MY152453A - Separation in an imprint lithography process - Google Patents

Separation in an imprint lithography process

Info

Publication number
MY152453A
MY152453A MYPI20111598A MY152453A MY 152453 A MY152453 A MY 152453A MY PI20111598 A MYPI20111598 A MY PI20111598A MY 152453 A MY152453 A MY 152453A
Authority
MY
Malaysia
Prior art keywords
lithography process
separation
imprint lithography
template
substrate
Prior art date
Application number
Other languages
English (en)
Inventor
Byung-Jin Choi
Ganapathisubramanian Mahadevan
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of MY152453A publication Critical patent/MY152453A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
MYPI20111598 2008-10-30 2009-10-23 Separation in an imprint lithography process MY152453A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10955708P 2008-10-30 2008-10-30
US12/603,270 US8309008B2 (en) 2008-10-30 2009-10-21 Separation in an imprint lithography process

Publications (1)

Publication Number Publication Date
MY152453A true MY152453A (en) 2014-09-30

Family

ID=42130980

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20111598 MY152453A (en) 2008-10-30 2009-10-23 Separation in an imprint lithography process

Country Status (5)

Country Link
US (1) US8309008B2 (Direct)
JP (1) JP5258973B2 (Direct)
MY (1) MY152453A (Direct)
TW (1) TWI408045B (Direct)
WO (1) WO2010096043A1 (Direct)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2562452T3 (es) * 2008-07-25 2016-03-04 Viiv Healthcare Company Compuestos químicos
US8652393B2 (en) 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
JP5833636B2 (ja) 2010-04-27 2015-12-16 モレキュラー・インプリンツ・インコーポレーテッド ナノインプリント・リソグラフィのテンプレート製作方法およびそのシステム
JP5875250B2 (ja) * 2011-04-28 2016-03-02 キヤノン株式会社 インプリント装置、インプリント方法及びデバイス製造方法
JP6004738B2 (ja) * 2011-09-07 2016-10-12 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6140966B2 (ja) 2011-10-14 2017-06-07 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6472189B2 (ja) * 2014-08-14 2019-02-20 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
US10620532B2 (en) * 2014-11-11 2020-04-14 Canon Kabushiki Kaisha Imprint method, imprint apparatus, mold, and article manufacturing method
JP6774178B2 (ja) * 2015-11-16 2020-10-21 キヤノン株式会社 基板を処理する装置、及び物品の製造方法
US10578984B2 (en) * 2016-12-20 2020-03-03 Canon Kabushiki Kaisha Adaptive chucking system
TW202543157A (zh) * 2024-01-17 2025-11-01 日商Ｓｃｉｖａｘ股份有限公司 脫模方法、壓印方法、波導製造方法、超穎透鏡製造方法、光學構件的製造方法、晶圓、波導器件

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
SE515607C2 (sv) 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer
US7179079B2 (en) 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
MY164487A (en) * 2002-07-11 2017-12-29 Molecular Imprints Inc Step and repeat imprint lithography processes
US7641840B2 (en) 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
ATE540427T1 (de) 2002-11-13 2012-01-15 Molecular Imprints Inc Ein verfahren um formen von substraten zu modulieren
US20040168613A1 (en) 2003-02-27 2004-09-02 Molecular Imprints, Inc. Composition and method to form a release layer
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7150622B2 (en) 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
EP1594001B1 (en) 2004-05-07 2015-12-30 Obducat AB Device and method for imprint lithography
US7504268B2 (en) 2004-05-28 2009-03-17 Board Of Regents, The University Of Texas System Adaptive shape substrate support method
US7245358B2 (en) 2004-05-28 2007-07-17 Board Of Regents, The University Of Texas System Substrate support system
US7768624B2 (en) 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US20070164476A1 (en) * 2004-09-01 2007-07-19 Wei Wu Contact lithography apparatus and method employing substrate deformation
US20060145398A1 (en) 2004-12-30 2006-07-06 Board Of Regents, The University Of Texas System Release layer comprising diamond-like carbon (DLC) or doped DLC with tunable composition for imprint lithography templates and contact masks
US7635263B2 (en) 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US7798801B2 (en) 2005-01-31 2010-09-21 Molecular Imprints, Inc. Chucking system for nano-manufacturing
US7636999B2 (en) 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
US20070035717A1 (en) 2005-08-12 2007-02-15 Wei Wu Contact lithography apparatus, system and method
JP2007083626A (ja) * 2005-09-22 2007-04-05 Ricoh Co Ltd 微細構造転写装置
JP4533358B2 (ja) * 2005-10-18 2010-09-01 キヤノン株式会社 インプリント方法、インプリント装置およびチップの製造方法
JP2007134368A (ja) * 2005-11-08 2007-05-31 Nikon Corp パターン転写装置、露光装置及びパターン転写方法
US7803308B2 (en) 2005-12-01 2010-09-28 Molecular Imprints, Inc. Technique for separating a mold from solidified imprinting material
MY144847A (en) 2005-12-08 2011-11-30 Molecular Imprints Inc Method and system for double-sided patterning of substrates
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
US20070231422A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. System to vary dimensions of a thin template
KR20090004910A (ko) * 2006-04-03 2009-01-12 몰레큘러 임프린츠 인코퍼레이티드 유체 챔버의 어레이를 포함하는 처킹 시스템
US20070238815A1 (en) 2006-04-11 2007-10-11 Lai On Products Industrial, Ltd. Sponge-like sculpturing compound
WO2007136832A2 (en) 2006-05-18 2007-11-29 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
JP4810319B2 (ja) 2006-06-09 2011-11-09 キヤノン株式会社 加工装置及びデバイス製造方法
EP1884830A1 (en) * 2006-08-04 2008-02-06 Sony Deutschland GmbH A method of applying a material on a substrate

Also Published As

Publication number Publication date
JP2012507859A (ja) 2012-03-29
US20100110409A1 (en) 2010-05-06
US8309008B2 (en) 2012-11-13
WO2010096043A1 (en) 2010-08-26
JP5258973B2 (ja) 2013-08-07
TWI408045B (zh) 2013-09-11
TW201026483A (en) 2010-07-16

Similar Documents

Publication Publication Date Title
MY152453A (en) Separation in an imprint lithography process
TW200734706A (en) Patterning substrates employing multiple chucks
WO2011002518A3 (en) Chucking system with recessed support feature
MY165977A (en) Imprint lithography system and method
MY154171A (en) In-situ cleaning of an imprint lithography tool
MY152446A (en) Strain and kinetics control during separation phase of imprint process
WO2010042140A3 (en) Template having alignment marks formed of contrast material
WO2010039226A3 (en) Method of replication of an imprint lithography template
TW200716341A (en) Method and device for demolding
WO2009099822A3 (en) Surface modifying tool adapter
EP2684663A3 (en) Method and apparatus for manufacturing components used for the manufacture of articles
TW200801796A (en) Method for detecting a particle in a nanoimprint lithography system
SG133485A1 (en) Apparatus for pattern replication with intermediate stamp
WO2007146492A3 (en) Preheating of electrolytic cell
EP2369412A3 (en) Imprint apparatus and method of manufacturing an article
WO2012040699A3 (en) High contrast alignment marks through multiple stage imprinting
TW200736858A (en) Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus
WO2010123741A3 (en) Quartz window having gas feed and processing equipment incorporating same
JP2016004837A5 (ja) インプリント装置、インプリント方法、物品の製造方法及び供給装置
TW200640639A (en) Method of making a structured surface article
TW200608482A (en) System and method for multi-steage process control in film removal
WO2008056065A3 (fr) Dispositif de moulage et procede de fabrication
TW200717606A (en) Method for forming feature definitions
TW200515525A (en) Edge bead control method and apparatus
WO2007025519A3 (de) Verfahren und vorrichtung zum abformen von strukturen