NL2003207A1 - Optical element mount for lithographic apparatus. - Google Patents

Optical element mount for lithographic apparatus. Download PDF

Info

Publication number
NL2003207A1
NL2003207A1 NL2003207A NL2003207A NL2003207A1 NL 2003207 A1 NL2003207 A1 NL 2003207A1 NL 2003207 A NL2003207 A NL 2003207A NL 2003207 A NL2003207 A NL 2003207A NL 2003207 A1 NL2003207 A1 NL 2003207A1
Authority
NL
Netherlands
Prior art keywords
optical element
lithographic apparatus
element mount
mount
lithographic
Prior art date
Application number
NL2003207A
Other languages
English (en)
Inventor
Henricus Tegenbosch
Alexander Struycken
Jacob Kleijn
Ruud Beerens
Ivo Vanderh
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2003207A1 publication Critical patent/NL2003207A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
NL2003207A 2008-07-21 2009-07-16 Optical element mount for lithographic apparatus. NL2003207A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12981308P 2008-07-21 2008-07-21

Publications (1)

Publication Number Publication Date
NL2003207A1 true NL2003207A1 (nl) 2010-01-22

Family

ID=41272452

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2003207A NL2003207A1 (nl) 2008-07-21 2009-07-16 Optical element mount for lithographic apparatus.

Country Status (7)

Country Link
US (1) US9335641B2 (nl)
JP (2) JP2011528859A (nl)
KR (1) KR101639229B1 (nl)
CN (1) CN102099745B (nl)
NL (1) NL2003207A1 (nl)
TW (1) TWI453526B (nl)
WO (1) WO2010010034A1 (nl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9392679B2 (en) * 2014-12-05 2016-07-12 Globalfoundries Inc. Method, apparatus and system for using free-electron laser compatible EUV beam for semiconductor wafer processing
KR20180025928A (ko) * 2015-07-06 2018-03-09 비브 헬스케어 유케이 (넘버5) 리미티드 인간 면역결핍 바이러스 복제의 억제제로서 피리딘-3-일 아세트산 유도체

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19904152A1 (de) * 1999-02-03 2000-08-10 Zeiss Carl Fa Baugruppe aus einem optischen Element und einer Fassung
US6239924B1 (en) * 1999-08-31 2001-05-29 Nikon Corporation Kinematic lens mounting with distributed support and radial flexure
US7410265B2 (en) * 2000-09-13 2008-08-12 Carl Zeiss Smt Ag Focusing-device for the radiation from a light source
DE10123725A1 (de) * 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
WO2003014833A2 (de) * 2001-08-10 2003-02-20 Carl Zeiss Smt Ag Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen
CN1461974A (zh) * 2002-05-31 2003-12-17 Asml荷兰有限公司 组装光学元件套件和方法，光学元件，平版印刷机和器件制造法
US20030234918A1 (en) * 2002-06-20 2003-12-25 Nikon Corporation Adjustable soft mounts in kinematic lens mounting system
JP3944095B2 (ja) * 2003-02-26 2007-07-11 キヤノン株式会社 保持装置
US7604359B2 (en) * 2004-05-04 2009-10-20 Carl Zeiss Smt Ag High positioning reproducible low torque mirror-actuator interface
US7372549B2 (en) 2005-06-24 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
WO2010010034A1 (en) 2010-01-28
JP2014241411A (ja) 2014-12-25
CN102099745A (zh) 2011-06-15
US9335641B2 (en) 2016-05-10
KR20110031292A (ko) 2011-03-25
JP5793222B2 (ja) 2015-10-14
TW201009486A (en) 2010-03-01
KR101639229B1 (ko) 2016-07-13
US20110205517A1 (en) 2011-08-25
CN102099745B (zh) 2014-08-20
JP2011528859A (ja) 2011-11-24
TWI453526B (zh) 2014-09-21

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Legal Events

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AD1A A request for search or an international type search has been filed
WDAP Patent application withdrawn

Effective date: 20100319