NL1010397C2 - Licht-stabiele copolyetherestersamenstelling. - Google Patents
Licht-stabiele copolyetherestersamenstelling. Download PDFInfo
- Publication number
- NL1010397C2 NL1010397C2 NL1010397A NL1010397A NL1010397C2 NL 1010397 C2 NL1010397 C2 NL 1010397C2 NL 1010397 A NL1010397 A NL 1010397A NL 1010397 A NL1010397 A NL 1010397A NL 1010397 C2 NL1010397 C2 NL 1010397C2
- Authority
- NL
- Netherlands
- Prior art keywords
- composition according
- copolyether ester
- group
- hindered amine
- composition
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 39
- 150000002148 esters Chemical class 0.000 claims abstract description 20
- 150000001412 amines Chemical class 0.000 claims abstract description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 11
- 239000003381 stabilizer Substances 0.000 claims abstract description 10
- 150000002989 phenols Chemical class 0.000 claims abstract description 5
- 239000000654 additive Substances 0.000 claims abstract description 4
- UKJARPDLRWBRAX-UHFFFAOYSA-N n,n'-bis(2,2,6,6-tetramethylpiperidin-4-yl)hexane-1,6-diamine Chemical compound C1C(C)(C)NC(C)(C)CC1NCCCCCCNC1CC(C)(C)NC(C)(C)C1 UKJARPDLRWBRAX-UHFFFAOYSA-N 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 2
- XOUUNPJPICSXGK-UHFFFAOYSA-N C(=O)N(CCCCCC(N)(C1CC(NC(C1)(C)C)(C)C)C1CC(NC(C1)(C)C)(C)C)C=O Chemical compound C(=O)N(CCCCCC(N)(C1CC(NC(C1)(C)C)(C)C)C1CC(NC(C1)(C)C)(C)C)C=O XOUUNPJPICSXGK-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000011835 investigation Methods 0.000 claims 1
- 239000013589 supplement Substances 0.000 claims 1
- 230000032683 aging Effects 0.000 abstract description 4
- 238000002845 discoloration Methods 0.000 abstract description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 14
- -1 2,2,6,6-tetramethyl-substituted piperidyl esters Chemical class 0.000 description 6
- 239000008187 granular material Substances 0.000 description 6
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 6
- 238000012360 testing method Methods 0.000 description 4
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 3
- 239000004594 Masterbatch (MB) Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- FLPKSBDJMLUTEX-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) 2-butyl-2-[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]propanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)C(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)(CCCC)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 FLPKSBDJMLUTEX-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- KGUHNPYZVOXLMM-UHFFFAOYSA-N 1-(2,2,6,6-tetramethylpiperidin-4-yl)hexane-1,6-diamine Chemical compound CC1(C)CC(C(N)CCCCCN)CC(C)(C)N1 KGUHNPYZVOXLMM-UHFFFAOYSA-N 0.000 description 1
- WSQZNZLOZXSBHA-UHFFFAOYSA-N 3,8-dioxabicyclo[8.2.2]tetradeca-1(12),10,13-triene-2,9-dione Chemical compound O=C1OCCCCOC(=O)C2=CC=C1C=C2 WSQZNZLOZXSBHA-UHFFFAOYSA-N 0.000 description 1
- KKQPPRHUDMIQCA-UHFFFAOYSA-N 3-[5-(3,5-ditert-butyl-4-hydroxyphenyl)-4,4-bis(1,2,2,6,6-pentamethylpiperidin-3-yl)pentoxy]-3-oxopropanoic acid Chemical compound CC1(CCC(C(N1C)(C)C)C(CCCOC(=O)CC(=O)O)(CC2=CC(=C(C(=C2)C(C)(C)C)O)C(C)(C)C)C3CCC(N(C3(C)C)C)(C)C)C KKQPPRHUDMIQCA-UHFFFAOYSA-N 0.000 description 1
- 229920011372 Arnitel® EM740 Polymers 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- 206010051246 Photodermatosis Diseases 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000008845 photoaging Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3432—Six-membered rings
- C08K5/3435—Piperidines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
- C08K5/34926—Triazines also containing heterocyclic groups other than triazine groups
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Cosmetics (AREA)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL1010397A NL1010397C2 (nl) | 1998-10-26 | 1998-10-26 | Licht-stabiele copolyetherestersamenstelling. |
| TW088117545A TW495533B (en) | 1998-10-26 | 1999-10-08 | Light-stable copolyether ester composition |
| EP99951261A EP1144495B1 (de) | 1998-10-26 | 1999-10-20 | Lichtstabile copolyetherester-zusammensetzung |
| AU63730/99A AU6373099A (en) | 1998-10-26 | 1999-10-20 | Light-stable copolyether ester composition |
| AT99951261T ATE238384T1 (de) | 1998-10-26 | 1999-10-20 | Lichtstabile copolyetherester-zusammensetzung |
| ES99951261T ES2198153T3 (es) | 1998-10-26 | 1999-10-20 | Composicion de ester de copolieter fotoestabilizada. |
| DE69907270T DE69907270T2 (de) | 1998-10-26 | 1999-10-20 | Lichtstabile copolyetherester-zusammensetzung |
| PCT/NL1999/000654 WO2000024820A1 (en) | 1998-10-26 | 1999-10-20 | Light-stable copolyether ester composition |
| US09/842,369 US6573317B2 (en) | 1998-10-26 | 2001-04-26 | Light-stable copolyether ester composition |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL1010397 | 1998-10-26 | ||
| NL1010397A NL1010397C2 (nl) | 1998-10-26 | 1998-10-26 | Licht-stabiele copolyetherestersamenstelling. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL1010397C2 true NL1010397C2 (nl) | 2000-04-27 |
Family
ID=19768023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL1010397A NL1010397C2 (nl) | 1998-10-26 | 1998-10-26 | Licht-stabiele copolyetherestersamenstelling. |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6573317B2 (de) |
| EP (1) | EP1144495B1 (de) |
| AT (1) | ATE238384T1 (de) |
| AU (1) | AU6373099A (de) |
| DE (1) | DE69907270T2 (de) |
| ES (1) | ES2198153T3 (de) |
| NL (1) | NL1010397C2 (de) |
| TW (1) | TW495533B (de) |
| WO (1) | WO2000024820A1 (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060058435A1 (en) * | 2004-09-16 | 2006-03-16 | Szekely Peter L | Slush molded elastomeric layer |
| US7582690B2 (en) | 2004-11-19 | 2009-09-01 | Eastman Chemical Company | Stabilized aliphatic polyester compositions |
| KR101379619B1 (ko) * | 2011-01-20 | 2014-04-01 | 코오롱플라스틱 주식회사 | 열가소성 폴리에테르에스테르 엘라스토머 수지 조성물 및 이로부터 제조된 탄성 모노 필라멘트 |
| JP2014526596A (ja) * | 2011-09-23 | 2014-10-06 | ディーエスエム アイピー アセッツ ビー.ブイ. | 熱可塑性ポリエステルエラストマーを含有するポリマー組成物 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5224255A (en) * | 1975-08-19 | 1977-02-23 | Teijin Ltd | Polyetherester composition |
| US4426471A (en) * | 1978-06-21 | 1984-01-17 | Ciba-Geigy Corporation | Stabilization of acid catalyzed stoving lacquers |
| US4524165A (en) * | 1983-10-24 | 1985-06-18 | Eastman Kodak Company | Stabilized copolyesterether compositions suitable for outdoor applications |
| DE19607187A1 (de) * | 1995-02-28 | 1996-08-29 | Sumitomo Chemical Co | Thermoplastische Harzmasse |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5985961A (en) | 1997-06-17 | 1999-11-16 | Johns Manville International, Inc. | Monofilament |
-
1998
- 1998-10-26 NL NL1010397A patent/NL1010397C2/nl not_active IP Right Cessation
-
1999
- 1999-10-08 TW TW088117545A patent/TW495533B/zh not_active IP Right Cessation
- 1999-10-20 DE DE69907270T patent/DE69907270T2/de not_active Expired - Lifetime
- 1999-10-20 AT AT99951261T patent/ATE238384T1/de active
- 1999-10-20 ES ES99951261T patent/ES2198153T3/es not_active Expired - Lifetime
- 1999-10-20 EP EP99951261A patent/EP1144495B1/de not_active Expired - Lifetime
- 1999-10-20 AU AU63730/99A patent/AU6373099A/en not_active Abandoned
- 1999-10-20 WO PCT/NL1999/000654 patent/WO2000024820A1/en not_active Ceased
-
2001
- 2001-04-26 US US09/842,369 patent/US6573317B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5224255A (en) * | 1975-08-19 | 1977-02-23 | Teijin Ltd | Polyetherester composition |
| US4426471A (en) * | 1978-06-21 | 1984-01-17 | Ciba-Geigy Corporation | Stabilization of acid catalyzed stoving lacquers |
| US4524165A (en) * | 1983-10-24 | 1985-06-18 | Eastman Kodak Company | Stabilized copolyesterether compositions suitable for outdoor applications |
| DE19607187A1 (de) * | 1995-02-28 | 1996-08-29 | Sumitomo Chemical Co | Thermoplastische Harzmasse |
Non-Patent Citations (2)
| Title |
|---|
| DATABASE WPI Section Ch Week 7714, Derwent World Patents Index; Class A25, AN 77-24394y, XP002107716 * |
| PATENT ABSTRACTS OF JAPAN vol. 001, no. 061 (C - 016) 15 June 1977 (1977-06-15) * |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1144495A1 (de) | 2001-10-17 |
| TW495533B (en) | 2002-07-21 |
| AU6373099A (en) | 2000-05-15 |
| US20020032255A1 (en) | 2002-03-14 |
| DE69907270T2 (de) | 2004-03-25 |
| ATE238384T1 (de) | 2003-05-15 |
| EP1144495B1 (de) | 2003-04-23 |
| ES2198153T3 (es) | 2004-01-16 |
| DE69907270D1 (de) | 2003-05-28 |
| WO2000024820A1 (en) | 2000-05-04 |
| US6573317B2 (en) | 2003-06-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PD2B | A search report has been drawn up | ||
| SD | Assignments of patents |
Owner name: DSM IP ASSETS B.V. Effective date: 20050915 |
|
| TD | Modifications of names of proprietors of patents |
Owner name: KONINKLIJKE DSM N.V. Effective date: 20050915 |
|
| VD1 | Lapsed due to non-payment of the annual fee |
Effective date: 20070501 |