NL1005624A1 - Polysilicium CMP-proces voor hoge-dichtheid-DRAM-celstructuren. - Google Patents

Polysilicium CMP-proces voor hoge-dichtheid-DRAM-celstructuren.

Info

Publication number
NL1005624A1
NL1005624A1 NL1005624A NL1005624A NL1005624A1 NL 1005624 A1 NL1005624 A1 NL 1005624A1 NL 1005624 A NL1005624 A NL 1005624A NL 1005624 A NL1005624 A NL 1005624A NL 1005624 A1 NL1005624 A1 NL 1005624A1
Authority
NL
Netherlands
Prior art keywords
high density
cmp process
cell structures
dram cell
density dram
Prior art date
Application number
NL1005624A
Other languages
English (en)
Other versions
NL1005624C2 (nl
Inventor
Shih-Wei Sun
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to NL1005624A priority Critical patent/NL1005624C2/nl
Publication of NL1005624A1 publication Critical patent/NL1005624A1/nl
Application granted granted Critical
Publication of NL1005624C2 publication Critical patent/NL1005624C2/nl

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/31DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor
    • H10B12/318DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor the storage electrode having multiple segments
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/01Manufacture or treatment
    • H10B12/02Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/03Making the capacitor or connections thereto
    • H10B12/033Making the capacitor or connections thereto the capacitor extending over the transistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
NL1005624A 1997-03-25 1997-03-25 Polysilicium CMP-proces voor hoge-dichtheid-DRAM-celstructuren. NL1005624C2 (nl)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NL1005624A NL1005624C2 (nl) 1997-03-25 1997-03-25 Polysilicium CMP-proces voor hoge-dichtheid-DRAM-celstructuren.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1005624 1997-03-25
NL1005624A NL1005624C2 (nl) 1997-03-25 1997-03-25 Polysilicium CMP-proces voor hoge-dichtheid-DRAM-celstructuren.

Publications (2)

Publication Number Publication Date
NL1005624A1 true NL1005624A1 (nl) 1998-09-28
NL1005624C2 NL1005624C2 (nl) 2000-02-08

Family

ID=19764659

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1005624A NL1005624C2 (nl) 1997-03-25 1997-03-25 Polysilicium CMP-proces voor hoge-dichtheid-DRAM-celstructuren.

Country Status (1)

Country Link
NL (1) NL1005624C2 (nl)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2875588B2 (ja) * 1990-05-22 1999-03-31 沖電気工業株式会社 半導体装置の製造方法
KR960011652B1 (ko) * 1993-04-14 1996-08-24 현대전자산업 주식회사 스택캐패시터 및 그 제조방법
JP3085831B2 (ja) * 1993-09-17 2000-09-11 沖電気工業株式会社 半導体装置の製造方法
US5604148A (en) * 1996-03-08 1997-02-18 United Microelectronics Corporation Process of fabricating stacked capacitor configuration for dynamic random access memory

Also Published As

Publication number Publication date
NL1005624C2 (nl) 2000-02-08

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 19990923

PD2B A search report has been drawn up
VD1 Lapsed due to non-payment of the annual fee

Effective date: 20021001