NL2006257A - Lithographic apparatus and device manufacturing method. - Google Patents

Lithographic apparatus and device manufacturing method. Download PDF

Info

Publication number
NL2006257A
NL2006257A NL2006257A NL2006257A NL2006257A NL 2006257 A NL2006257 A NL 2006257A NL 2006257 A NL2006257 A NL 2006257A NL 2006257 A NL2006257 A NL 2006257A NL 2006257 A NL2006257 A NL 2006257A
Authority
NL
Netherlands
Prior art keywords
substrate
radiation
lens
lithographic apparatus
individually controllable
Prior art date
Application number
NL2006257A
Other languages
English (en)
Dutch (nl)
Inventor
Johannes Onvlee
Albert Dekker
Erwin Zwet
Pieter Jager
Hendrik Man
Erik Fritz
Johannus Petrus Fransiscus Spierdijk
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2006257A publication Critical patent/NL2006257A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2006257A 2010-02-23 2011-02-18 Lithographic apparatus and device manufacturing method. NL2006257A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US30739710P 2010-02-23 2010-02-23
US30739710 2010-02-23
US36463410P 2010-07-15 2010-07-15
US36463410 2010-07-15

Publications (1)

Publication Number Publication Date
NL2006257A true NL2006257A (en) 2011-08-24

Family

ID=44210084

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2006257A NL2006257A (en) 2010-02-23 2011-02-18 Lithographic apparatus and device manufacturing method.

Country Status (6)

Country Link
JP (1) JP5584785B2 (zh)
KR (1) KR101496882B1 (zh)
CN (1) CN102844713B (zh)
NL (1) NL2006257A (zh)
TW (1) TWI427436B (zh)
WO (1) WO2011104175A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2009342A (en) * 2011-10-31 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2009902A (en) * 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5922838B2 (ja) * 2012-04-11 2016-05-24 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用の回転フレームおよび投影システム

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
DE59105735D1 (de) 1990-05-02 1995-07-20 Fraunhofer Ges Forschung Belichtungsvorrichtung.
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US5216247A (en) * 1992-02-07 1993-06-01 Ying Wang Optical scanning method with circular arc scanning traces
DE69711929T2 (de) 1997-01-29 2002-09-05 Micronic Laser Systems Ab Taeb Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
US6268613B1 (en) * 1999-03-02 2001-07-31 Phormax Corporation Multiple-head phosphor screen scanner
US20030091277A1 (en) * 2001-11-15 2003-05-15 Wenhui Mei Flattened laser scanning system
EP1321822A1 (en) * 2001-12-21 2003-06-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1745317A2 (en) * 2004-02-25 2007-01-24 Carl Zeiss SMT AG Housing comprising structure for mounting optical elements
US7081947B2 (en) * 2004-02-27 2006-07-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006104173A1 (ja) * 2005-03-28 2006-10-05 Fujifilm Corporation 光量調整方法、画像記録方法及び装置
JP2007041239A (ja) * 2005-08-02 2007-02-15 Fujifilm Corp カラーフィルタの製造方法、及びカラーフィルタ並びに液晶表示装置
US7626181B2 (en) * 2005-12-09 2009-12-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4885029B2 (ja) * 2007-03-28 2012-02-29 株式会社オーク製作所 露光描画装置
CN201083959Y (zh) * 2007-05-23 2008-07-09 芯硕半导体（合肥）有限公司 综合式直写光刻装置
US7768627B2 (en) * 2007-06-14 2010-08-03 Asml Netherlands B.V. Illumination of a patterning device based on interference for use in a maskless lithography system

Also Published As

Publication number Publication date
JP2013520816A (ja) 2013-06-06
JP5584785B2 (ja) 2014-09-03
KR101496882B1 (ko) 2015-03-02
WO2011104175A1 (en) 2011-09-01
TWI427436B (zh) 2014-02-21
KR20120123708A (ko) 2012-11-09
CN102844713B (zh) 2016-04-20
TW201142535A (en) 2011-12-01
CN102844713A (zh) 2012-12-26

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Legal Events

Date Code Title Description
WDAP Patent application withdrawn

Effective date: 20111110