NL1000201C2 - Patroonprojectiewerkwijze. - Google Patents

Patroonprojectiewerkwijze.

Info

Publication number
NL1000201C2
NL1000201C2 NL1000201A NL1000201A NL1000201C2 NL 1000201 C2 NL1000201 C2 NL 1000201C2 NL 1000201 A NL1000201 A NL 1000201A NL 1000201 A NL1000201 A NL 1000201A NL 1000201 C2 NL1000201 C2 NL 1000201C2
Authority
NL
Netherlands
Prior art keywords
projection method
pattern projection
pattern
projection
Prior art date
Application number
NL1000201A
Other languages
English (en)
Other versions
NL1000201A1 (nl
Inventor
Tohru Ogawa
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP5268904A priority Critical patent/JPH07122478A/ja
Priority to US08/327,054 priority patent/US5627625A/en
Priority to EP94116841A priority patent/EP0651291B1/en
Priority to DE69413348T priority patent/DE69413348T2/de
Application filed by Sony Corp filed Critical Sony Corp
Priority to NL1000201A priority patent/NL1000201C2/nl
Priority to BE9500372A priority patent/BE1009529A3/nl
Publication of NL1000201A1 publication Critical patent/NL1000201A1/nl
Application granted granted Critical
Publication of NL1000201C2 publication Critical patent/NL1000201C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL1000201A 1993-10-27 1995-04-21 Patroonprojectiewerkwijze. NL1000201C2 (nl)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP5268904A JPH07122478A (ja) 1993-10-27 1993-10-27 パターン投影方法
US08/327,054 US5627625A (en) 1993-10-27 1994-10-21 Pattern projecting method
EP94116841A EP0651291B1 (en) 1993-10-27 1994-10-25 Pattern projecting method
DE69413348T DE69413348T2 (de) 1993-10-27 1994-10-25 Musterprojektionsverfahren
NL1000201A NL1000201C2 (nl) 1993-10-27 1995-04-21 Patroonprojectiewerkwijze.
BE9500372A BE1009529A3 (nl) 1993-10-27 1995-04-21 Patroonprojectiewerkwijze.

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP5268904A JPH07122478A (ja) 1993-10-27 1993-10-27 パターン投影方法
NL1000201A NL1000201C2 (nl) 1993-10-27 1995-04-21 Patroonprojectiewerkwijze.
BE9500372A BE1009529A3 (nl) 1993-10-27 1995-04-21 Patroonprojectiewerkwijze.

Publications (2)

Publication Number Publication Date
NL1000201A1 NL1000201A1 (nl) 1996-10-22
NL1000201C2 true NL1000201C2 (nl) 1996-11-19

Family

ID=27159843

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1000201A NL1000201C2 (nl) 1993-10-27 1995-04-21 Patroonprojectiewerkwijze.

Country Status (6)

Country Link
US (1) US5627625A (nl)
EP (1) EP0651291B1 (nl)
JP (1) JPH07122478A (nl)
BE (1) BE1009529A3 (nl)
DE (1) DE69413348T2 (nl)
NL (1) NL1000201C2 (nl)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0567558A (ja) * 1991-09-06 1993-03-19 Nikon Corp 露光方法
JPH07122478A (ja) * 1993-10-27 1995-05-12 Sony Corp パターン投影方法
KR100377206B1 (ko) * 1994-08-26 2003-06-09 소니 가부시끼 가이샤 패턴형성방법및이방법을이용한반도체디바이스제조방법
JP3458549B2 (ja) * 1994-08-26 2003-10-20 ソニー株式会社 パターン形成方法および該方法を用いた半導体デバイス製造方法と装置
JPH0955349A (ja) * 1995-08-14 1997-02-25 Sony Corp パターン形成方法および露光装置
JP3431387B2 (ja) * 1996-03-14 2003-07-28 株式会社東芝 露光強度分布表示方法とマスクパターン編集装置
KR19990030953A (ko) * 1997-10-07 1999-05-06 윤종용 웨이퍼 노광방법
JP2008003633A (ja) * 1997-12-05 2008-01-10 Renesas Technology Corp パターン歪検出装置及び検出方法
JP2011081388A (ja) * 1997-12-05 2011-04-21 Renesas Electronics Corp パターン歪検出装置及び検出方法
US6056403A (en) * 1998-06-09 2000-05-02 Fisher; Douglas C. Device for stimulating eye movement
US6466304B1 (en) * 1998-10-22 2002-10-15 Asm Lithography B.V. Illumination device for projection system and method for fabricating
US6480263B1 (en) * 1998-10-22 2002-11-12 Asml Netherlands B.V. Apparatus and method for phase shift photomasking
US6284443B1 (en) * 1999-04-30 2001-09-04 International Business Machines Corporation Method and apparatus for image adjustment
JP2001319871A (ja) * 2000-02-29 2001-11-16 Nikon Corp 露光方法、濃度フィルタの製造方法、及び露光装置
KR20040086313A (ko) * 2002-01-29 2004-10-08 가부시키가이샤 니콘 노광장치 및 노광방법
US6842223B2 (en) 2003-04-11 2005-01-11 Nikon Precision Inc. Enhanced illuminator for use in photolithographic systems
JP2008158100A (ja) * 2006-12-21 2008-07-10 Toshiba Corp パターン管理方法及びパターン管理プログラム
US9934351B2 (en) * 2015-11-09 2018-04-03 Applied Materials, Inc. Wafer point by point analysis and data presentation

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4303028A1 (en) * 1992-02-03 1993-08-05 Hitachi Ltd Projection exposure appts. for LSI mfr. - has light source and annular illumination distributor, arranging light beams on plane of effective source
EP0576297A1 (en) * 1992-06-25 1993-12-29 Canon Kabushiki Kaisha Device for normal or oblique illumination of a mask
US5363170A (en) * 1991-08-09 1994-11-08 Canon Kabushiki Kaisha Illumination device and projection exposure apparatus using the same
EP0651291A1 (en) * 1993-10-27 1995-05-03 Sony Corporation Pattern projecting method
EP0698824A2 (en) * 1994-08-26 1996-02-28 Sony Corporation Pattern formation method and method and apparatus for production of a semiconductor device using said method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03269343A (ja) * 1990-03-20 1991-11-29 Hitachi Ltd 照射光学系
JP2633091B2 (ja) * 1991-02-22 1997-07-23 キヤノン株式会社 像投影方法、回路製造方法及び投影露光装置
JPH0536586A (ja) * 1991-08-02 1993-02-12 Canon Inc 像投影方法及び該方法を用いた半導体デバイスの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5363170A (en) * 1991-08-09 1994-11-08 Canon Kabushiki Kaisha Illumination device and projection exposure apparatus using the same
DE4303028A1 (en) * 1992-02-03 1993-08-05 Hitachi Ltd Projection exposure appts. for LSI mfr. - has light source and annular illumination distributor, arranging light beams on plane of effective source
EP0576297A1 (en) * 1992-06-25 1993-12-29 Canon Kabushiki Kaisha Device for normal or oblique illumination of a mask
EP0651291A1 (en) * 1993-10-27 1995-05-03 Sony Corporation Pattern projecting method
EP0698824A2 (en) * 1994-08-26 1996-02-28 Sony Corporation Pattern formation method and method and apparatus for production of a semiconductor device using said method

Also Published As

Publication number Publication date
JPH07122478A (ja) 1995-05-12
NL1000201A1 (nl) 1996-10-22
BE1009529A3 (nl) 1997-04-01
EP0651291B1 (en) 1998-09-16
EP0651291A1 (en) 1995-05-03
US5627625A (en) 1997-05-06
DE69413348D1 (de) 1998-10-22
DE69413348T2 (de) 1999-05-06

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Legal Events

Date Code Title Description
AD1B A search report has been drawn up
PD2B A search report has been drawn up
V1 Lapsed because of non-payment of the annual fee

Effective date: 20121101