids for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL2023704A 2018-09-27 2019-08-26 A Level Sensor and a Lithographic Apparatus incorporating a Level Sensor NL2023704A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201862737557P 2018-09-27 2018-09-27

Publications (1)

Publication Number Publication Date
NL2023704A true NL2023704A (en) 2020-05-01

Family

ID=67770500

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2023704A NL2023704A (en) 2018-09-27 2019-08-26 A Level Sensor and a Lithographic Apparatus incorporating a Level Sensor

Country Status (5)

Country Link
JP (1) JP7093893B2 (ja)
CN (1) CN112771451B (ja)
NL (1) NL2023704A (ja)
TW (1) TWI720618B (ja)
WO (1) WO2020064240A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114088025B (zh) * 2022-01-14 2022-04-12 常州吴越纺织器材有限公司 多参数连续测试的钢筘性能测试装置及测试方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0371007A (ja) * 1989-08-11 1991-03-26 Hitachi Ltd エアマイクロ検出制御方法および制御機構
US7549521B2 (en) * 2001-02-15 2009-06-23 Integral Technologies, Inc. Low cost electrical power connectivity for railway systems manufactured from conductive loaded resin-based materials
US20070151327A1 (en) * 2005-12-29 2007-07-05 Asml Holding N.V. Gas gauge proximity sensor with internal gas flow control
JP5311724B2 (ja) * 2006-06-27 2013-10-09 日本空圧システム株式会社 位置確認装置
US7578168B2 (en) * 2007-06-27 2009-08-25 Asml Holding N.V. Increasing gas gauge pressure sensitivity using nozzle-face surface roughness
NL1036547A1 (nl) * 2008-02-20 2009-08-24 Asml Holding Nv Gas gauge compatible with vacuum environments.
US9529282B2 (en) * 2013-04-25 2016-12-27 Nikon Corporation Position-measurement systems
NL2016877A (en) * 2015-06-18 2016-12-22 Asml Holding Nv An apparatus including a gas gauge and method of operating the same
NL2016984A (en) * 2015-07-14 2017-01-19 Asml Netherlands Bv Patterning device cooling systems in a lithographic apparatus
CN108713167B (zh) * 2016-03-18 2021-04-02 Asml荷兰有限公司 光刻设备和器件制造方法

Also Published As

Publication number Publication date
TWI720618B (zh) 2021-03-01
CN112771451A (zh) 2021-05-07
WO2020064240A1 (en) 2020-04-02
JP2022501638A (ja) 2022-01-06
TW202035953A (zh) 2020-10-01
JP7093893B2 (ja) 2022-06-30
CN112771451B (zh) 2024-05-07

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