MY129097A - Methods for forming fine patterns in semiconductor substrates - Google Patents
Methods for forming fine patterns in semiconductor substratesInfo
- Publication number
- MY129097A MY129097A MYPI9903712A MY129097A MY 129097 A MY129097 A MY 129097A MY PI9903712 A MYPI9903712 A MY PI9903712A MY 129097 A MY129097 A MY 129097A
- Authority
- MY
- Malaysia
- Prior art keywords
- resist
- resist composition
- photoresist pattern
- pattern
- forming
- Prior art date
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
A RESIST COMPOUND WHICH CAN BE USED TO FORM A FINE RESIST PATTERN THROUGH FLOWING OF THE SAME, AND A METHOD FOR FORMING A FINE PATTERN, CAPABLE OF IMPLEMENTING A SMALL FEATURE SIZE IN THE RANGE OF APPROXIMATELY 0.05-0.2 µM. THE RESIST COMPOUND INCLUDES A RESIST COMPOSITION REQUIRED FOR FORMING A PHOTORESIST PATTERN THROUGH A PHOTOLITHOGRAPHY PROCESS, AND A FREE RADICAL INITIATOR CAUSING APARTIAL CROSS-LINKING REACTION IN THE RESIST COMPOSITION WHILE BEING DECOMPOSED BY A THERMAL PROCESS AT A TEMPERATURE EQUAL TO OR HIGHER THAN THE GLASS TRANSITION TEMPERATURE OF THE RESIST COMPOSITION. IN THE METHOD FOR FORMING A FINE PATTERN, THE RESIST COMPOUND IS COATED ON A TARGET LAYER TO BE ETCHED, AND A LITHOGRAPHY PROCESS IS PERFORMED ON THE RESIST COMPOUND LAYER TO FORM A PHOTORESIST PATTERN HAVING OPENINGS EACH OF WHICH EXPOSES THE TARGET LAYER THROUGH A FIRST WIDTH. THEN, THESEMICONDUCTOR SUBSTRATE HAVING THE PHOTORESIST PATTERN IS HEATED AT A TEMPERATURE EQUAL TO OR HIGHER THAN THE GLASS TRANSITION TEMPERATURE, TO FLOW THE RESIST COMPOSITION AND TO SIMULTANEOUSLY CAUSE A PARTIAL CROSS-LINKING REACTION IN THE RESIST COMPOSITION BY THE FREE RADICALS PRODUCED FROM THE FREE RADICAL INITIATOR, RESULTING IN A MODIFIED PHOTORESIST PATTERN HAVING OPENINGS EACH OF WHICH EXPOSES THE TARGETLAYER THROUGH A SECOND WIDTH WHICH IS SMALLER THAN THE FIRST WIDTH.(FIG.1C)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR19990014271 | 1999-04-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
MY129097A true MY129097A (en) | 2007-03-30 |
Family
ID=47289740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI9903712 MY129097A (en) | 1999-04-21 | 1999-08-27 | Methods for forming fine patterns in semiconductor substrates |
Country Status (1)
Country | Link |
---|---|
MY (1) | MY129097A (en) |
-
1999
- 1999-08-27 MY MYPI9903712 patent/MY129097A/en unknown
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