|
US2980830A
(en)
*
|
1956-08-22 |
1961-04-18 |
Shockley William |
Junction transistor
|
|
NL276978A
(index.php)
*
|
1956-09-05 |
|
|
|
|
US2967985A
(en)
*
|
1957-04-11 |
1961-01-10 |
Shockley |
Transistor structure
|
|
BE531769A
(index.php)
*
|
1957-08-07 |
1900-01-01 |
|
|
|
GB945742A
(index.php)
*
|
1959-02-06 |
|
Texas Instruments Inc |
|
|
GB958249A
(en)
*
|
1959-05-06 |
1964-05-21 |
Texas Instruments Inc |
Semiconductor circuits
|
|
NL252131A
(index.php)
*
|
1959-06-30 |
|
|
|
|
US3117260A
(en)
*
|
1959-09-11 |
1964-01-07 |
Fairchild Camera Instr Co |
Semiconductor circuit complexes
|
|
NL257516A
(index.php)
*
|
1959-11-25 |
|
|
|
|
US3234440A
(en)
*
|
1959-12-30 |
1966-02-08 |
Ibm |
Semiconductor device fabrication
|
|
NL265382A
(index.php)
*
|
1960-03-08 |
|
|
|
|
NL269092A
(index.php)
*
|
1960-09-09 |
1900-01-01 |
|
|
|
US3278811A
(en)
*
|
1960-10-04 |
1966-10-11 |
Hayakawa Denki Kogyo Kabushiki |
Radiation energy transducing device
|
|
US3193418A
(en)
*
|
1960-10-27 |
1965-07-06 |
Fairchild Camera Instr Co |
Semiconductor device fabrication
|
|
US3189798A
(en)
*
|
1960-11-29 |
1965-06-15 |
Westinghouse Electric Corp |
Monolithic semiconductor device and method of preparing same
|
|
US3151004A
(en)
*
|
1961-03-30 |
1964-09-29 |
Rca Corp |
Semiconductor devices
|
|
US3166448A
(en)
*
|
1961-04-07 |
1965-01-19 |
Clevite Corp |
Method for producing rib transistor
|
|
NL274830A
(index.php)
*
|
1961-04-12 |
|
|
|
|
GB967002A
(en)
*
|
1961-05-05 |
1964-08-19 |
Standard Telephones Cables Ltd |
Improvements in or relating to semiconductor devices
|
|
US3227933A
(en)
*
|
1961-05-17 |
1966-01-04 |
Fairchild Camera Instr Co |
Diode and contact structure
|
|
US3177414A
(en)
*
|
1961-07-26 |
1965-04-06 |
Nippon Electric Co |
Device comprising a plurality of transistors
|
|
US3233305A
(en)
*
|
1961-09-26 |
1966-02-08 |
Ibm |
Switching transistors with controlled emitter-base breakdown
|
|
US3197681A
(en)
*
|
1961-09-29 |
1965-07-27 |
Texas Instruments Inc |
Semiconductor devices with heavily doped region to prevent surface inversion
|
|
US3330030A
(en)
*
|
1961-09-29 |
1967-07-11 |
Texas Instruments Inc |
Method of making semiconductor devices
|
|
US3189973A
(en)
*
|
1961-11-27 |
1965-06-22 |
Bell Telephone Labor Inc |
Method of fabricating a semiconductor device
|
|
DE1639051C2
(de)
*
|
1961-12-01 |
1981-07-02 |
Western Electric Co., Inc., 10038 New York, N.Y. |
Verfahren zum Herstellen eines ohmschen Kontakts an einem Silicium-Halbleiterkörper
|
|
NL286507A
(index.php)
*
|
1961-12-11 |
|
|
|
|
US3184657A
(en)
*
|
1962-01-05 |
1965-05-18 |
Fairchild Camera Instr Co |
Nested region transistor configuration
|
|
US3200019A
(en)
*
|
1962-01-19 |
1965-08-10 |
Rca Corp |
Method for making a semiconductor device
|
|
DE1444521B2
(de)
*
|
1962-02-01 |
1971-02-25 |
Siemens AG, 1000 Berlin u 8000 München |
Verfahren zur herstellung einer halbleiteranordnung
|
|
US3265542A
(en)
*
|
1962-03-15 |
1966-08-09 |
Philco Corp |
Semiconductor device and method for the fabrication thereof
|
|
BE631066A
(index.php)
*
|
1962-04-16 |
|
|
|
|
US3212160A
(en)
*
|
1962-05-18 |
1965-10-19 |
Transitron Electronic Corp |
Method of manufacturing semiconductive devices
|
|
US3260115A
(en)
*
|
1962-05-18 |
1966-07-12 |
Bell Telephone Labor Inc |
Temperature sensitive element
|
|
US3266137A
(en)
*
|
1962-06-07 |
1966-08-16 |
Hughes Aircraft Co |
Metal ball connection to crystals
|
|
US3183576A
(en)
*
|
1962-06-26 |
1965-05-18 |
Ibm |
Method of making transistor structures
|
|
NL294675A
(index.php)
*
|
1962-06-29 |
|
|
|
|
US3255005A
(en)
*
|
1962-06-29 |
1966-06-07 |
Tung Sol Electric Inc |
Masking process for semiconductor elements
|
|
US3206827A
(en)
*
|
1962-07-06 |
1965-09-21 |
Gen Instrument Corp |
Method of producing a semiconductor device
|
|
US3296040A
(en)
*
|
1962-08-17 |
1967-01-03 |
Fairchild Camera Instr Co |
Epitaxially growing layers of semiconductor through openings in oxide mask
|
|
BE636317A
(index.php)
*
|
1962-08-23 |
1900-01-01 |
|
|
|
US3204321A
(en)
*
|
1962-09-24 |
1965-09-07 |
Philco Corp |
Method of fabricating passivated mesa transistor without contamination of junctions
|
|
US3271640A
(en)
*
|
1962-10-11 |
1966-09-06 |
Fairchild Camera Instr Co |
Semiconductor tetrode
|
|
US3245794A
(en)
*
|
1962-10-29 |
1966-04-12 |
Ihilco Corp |
Sequential registration scheme
|
|
US3271201A
(en)
*
|
1962-10-30 |
1966-09-06 |
Itt |
Planar semiconductor devices
|
|
BE639365A
(index.php)
*
|
1962-10-30 |
|
|
|
|
US3373324A
(en)
*
|
1962-12-05 |
1968-03-12 |
Motorola Inc |
Semiconductor device with automatic gain control
|
|
US3362858A
(en)
*
|
1963-01-04 |
1968-01-09 |
Westinghouse Electric Corp |
Fabrication of semiconductor controlled rectifiers
|
|
US3275910A
(en)
*
|
1963-01-18 |
1966-09-27 |
Motorola Inc |
Planar transistor with a relative higher-resistivity base region
|
|
NL303035A
(index.php)
*
|
1963-02-06 |
1900-01-01 |
|
|
|
US3205798A
(en)
*
|
1963-03-29 |
1965-09-14 |
Polaroid Corp |
Shutter timing apparatus and method
|
|
US3246214A
(en)
*
|
1963-04-22 |
1966-04-12 |
Siliconix Inc |
Horizontally aligned junction transistor structure
|
|
US3328214A
(en)
*
|
1963-04-22 |
1967-06-27 |
Siliconix Inc |
Process for manufacturing horizontal transistor structure
|
|
GB1054331A
(index.php)
*
|
1963-05-16 |
|
|
|
|
US3291658A
(en)
*
|
1963-06-28 |
1966-12-13 |
Ibm |
Process of making tunnel diodes that results in a peak current that is maintained over a long period of time
|
|
US3279963A
(en)
*
|
1963-07-23 |
1966-10-18 |
Ibm |
Fabrication of semiconductor devices
|
|
US3354364A
(en)
*
|
1963-08-22 |
1967-11-21 |
Nippon Electric Co |
Discontinuous resistance semiconductor device
|
|
DE1229650B
(de)
*
|
1963-09-30 |
1966-12-01 |
Siemens Ag |
Verfahren zum Herstellen eines Halbleiter-bauelementes mit pn-UEbergang nach der Planar-Diffusionstechnik
|
|
US3206339A
(en)
*
|
1963-09-30 |
1965-09-14 |
Philco Corp |
Method of growing geometricallydefined epitaxial layer without formation of undesirable crystallites
|
|
DE1228343B
(de)
*
|
1963-10-22 |
1966-11-10 |
Siemens Ag |
Steuerbare Halbleiterdiode mit stellenweise negativer Strom-Spannungs-Kennlinie
|
|
US3312881A
(en)
*
|
1963-11-08 |
1967-04-04 |
Ibm |
Transistor with limited area basecollector junction
|
|
DE1250790B
(de)
*
|
1963-12-13 |
1967-09-28 |
N.V. Philips' Gloeilampenfabrieken, Eindhoven (Niederlande) |
Verfahren zur Herstellung diffundierter Zonen von Verunreinigungen in einem Halbleiterkörper
|
|
NL134170C
(index.php)
*
|
1963-12-17 |
1900-01-01 |
|
|
|
US3504239A
(en)
*
|
1964-01-31 |
1970-03-31 |
Rca Corp |
Transistor with distributed resistor between emitter lead and emitter region
|
|
GB993388A
(en)
*
|
1964-02-05 |
1965-05-26 |
Standard Telephones Cables Ltd |
Improvements in or relating to semiconductor devices
|
|
US3298879A
(en)
*
|
1964-03-23 |
1967-01-17 |
Rca Corp |
Method of fabricating a semiconductor by masking
|
|
DE1514807B2
(de)
*
|
1964-04-15 |
1971-09-02 |
Texas Instruments Inc., Dallas. Tex. (V.St.A.) |
Verfahren zum herstellen einer planaren halbleiteranordnung
|
|
US3290570A
(en)
*
|
1964-04-28 |
1966-12-06 |
Texas Instruments Inc |
Multilevel expanded metallic contacts for semiconductor devices
|
|
US3409483A
(en)
*
|
1964-05-01 |
1968-11-05 |
Texas Instruments Inc |
Selective deposition of semiconductor materials
|
|
US3363151A
(en)
*
|
1964-07-09 |
1968-01-09 |
Transitron Electronic Corp |
Means for forming planar junctions and devices
|
|
US3364399A
(en)
*
|
1964-07-15 |
1968-01-16 |
Irc Inc |
Array of transistors having a layer of soft metal film for dividing
|
|
US3492546A
(en)
*
|
1964-07-27 |
1970-01-27 |
Raytheon Co |
Contact for semiconductor device
|
|
DE1261480B
(de)
*
|
1964-09-17 |
1968-02-22 |
Telefunken Patent |
Verfahren zur Erzeugung einer elektrisch isolierenden Schicht auf einem Halbleiterkoerper
|
|
US3310442A
(en)
*
|
1964-10-16 |
1967-03-21 |
Siemens Ag |
Method of producing semiconductors by diffusion
|
|
US3341380A
(en)
*
|
1964-12-28 |
1967-09-12 |
Gen Electric |
Method of producing semiconductor devices
|
|
US3409482A
(en)
*
|
1964-12-30 |
1968-11-05 |
Sprague Electric Co |
Method of making a transistor with a very thin diffused base and an epitaxially grown emitter
|
|
USB422695I5
(index.php)
*
|
1964-12-31 |
1900-01-01 |
|
|
|
GB1124762A
(en)
*
|
1965-01-08 |
1968-08-21 |
Lucas Industries Ltd |
Semi-conductor devices
|
|
US3391023A
(en)
*
|
1965-03-29 |
1968-07-02 |
Fairchild Camera Instr Co |
Dielecteric isolation process
|
|
US3313661A
(en)
*
|
1965-05-14 |
1967-04-11 |
Dickson Electronics Corp |
Treating of surfaces of semiconductor elements
|
|
DE1264619C2
(de)
*
|
1965-06-18 |
1968-10-10 |
Siemens Ag |
Verfahren zum Herstellen einer Halbleiteranordnung, insbesondere aus Silizium, einer Silizium-Germanium-Legierung oder aus Siliziumkarbid
|
|
US3667115A
(en)
*
|
1965-06-30 |
1972-06-06 |
Ibm |
Fabrication of semiconductor devices with cup-shaped regions
|
|
US3922706A
(en)
*
|
1965-07-31 |
1975-11-25 |
Telefunken Patent |
Transistor having emitter with high circumference-surface area ratio
|
|
GB1161782A
(en)
*
|
1965-08-26 |
1969-08-20 |
Associated Semiconductor Mft |
Improvements in Semiconductor Devices.
|
|
US3461550A
(en)
*
|
1965-09-22 |
1969-08-19 |
Monti E Aklufi |
Method of fabricating semiconductor devices
|
|
US3360851A
(en)
*
|
1965-10-01 |
1968-01-02 |
Bell Telephone Labor Inc |
Small area semiconductor device
|
|
US3457631A
(en)
*
|
1965-11-09 |
1969-07-29 |
Gen Electric |
Method of making a high frequency transistor structure
|
|
DE1283400B
(de)
*
|
1965-11-23 |
1968-11-21 |
Siemens Ag |
Verfahren zum Herstellen einer Vielzahl von Siliciumplanartransistoren
|
|
DE1293308B
(de)
*
|
1966-01-21 |
1969-04-24 |
Siemens Ag |
Transistoranordnung zur Strombegrenzung
|
|
US3490962A
(en)
*
|
1966-04-25 |
1970-01-20 |
Ibm |
Diffusion process
|
|
US3504430A
(en)
*
|
1966-06-27 |
1970-04-07 |
Hitachi Ltd |
Method of making semiconductor devices having insulating films
|
|
DE1300164B
(de)
*
|
1967-01-26 |
1969-07-31 |
Itt Ind Gmbh Deutsche |
Verfahren zum Herstellen von Zenerdioden
|
|
US3503124A
(en)
*
|
1967-02-08 |
1970-03-31 |
Frank M Wanlass |
Method of making a semiconductor device
|
|
US3577042A
(en)
*
|
1967-06-19 |
1971-05-04 |
Int Rectifier Corp |
Gate connection for controlled rectifiers
|
|
DE1764759C3
(de)
*
|
1968-07-31 |
1983-11-10 |
Telefunken Patentverwertungsgesellschaft Mbh, 6000 Frankfurt |
Verfahren zum Kontaktieren einer Halbleiterzone einer Diode
|
|
US3639186A
(en)
*
|
1969-02-24 |
1972-02-01 |
Ibm |
Process for the production of finely etched patterns
|
|
BE758160A
(fr)
*
|
1969-10-31 |
1971-04-01 |
Fairchild Camera Instr Co |
Structure metallique a couches multiples et procede de fabrication d'une telle structure
|
|
US3648125A
(en)
*
|
1971-02-02 |
1972-03-07 |
Fairchild Camera Instr Co |
Method of fabricating integrated circuits with oxidized isolation and the resulting structure
|
|
US3808475A
(en)
*
|
1972-07-10 |
1974-04-30 |
Amdahl Corp |
Lsi chip construction and method
|
|
US3935587A
(en)
*
|
1974-08-14 |
1976-01-27 |
Westinghouse Electric Corporation |
High power, high frequency bipolar transistor with alloyed gold electrodes
|
|
JPS5193874A
(en)
*
|
1975-02-15 |
1976-08-17 |
|
Handotaisochino seizohoho
|
|
DE2726667A1
(de)
|
1977-06-14 |
1978-12-21 |
Licentia Gmbh |
Oberflaechenpassiviertes halbleiterbauelement und verfahren zum herstellen desselben
|
|
JPS5834945B2
(ja)
*
|
1980-06-02 |
1983-07-29 |
株式会社東芝 |
ヒユ−ズ形prom半導体装置
|
|
US4633092A
(en)
*
|
1984-11-13 |
1986-12-30 |
Eastman Kodak Company |
Light sensing device
|
|
DE19600780B4
(de)
*
|
1996-01-11 |
2006-04-13 |
Micronas Gmbh |
Verfahren zum Kontaktieren von Bereichen mit verschiedener Dotierung in einem Halbleiterbauelement und Halbleiterbauelement
|