NL1036566A1 - Lithographic apparatus comprising a closing device and device manufacturing method using the same. - Google Patents

Lithographic apparatus comprising a closing device and device manufacturing method using the same. Download PDF

Info

Publication number
NL1036566A1
NL1036566A1 NL1036566A NL1036566A NL1036566A1 NL 1036566 A1 NL1036566 A1 NL 1036566A1 NL 1036566 A NL1036566 A NL 1036566A NL 1036566 A NL1036566 A NL 1036566A NL 1036566 A1 NL1036566 A1 NL 1036566A1
Authority
NL
Netherlands
Prior art keywords
substrate
chamber
opening
lithographic apparatus
closing device
Prior art date
Application number
NL1036566A
Other languages
English (en)
Dutch (nl)
Inventor
Christiaan Alexander Hoogendam
Erik Roelof Loopstra
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL1036566A1 publication Critical patent/NL1036566A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL1036566A 2008-04-08 2009-02-12 Lithographic apparatus comprising a closing device and device manufacturing method using the same. NL1036566A1 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7100108P 2008-04-08 2008-04-08
US7100108 2008-04-08

Publications (1)

Publication Number Publication Date
NL1036566A1 true NL1036566A1 (nl) 2009-10-09

Family

ID=40869273

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1036566A NL1036566A1 (nl) 2008-04-08 2009-02-12 Lithographic apparatus comprising a closing device and device manufacturing method using the same.

Country Status (3)

Country Link
NL (1) NL1036566A1 (fr)
TW (1) TWI463268B (fr)
WO (1) WO2009124660A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8894260B2 (en) * 2009-03-31 2014-11-25 Sicpa Holding Sa Annular light guide illuminator and optical scanner
CN103399464B (zh) * 2013-07-26 2015-04-08 中国科学院光电研究院 一种动态气体锁
KR20200118436A (ko) * 2018-02-16 2020-10-15 에이에스엠엘 네델란즈 비.브이. 가스 로크를 포함하는 장치
CN111736431B (zh) * 2020-06-15 2023-03-03 上海集成电路研发中心有限公司 一种更换动态气体锁的装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6369874B1 (en) * 2000-04-18 2002-04-09 Silicon Valley Group, Inc. Photoresist outgassing mitigation system method and apparatus for in-vacuum lithography
EP1349010B1 (fr) * 2002-03-28 2014-12-10 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
JP2003332214A (ja) * 2002-05-14 2003-11-21 Canon Inc 減圧装置、基板の制御方法、露光装置、半導体デバイスの製造方法
JP2006303270A (ja) * 2005-04-22 2006-11-02 Nikon Corp 露光装置

Also Published As

Publication number Publication date
TW200944959A (en) 2009-11-01
WO2009124660A1 (fr) 2009-10-15
TWI463268B (zh) 2014-12-01

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