MY170825A - Crti-based alloy for adhesion film layer for use in magnetic recording medium, target material for sputtering, and perpendicular magnetic recording medium obtained using same - Google Patents
Crti-based alloy for adhesion film layer for use in magnetic recording medium, target material for sputtering, and perpendicular magnetic recording medium obtained using sameInfo
- Publication number
- MY170825A MY170825A MYPI2014702929A MYPI2014702929A MY170825A MY 170825 A MY170825 A MY 170825A MY PI2014702929 A MYPI2014702929 A MY PI2014702929A MY PI2014702929 A MYPI2014702929 A MY PI2014702929A MY 170825 A MY170825 A MY 170825A
- Authority
- MY
- Malaysia
- Prior art keywords
- recording medium
- magnetic recording
- crti
- sputtering
- based alloy
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
- G11B5/7373—Non-magnetic single underlayer comprising chromium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
- B22F3/15—Hot isostatic pressing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Abstract
A CrTi-based alloy for adhesion film layer and a target material for sputtering, for use in a magnetic recording medium, and a perpendicular magnetic recording medium using the alloy are provided. The alloy is a CrTi-based alloy having a composition formula in an atomic ratio, represented by (Cr, Mo, W)x(Ti, Ta, Zr)wo-x, 40:SX:S70; wherein the Cr element in the alloy is substituted with one or two elements selected from Mo and Win a range of Mo+W: 10 at% to X/2 at%; and the Ti element in the alloy is substituted with one or two elements selected from Ta and Zr in a range of Ta+Zr::,20 at% (including Oat%).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012094409A JP5964121B2 (en) | 2012-04-18 | 2012-04-18 | CrTi alloy for adhesion film layer and sputtering target material used for magnetic recording medium, and perpendicular magnetic recording medium using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
MY170825A true MY170825A (en) | 2019-09-04 |
Family
ID=49383427
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2014702929A MY170825A (en) | 2012-04-18 | 2013-04-11 | Crti-based alloy for adhesion film layer for use in magnetic recording medium, target material for sputtering, and perpendicular magnetic recording medium obtained using same |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5964121B2 (en) |
CN (1) | CN104246884B (en) |
MY (1) | MY170825A (en) |
SG (1) | SG11201405474QA (en) |
TW (1) | TWI576835B (en) |
WO (1) | WO2013157468A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7116782B2 (en) * | 2018-03-28 | 2022-08-10 | Jx金属株式会社 | Perpendicular magnetic recording medium |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09198641A (en) * | 1996-01-12 | 1997-07-31 | Fuji Electric Co Ltd | Magnetic recording medium |
JP3805018B2 (en) * | 1996-04-26 | 2006-08-02 | 富士通株式会社 | Magnetic recording medium and magnetic disk device |
JPH11134631A (en) * | 1997-10-27 | 1999-05-21 | Hitachi Metals Ltd | Magnetic record medium |
US6509111B1 (en) * | 1999-09-24 | 2003-01-21 | Hitachi, Ltd. | Magnetic recording media and magnetic disk apparatus |
JP2001319314A (en) * | 2000-02-29 | 2001-11-16 | Hitachi Ltd | Magnetic recording medium, its manufacturing method and magnetic recorder using the medium |
JP2004039196A (en) * | 2002-07-08 | 2004-02-05 | Showa Denko Kk | Magnetic recording medium, its manufacturing method, and magnetic recording/reproducing device |
US6942933B2 (en) * | 2002-07-08 | 2005-09-13 | Showa Denko Kabushiki Kaisha | Magnetic recording medium, production process thereof, and magnetic recording and reproducing apparatus |
US20050112019A1 (en) * | 2003-10-30 | 2005-05-26 | Kabushiki Kaisha Kobe Seiko Sho(Kobe Steel, Ltd.) | Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recording |
JP4435558B2 (en) * | 2003-12-24 | 2010-03-17 | ヒタチグローバルストレージテクノロジーズネザーランドビーブイ | Magnetic recording medium |
JP2006179133A (en) * | 2004-12-24 | 2006-07-06 | Hitachi Global Storage Technologies Netherlands Bv | Magnetic recording medium and magnetic storage device using the same |
JP4795831B2 (en) * | 2006-03-31 | 2011-10-19 | Hoya株式会社 | Magnetic recording medium |
US8025993B2 (en) * | 2007-02-23 | 2011-09-27 | Seagate Technology Llc | Recording media interlayer structure |
JP2009059431A (en) * | 2007-08-31 | 2009-03-19 | Showa Denko Kk | Magnetic recording medium and magnetic recording and reproducing apparatus |
CN101971350B (en) * | 2008-04-15 | 2012-10-10 | 株式会社爱发科 | Thin film transistor and method for producing thin film transistor |
US8685547B2 (en) * | 2009-02-19 | 2014-04-01 | Seagate Technology Llc | Magnetic recording media with enhanced writability and thermal stability |
US8279739B2 (en) * | 2009-08-20 | 2012-10-02 | Showa Denko K.K. | Heat-assisted magnetic recording medium and magnetic storage device |
JP2012033253A (en) * | 2010-07-09 | 2012-02-16 | Hitachi Ltd | Magnetic recording medium and magnetic recording device |
JP5734599B2 (en) * | 2010-08-17 | 2015-06-17 | 山陽特殊製鋼株式会社 | CrTi alloy sputtering target material and method for producing perpendicular magnetic recording medium using them |
-
2012
- 2012-04-18 JP JP2012094409A patent/JP5964121B2/en active Active
-
2013
- 2013-04-11 WO PCT/JP2013/060887 patent/WO2013157468A1/en active Application Filing
- 2013-04-11 SG SG11201405474QA patent/SG11201405474QA/en unknown
- 2013-04-11 MY MYPI2014702929A patent/MY170825A/en unknown
- 2013-04-11 CN CN201380020226.1A patent/CN104246884B/en not_active Expired - Fee Related
- 2013-04-17 TW TW102113605A patent/TWI576835B/en active
Also Published As
Publication number | Publication date |
---|---|
SG11201405474QA (en) | 2014-10-30 |
JP2013222488A (en) | 2013-10-28 |
CN104246884A (en) | 2014-12-24 |
TW201411611A (en) | 2014-03-16 |
JP5964121B2 (en) | 2016-08-03 |
TWI576835B (en) | 2017-04-01 |
WO2013157468A1 (en) | 2013-10-24 |
CN104246884B (en) | 2017-06-06 |
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