MY172956A - Shower-type wet texturing equipment for solar silicon wafers and method thereof - Google Patents
Shower-type wet texturing equipment for solar silicon wafers and method thereofInfo
- Publication number
- MY172956A MY172956A MYPI2015701061A MYPI2015701061A MY172956A MY 172956 A MY172956 A MY 172956A MY PI2015701061 A MYPI2015701061 A MY PI2015701061A MY PI2015701061 A MYPI2015701061 A MY PI2015701061A MY 172956 A MY172956 A MY 172956A
- Authority
- MY
- Malaysia
- Prior art keywords
- silicon wafers
- liquid
- shower
- component
- transporting
- Prior art date
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract 7
- 229910052710 silicon Inorganic materials 0.000 title abstract 7
- 239000010703 silicon Substances 0.000 title abstract 7
- 235000012431 wafers Nutrition 0.000 title abstract 7
- 238000000034 method Methods 0.000 title abstract 3
- 239000007788 liquid Substances 0.000 abstract 6
- 238000005260 corrosion Methods 0.000 abstract 3
- 230000007797 corrosion Effects 0.000 abstract 3
- 238000005507 spraying Methods 0.000 abstract 2
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 239000012263 liquid product Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1876—Particular processes or apparatus for batch treatment of the devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
Abstract
The invention discloses a shower-type wet texturing equipment for solar silicon wafers, comprising a transporting component for forwards transporting the silicon wafers (3), a spraying component arranged above the transporting component, and a liquid supplying component arranged below the transporting component. The silicon wafers (3) are placed on the transporting component at intervals and are forwards transported by the transporting component, corrosive liquid is sprayed by spraying boxes (4) downward, and the corrosive liquid flowed down from the transporting component is gathered in a liquid receiving trough. The invention further provides a method for texturing the solar silicon wafers in a wet process via the shower-type wet texturing equipment. According to the invention, the corrosion liquid is sprayed or dropped on the silicon wafers (3) in a showering manner, the unnecessary corrosion liquid and reaction products flow into the liquid receiving trough (1), so as to ensure the corrosion uniformity of the silicon wafers (3). (FIG. 1)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510024996.4A CN104538503B (en) | 2015-01-19 | 2015-01-19 | The shower type wet-method etching equipment and method of solar silicon wafers |
Publications (1)
Publication Number | Publication Date |
---|---|
MY172956A true MY172956A (en) | 2019-12-16 |
Family
ID=52854002
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2015701061A MY172956A (en) | 2015-01-19 | 2015-04-01 | Shower-type wet texturing equipment for solar silicon wafers and method thereof |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN104538503B (en) |
MY (1) | MY172956A (en) |
WO (1) | WO2016115721A1 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105220235B (en) * | 2015-10-12 | 2017-12-08 | 常州捷佳创精密机械有限公司 | A kind of single polycrystalline etching method |
CN105717720A (en) * | 2016-03-18 | 2016-06-29 | 深圳市华星光电技术有限公司 | Copper wiring device with anti-explosion function and copper wiring anti-explosion method |
CN107230651B (en) * | 2016-03-25 | 2020-10-27 | 盟立自动化股份有限公司 | Integrated liquid medicine tank for wet process |
CN107968134B (en) * | 2017-11-09 | 2020-08-11 | 常州捷佳创精密机械有限公司 | Liquid medicine adding system and method |
CN108376663B (en) * | 2018-04-25 | 2023-07-25 | 通威太阳能(安徽)有限公司 | Multi-outlet type uniform liquid discharge device of RENA (red, green and blue) texturing equipment |
CN109326684A (en) * | 2018-09-27 | 2019-02-12 | 苏州润阳光伏科技有限公司 | A method of solving PERC battery EL blackspot stain |
CN109078818A (en) * | 2018-09-29 | 2018-12-25 | 浙江华立智能装备股份有限公司 | A kind of stirred type pre-treatment spray liquid bath |
CN109841704A (en) * | 2019-02-26 | 2019-06-04 | 镇江仁德新能源科技有限公司 | A kind of black silicon fluff making device of anti-sticking sheet |
CN111063763B (en) * | 2019-12-03 | 2021-11-09 | 山西潞安太阳能科技有限责任公司 | Method for improving capacity of photovoltaic wet-process texturing equipment |
GB2590499A (en) * | 2019-12-20 | 2021-06-30 | Singulus Tech Ag | Method and wet bench for selectively removing an emitter layer on a single side of a silicon substrate |
CN111889443A (en) * | 2020-06-28 | 2020-11-06 | 北京北方华创微电子装备有限公司 | Wafer cleaning equipment |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10328845B4 (en) * | 2003-06-26 | 2005-10-20 | Siltronic Ag | Process for the surface treatment of a semiconductor wafer |
CN101740657A (en) * | 2008-11-11 | 2010-06-16 | 徐竹林 | Leaf-type solar wool-making device and method |
CN201570510U (en) * | 2009-12-15 | 2010-09-01 | 南安市三晶阳光电力有限公司 | Novel silicon wafer texturing device |
CN202308013U (en) * | 2011-11-01 | 2012-07-04 | 宁波市鑫友光伏有限公司 | Surface fluff making device for solar silicon chip |
CN103441070B (en) * | 2013-08-22 | 2015-12-09 | 常州捷佳创精密机械有限公司 | A kind of etching device of crystal silicon chip and process for etching method |
CN204361118U (en) * | 2015-01-19 | 2015-05-27 | 常州捷佳创精密机械有限公司 | The shower type wet-method etching equipment of solar silicon wafers |
-
2015
- 2015-01-19 CN CN201510024996.4A patent/CN104538503B/en active Active
- 2015-01-23 WO PCT/CN2015/071396 patent/WO2016115721A1/en active Application Filing
- 2015-04-01 MY MYPI2015701061A patent/MY172956A/en unknown
Also Published As
Publication number | Publication date |
---|---|
CN104538503A (en) | 2015-04-22 |
CN104538503B (en) | 2017-06-13 |
WO2016115721A1 (en) | 2016-07-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
MY172956A (en) | Shower-type wet texturing equipment for solar silicon wafers and method thereof | |
PH12017501628A1 (en) | Wafer dryer apparatus and method | |
SG10201402882PA (en) | Chamber wall of a plasma processing apparatus including a flowing protective liquid layer | |
MX2019012614A (en) | Reactive gas generation system and method of treatment using reactive gas. | |
WO2013173578A3 (en) | Contamination removal apparatus and method | |
SG10201908873WA (en) | Chamber components for epitaxial growth apparatus | |
MX2018007026A (en) | Systems and methods for solution coating a substrate. | |
GB2540314A (en) | Etch rate enhancement for a silicon etch process through etch chamber pretreatment | |
WO2012125275A3 (en) | Apparatus for monitoring and controlling substrate temperature | |
CN203768462U (en) | Closed acid mist recycling device | |
MY177802A (en) | Device and method for the treatment of flat material to be treated | |
EP3338299A4 (en) | Process-specific wafer carrier correction to improve thermal uniformity in chemical vapor deposition systems and processes | |
HUE046087T2 (en) | System for the conservation and dosage of ingredients and method for the dosage and deposition of ingredients on a substrate | |
MX2017001636A (en) | Method for the continuous coating of a cellulose-based fibrous substrate web with fatty acid chloride. | |
MY183946A (en) | Method and system of dehydrating a feed stream processed in a distillation tower | |
SG11201803914QA (en) | Method for Epitaxially Coating Semiconductor Wafers, and Semiconductor Wafer | |
TW201614234A (en) | Automated local analyzer for substrate and analysis method using same | |
PH12018550065A1 (en) | Selective particles transfer from one device to another | |
RU2017113543A (en) | CONTAMINATED SOIL TREATMENT SYSTEM AND APPROPRIATE METHOD | |
TW201614760A (en) | Heater apparatus for substrate processing and liquid processing arraratus for substrate comprising the same | |
SG10201909284PA (en) | Residue free oxide etch | |
MY185070A (en) | Apparatus for the passage and conveyance of compressible material | |
TW201613114A (en) | Method and apparatus for structuring the topside and underside of a semiconductor substrate | |
SG10201701124TA (en) | Substrate treating apparatus and substrate treating method | |
FR3024064B1 (en) | PROCESS FOR THE MECHANICAL CHEMICAL POLISHING OF RUTHENIUM AND COPPER-CONTAINING SUBSTRATES |