NL191587C - Werkwijze voor het vervaardigen van een geïntegreerde-keten-inrichting. - Google Patents
Werkwijze voor het vervaardigen van een geïntegreerde-keten-inrichting.Info
- Publication number
- NL191587C NL191587C NL8104741A NL8104741A NL191587C NL 191587 C NL191587 C NL 191587C NL 8104741 A NL8104741 A NL 8104741A NL 8104741 A NL8104741 A NL 8104741A NL 191587 C NL191587 C NL 191587C
- Authority
- NL
- Netherlands
- Prior art keywords
- manufacturing
- chain device
- integrated chain
- integrated
- chain
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
- H01L21/31138—Etching organic layers by chemical means by dry-etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
- H01L21/31116—Etching inorganic layers by chemical means by dry-etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/312—Organic layers, e.g. photoresist
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/199,023 US4333793A (en) | 1980-10-20 | 1980-10-20 | High-selectivity plasma-assisted etching of resist-masked layer |
US19902380 | 1980-10-20 |
Publications (3)
Publication Number | Publication Date |
---|---|
NL8104741A NL8104741A (nl) | 1982-05-17 |
NL191587B NL191587B (nl) | 1995-06-01 |
NL191587C true NL191587C (nl) | 1995-10-03 |
Family
ID=22735887
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL8104741A NL191587C (nl) | 1980-10-20 | 1981-10-19 | Werkwijze voor het vervaardigen van een geïntegreerde-keten-inrichting. |
Country Status (13)
Country | Link |
---|---|
US (1) | US4333793A (nl) |
JP (1) | JPS5799745A (nl) |
BE (1) | BE890772A (nl) |
CA (1) | CA1160759A (nl) |
DE (1) | DE3140890C2 (nl) |
ES (1) | ES8207386A1 (nl) |
FR (1) | FR2492591A1 (nl) |
GB (1) | GB2085809B (nl) |
HK (1) | HK6786A (nl) |
IE (1) | IE52530B1 (nl) |
IT (1) | IT1139988B (nl) |
NL (1) | NL191587C (nl) |
SE (1) | SE455743B (nl) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3173581D1 (en) * | 1980-10-28 | 1986-03-06 | Toshiba Kk | Masking process for semiconductor devices using a polymer film |
US4397724A (en) * | 1981-08-24 | 1983-08-09 | Bell Telephone Laboratories, Incorporated | Apparatus and method for plasma-assisted etching of wafers |
US4375385A (en) * | 1982-03-25 | 1983-03-01 | Rca Corporation | Plasma etching of aluminum |
US4372807A (en) * | 1982-03-25 | 1983-02-08 | Rca Corporation | Plasma etching of aluminum |
JPS58204537A (ja) * | 1982-05-24 | 1983-11-29 | Hitachi Ltd | プラズマエツチング方法 |
US4422897A (en) * | 1982-05-25 | 1983-12-27 | Massachusetts Institute Of Technology | Process for selectively etching silicon |
US4451349A (en) * | 1983-04-20 | 1984-05-29 | International Business Machines Corporation | Electrode treatment for plasma patterning of polymers |
JPH0622212B2 (ja) * | 1983-05-31 | 1994-03-23 | 株式会社東芝 | ドライエッチング方法 |
US4452665A (en) * | 1983-10-12 | 1984-06-05 | International Business Machines Corporation | Polymeric halocarbons as plasma etch barriers |
US4470871A (en) * | 1983-12-27 | 1984-09-11 | Rca Corporation | Preparation of organic layers for oxygen etching |
US4534826A (en) * | 1983-12-29 | 1985-08-13 | Ibm Corporation | Trench etch process for dielectric isolation |
US4601913A (en) * | 1984-06-27 | 1986-07-22 | International Business Machines Corporation | Underlay surface modification to control resin glass polymerization |
US4528066A (en) * | 1984-07-06 | 1985-07-09 | Ibm Corporation | Selective anisotropic reactive ion etching process for polysilicide composite structures |
US4613400A (en) * | 1985-05-20 | 1986-09-23 | Applied Materials, Inc. | In-situ photoresist capping process for plasma etching |
DE3615519A1 (de) * | 1986-05-07 | 1987-11-12 | Siemens Ag | Verfahren zum erzeugen von kontaktloechern mit abgeschraegten flanken in zwischenoxidschichten |
US5332653A (en) * | 1992-07-01 | 1994-07-26 | Motorola, Inc. | Process for forming a conductive region without photoresist-related reflective notching damage |
US5562801A (en) * | 1994-04-28 | 1996-10-08 | Cypress Semiconductor Corporation | Method of etching an oxide layer |
JP3073906B2 (ja) * | 1995-03-27 | 2000-08-07 | 財団法人国際超電導産業技術研究センター | 超電導デバイスの製造方法 |
KR100327346B1 (ko) * | 1999-07-20 | 2002-03-06 | 윤종용 | 선택적 폴리머 증착을 이용한 플라즈마 식각방법 및 이를이용한 콘택홀 형성방법 |
US6699792B1 (en) * | 2001-07-17 | 2004-03-02 | Advanced Micro Devices, Inc. | Polymer spacers for creating small geometry space and method of manufacture thereof |
CN100451831C (zh) * | 2001-10-29 | 2009-01-14 | 旺宏电子股份有限公司 | 减小图案间隙或开口尺寸的方法 |
US6573177B1 (en) * | 2002-02-19 | 2003-06-03 | Macronix International Co., Ltd. | Protection layer to prevent under-layer damage during deposition |
US9159561B2 (en) * | 2013-12-26 | 2015-10-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for overcoming broken line and photoresist scum issues in tri-layer photoresist patterning |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3692655A (en) * | 1971-04-05 | 1972-09-19 | Rca Corp | Method of radiofrequency sputter etching |
US3816196A (en) * | 1971-06-07 | 1974-06-11 | Gen Electric | Passivation of photoresist materials used in selective plasma etching |
GB1417085A (en) * | 1973-05-17 | 1975-12-10 | Standard Telephones Cables Ltd | Plasma etching |
EP0001538B1 (fr) * | 1977-10-06 | 1983-01-12 | International Business Machines Corporation | Procédé de décapage sélectif par ions réactifs d'un élément |
JPS5454578A (en) * | 1977-10-11 | 1979-04-28 | Fujitsu Ltd | Gas plasma etching method |
JPS5470772A (en) * | 1977-11-16 | 1979-06-06 | Cho Lsi Gijutsu Kenkyu Kumiai | Dry etching method |
US4226896A (en) * | 1977-12-23 | 1980-10-07 | International Business Machines Corporation | Plasma method for forming a metal containing polymer |
US4244799A (en) * | 1978-09-11 | 1981-01-13 | Bell Telephone Laboratories, Incorporated | Fabrication of integrated circuits utilizing thick high-resolution patterns |
US4275286A (en) * | 1978-12-04 | 1981-06-23 | Hughes Aircraft Company | Process and mask for ion beam etching of fine patterns |
-
1980
- 1980-10-20 US US06/199,023 patent/US4333793A/en not_active Expired - Lifetime
-
1981
- 1981-09-30 CA CA000387027A patent/CA1160759A/en not_active Expired
- 1981-10-05 SE SE8105859A patent/SE455743B/sv not_active IP Right Cessation
- 1981-10-13 FR FR8119237A patent/FR2492591A1/fr active Granted
- 1981-10-15 GB GB8131070A patent/GB2085809B/en not_active Expired
- 1981-10-15 DE DE3140890A patent/DE3140890C2/de not_active Expired - Fee Related
- 1981-10-19 ES ES506354A patent/ES8207386A1/es not_active Expired
- 1981-10-19 IT IT24559/81A patent/IT1139988B/it active
- 1981-10-19 BE BE0/206272A patent/BE890772A/fr not_active IP Right Cessation
- 1981-10-19 IE IE2455/81A patent/IE52530B1/en not_active IP Right Cessation
- 1981-10-19 NL NL8104741A patent/NL191587C/nl not_active IP Right Cessation
- 1981-10-20 JP JP56166512A patent/JPS5799745A/ja active Pending
-
1986
- 1986-01-30 HK HK67/86A patent/HK6786A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
GB2085809B (en) | 1984-06-20 |
DE3140890C2 (de) | 1997-08-21 |
SE8105859L (sv) | 1982-04-21 |
ES506354A0 (es) | 1982-09-01 |
US4333793A (en) | 1982-06-08 |
HK6786A (en) | 1986-02-07 |
FR2492591A1 (fr) | 1982-04-23 |
IT8124559A0 (it) | 1981-10-19 |
NL191587B (nl) | 1995-06-01 |
IT1139988B (it) | 1986-09-24 |
IE52530B1 (en) | 1987-12-09 |
CA1160759A (en) | 1984-01-17 |
SE455743B (sv) | 1988-08-01 |
JPS5799745A (en) | 1982-06-21 |
IE812455L (en) | 1982-04-20 |
FR2492591B1 (nl) | 1984-12-21 |
DE3140890A1 (de) | 1982-06-16 |
BE890772A (fr) | 1982-02-15 |
GB2085809A (en) | 1982-05-06 |
NL8104741A (nl) | 1982-05-17 |
ES8207386A1 (es) | 1982-09-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A85 | Still pending on 85-01-01 | ||
BA | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
V1 | Lapsed because of non-payment of the annual fee |
Effective date: 20010501 |