MXPA06013444A - Anode for oxygen evolution. - Google Patents

Anode for oxygen evolution.

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Publication number
MXPA06013444A
MXPA06013444A MXPA06013444A MXPA06013444A MXPA06013444A MX PA06013444 A MXPA06013444 A MX PA06013444A MX PA06013444 A MXPA06013444 A MX PA06013444A MX PA06013444 A MXPA06013444 A MX PA06013444A MX PA06013444 A MXPA06013444 A MX PA06013444A
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Mexico
Prior art keywords
intermediate layer
anode
titanium
substrate
oxides
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Application number
MXPA06013444A
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Spanish (es)
Inventor
Paolo Rossi
Original Assignee
De Nora Elettrodi Spa
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Application filed by De Nora Elettrodi Spa filed Critical De Nora Elettrodi Spa
Publication of MXPA06013444A publication Critical patent/MXPA06013444A/en

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    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
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    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • C23C18/1216Metal oxides
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225Deposition of multilayers of inorganic material
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
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    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
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    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/02Hydrogen or oxygen
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
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    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/02Hydrogen or oxygen
    • C25B1/04Hydrogen or oxygen by electrolysis of water

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  • Chemical & Material Sciences (AREA)
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  • Water Treatment By Electricity Or Magnetism (AREA)
  • Prevention Of Electric Corrosion (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Abstract

An electrode for high overvoltage oxygen anodic evolution is described comprising a substrate of titanium or other valve metal, a first protective interlayer containing valve metal oxides, a second interlayer containing platinum or other noble metal, and an outer layer comprising tin, copper and antimony oxides. The electrode of the invention may be employed as anode in waste water treatment.

Description

ANODE FOR EVOLUTION OF OXYGEN FIELD OF THE INVENTION The invention relates to an anode for oxygen evolution at high overvoltage in aqueous solutions, for example to destroy organic materials in wastewater. The anodic evolution of oxygen is a very common reaction in generic water treatments, and in particular in wastewater treatments when organic or biological substances have to be destroyed at extremely low levels. The effectiveness of nascent oxygen in the destruction of organic substances depends primarily on the potential of anodic evolution, which must be as high as possible, preferably without the need for the use of excessive current densities. Other industrial processes, for example in the field of organic electrosynthesis, can make use of the evolution of oxygen at high potential over the anode of the invention, however the oxidation of organic species in aqueous solutions undoubtedly represents its most diffuse use and greater Economic importance.
BACKGROUND OF THE INVENTION The anodes for evolution of oxygen at high overvoltage of the prior art are traditionally obtained on ceramic substrates, for example based on tin dioxide variously modified with other elements, mainly to impart a sufficient electrical conductivity; also the lead dioxide represents a material traditionally used for this purpose. The geometrical limitations of this type of substrates, however, have led to the development of high-oxygen overvoltage electrodes based on valve metals, which in their preferred configuration comprise a titanium or titanium alloy substrate, a ceramic protective intermediate layer, example based on titanium and tantalum oxides, and an external layer of low catalytic activity in which the tin dioxide represents once again the majority component, usually mixed with other elements such as copper, iridium and antimony; an electrode of this type, which also comprises an intermediate catalytic layer containing mainly tantalum and iridium oxides, is described in example 6 of WO 03/100135. Although the electrode of WO 03/100135 is able to offer interesting initial benefits in the indicated application, by evolving oxygen to potentials barely above 2 V with currents of 100 A / m2 in sulfuric solution, its duration is quite unsatisfactory. Indeed, although the anode mentioned above is provided with an external layer of low catalytic activity, in the common industrial running conditions the oxygen evolution potential tends to drop abruptly within a few hundred hours, together with the efficiency of elimination of organic species. Furthermore, from the description of WO 03/100135 it can be immediately noted how the preparation method of the relative electrode is quite complex for a large scale production, due to the fact that a large number of alternate layers of two different precursors (in the example, ten alternate layers of two hands each) should be applied. It is an object of the present invention to provide an anode for oxygen evolution operating at high overvoltage, indicatively greater than 2 V (NHE) at current densities not exceeding a few hundred A / m 2, which exceeds the limitations of the prior art presenting at the same time a longer duration in industrial driving conditions. It is a further object of the present invention to provide a method for the production of an anode for high overvoltage oxygen evolution characterized by easy industrial applicability. Under a first aspect, the invention consists of an anode obtained on a ceramic substrate or preferably on a substrate of titanium, titanium alloy or other valve metal substrate, comprising a first intermediate protective layer based on valve metal oxides as is notorious in the art, a second intermediate protective layer based on noble metals and an outer layer containing tin, copper and antimony oxides. In a preferred embodiment, the substrate of titanium or titanium alloy activated according to the invention is previously provided with an appropriate roughness profile, for example by means of a sandblasting treatment and subsequent etching in sulfuric acid. In another preferred embodiment, the first intermediate layer comprises a mixture of titanium and tantalum oxides; In another preferred embodiment, the second intermediate layer based on noble metals contains platinum, more preferably in an amount comprised between 10 and 24 g / m2. The outer layer contains oxides of tin, copper and antimony, optionally in combination with other elements. The tin content is preferably between 5 and 25 g / m2, that of antimony between 0.4 and 2 g / m2, and that of copper between 0.2 and 1 g / m2; in a still more preferred embodiment, the tin is present in an amount of at least 90% by weight of the total metal content. In another aspect, the invention consists of a method for the production of an anode for evolution of high-voltage oxygen, comprising the successive application of a first intermediate protective layer based on oxides of valve metals, of a second intermediate layer a noble metal base and an outer layer containing tin, copper and antimony oxides on a ceramic substrate or in valve metal. In a preferred embodiment, the substrate is titanium or titanium alloy, previously treated to impart a suitable roughness profile, for example by means of a sandblast followed by a pickling in sulfuric acid, as described in WO 03 / 076693. Other types of treatments are possible anyway, for example thermal spraying or plasma treatments or pickling with other corrosive media. In a preferred embodiment, the first intermediate layer is obtained by application of precursors, for example titanium and tantalum chlorides, and successive thermal decomposition, for example between 450 and 600 ° C; the application of the precursor can be effected, as is known in the art, by means of different individual or combined techniques, such as spraying or application with a brush or roller. In a preferred embodiment, the second intermediate layer is obtained by thermal decomposition of hexachloroplatinic acid at a temperature of 400-600 ° C, but other forms of application of noble metals, for example through a galvanic process, can also be practiced. Precursors of other noble metals can be included during the formation of the second intermediate layer, but the presence of platinum is particularly preferred. In a particularly preferred embodiment, the outer layer is applied using a single solution containing the precursors of the tin, copper and antimony oxides, for example the relative chlorides. The solution is applied according to the prior art and preferably decomposed between 450 and 600 ° C. The anode of the invention is suitable for evolving oxygen at high overvoltage, that is to a potential indicatively higher than 2 V (NHE) at current densities of a few hundred A / m 2, with much higher life times compared to those of the anode of WO 03/100135 or other anodes of the prior art. Without wishing to limit the present invention to any particular theory, it can be presumed that, in the case of WO 03/100135, the anode tends to form fractures or cracks in the coating, discovering some areas, however limited its extension, which have a high content of iridium or in any case a significantly lower oxygen overvoltage. In the case of the anode of the invention, the eventual formation of fractures or cracks would discover areas rich in platinum, over which the oxygen overvoltage is still quite high. An explanation of this type seems to be corroborated by the data reported in the attached figure.
BRIEF DESCRIPTION OF THE FIGURE Figure 1 shows some polarization curves relating to the evolution of oxygen on the anode of the invention.
DETAILED DESCRIPTION OF THE INVENTION In particular, the curves of Figure 1 refer to the evolution of oxygen in sodium sulfate at pH 5 and at 25 ° C. It is indicated by (1) the polarization curve relative to the anode according to the invention, with (2) that relative to the anode according to the invention, provided with the two intermediate layers, respectively based on platinum-based titanium and tantalum oxides , with (3) that relative to an anode only provided with the first intermediate layer based on titanium and tantalum oxides and an external layer based on iridium and tantalum oxides. In fact, curve (2) simulates the behavior of an anode according to the invention in which the outer layer based on tin, copper and antimony oxides is totally destroyed, while curve (3) simulates the destructive situation total of the outermost layer of the anode according to WO 03/100135. The invention will be further illustrated by the example below, which does not intend to limit its scope in any way, which is only defined by the appended claims. EXAMPLE A grade 1 titanium sheet according to ASTM B 265, dimensions 45 cm x 60 cm and 2 mm thick, was treated with corundum sandblasting and etching with 25% sulfuric acid containing 10 g / l of dissolved titanium, at a temperature of 87 ° C. A solution containing titanium and tantalum chlorides was applied to the sheet, at a concentration of Ti 0.11 M and Ta 0.03 M, by electrostatic spraying followed by roller application. Four coats of solution were applied until obtaining a total load of 0.87 g / m2 of deposit, drying between one hand and the successive one at 50 ° C for 10 minutes, and successively carrying out the thermal decomposition at 520 ° C for 15 minutes.
A first intermediate layer was obtained, on which was applied a second intermediate layer constituted by 20 g / m2 of Pt. The application was carried out in three hands, brushing hexachloroplatinic acid dispersed in eugenol and by thermal decomposition for 10 minutes at 500 ° C after each hand. The outer layer was finally applied from a solution of tin chlorides (IV) (94% by weight based on the total content of metals), copper (II) (2% by weight based on total metal content) and antimony ( 4% by weight based on the total metal content). The application was made by brushstroke in 16 hands, with drying cycles at 50 ° C and decomposition at 520 ° C after each hand. The electrode of the invention thus obtained was subjected to a polarization test under evolution of oxygen in sodium sulphate at pH 5 and 25 ° C, and the results are reported in figure 1 in the curve indicated as (1). In Figure 1 are also reported the polarization data obtained in the same conditions with an equivalent electrode devoid of external layer, and with an electrode provided with a first equivalent intermediate layer, and with an outer layer containing 24 g / m2 of oxides of tantalum (35% by weight) and iridium (65% by weight). These data are reported in the curves indicated respectively as (2) and (3). Finally, the electrode of the invention was subjected to an accelerated duration test in sulfuric acid at a concentration of 150 g / l at a temperature of 60 ° C, with a current density of 20 kA / m2. After 500 hours of accelerated testing, its oxygen evolution potential in sodium sulfate at pH 5 and 25 ° C was determined at the current density of 500 A / m2: the detected potential was found to be 2.15 V (NHE). An anode prepared according to WO 03/100135, subjected to the same test, has shown an oxygen evolution potential of 1.74 V (NHE) under the same conditions. As is apparent to a person skilled in the art, the invention can be practiced by providing other variations or modifications to the alleged examples. The above description will not be understood as limiting the invention, which can be practiced according to different embodiments without departing from its objectives, and whose scope is univocally defined by the appended claims. In the description and claims of the present application, the word "understand" and its variations such as "comprises" and "understood" are not intended to exclude the presence of other accessory elements or components.

Claims (15)

  1. CLAIMS 1. Anode for evolution of oxygen at high overvoltage, comprising a valve or ceramic metal substrate, a first intermediate layer based on valve metal oxides applied to said substrate, a second intermediate layer based on noble metals applied to said first intermediate layer, an outer layer that contains oxides of tin, copper and antimony. The anode of claim 1 wherein said valve metal substrate is made of titanium or titanium alloy. The anode according to claim 2 wherein said titanium or titanium alloy substrate has a roughness profile controlled by means of a treatment comprising an etching in sulfuric acid optionally prec by a sandblasting treatment. 4. The anode according to any one of the preceding claims wherein said first intermediate layer comprises titanium and tantalum oxides. 5. The anode according to any one of the preceding claims wherein said second intermediate layer comprises 10 to 24 g / m2 of platinum. The anode according to any one of the preceding claims wherein said outer layer comprises from 5 to 25 g / m2 of tin, from 0.4 to 2 g / m2 of antimony and from 0.2 to 1 g / m2 of copper. The anode according to claim 6 wherein the tin is present in said outer layer in an amount not less than 90% by weight of the total metal content. 8. Method for the production of an anode for evolution of oxygen at high overvoltage, which comprises applying a first intermediate layer based on oxides of valve metals to a metal or valve ceramic substrate, applying a second intermediate layer based on noble metals To said first intermediate layer, apply an outer layer containing tin, copper and antimony oxides. 9. The method according to claim 8 wherein said substrate is a substrate of titanium or titanium alloy with a controlled roughness profile, obtained by means of a sandblasting treatment and successive pickling in sulfuric acid. The method according to claim 8 or 9 wherein said first intermediate layer is applied by means of at least one method selected from spraying, brushing and roller treatment from a solution of titanium and tantalum chlorides, with successive thermal decomposition at a temperature between 450 and 600 ° C. 11. The method according to any one of claims 8 to 10 wherein said second intermediate layer is applied by thermal decomposition of a solution containing hexachloroplatinic acid at a temperature comprised between 400 and 600 ° C. The method according to any one of claims 8 to 11 wherein said outer layer is applied in a multiplicity of hands from a solution containing tin, antimony and copper chlorides, with successive thermal decomposition at a temperature comprised between 450 and 600 ° C. 13. Electrochemical process comprising the anodic evolution of oxygen at a potential greater than 2 V (NHE) on an electrode according to any one of claims 1 to 7. 14. The process according to claim 13 comprising the industrial treatment of water . 15. The process according to claim 14 wherein said treatment comprises the removal of organic molecules from wastewater.
MXPA06013444A 2004-05-20 2005-05-19 Anode for oxygen evolution. MXPA06013444A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT001006A ITMI20041006A1 (en) 2004-05-20 2004-05-20 OXYGEN DEVELOPMENT ANODE
PCT/EP2005/005453 WO2005113861A1 (en) 2004-05-20 2005-05-19 Anode for oxygen evolution

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MXPA06013444A true MXPA06013444A (en) 2007-03-01

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MXPA06013444A MXPA06013444A (en) 2004-05-20 2005-05-19 Anode for oxygen evolution.

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US (1) US8083921B2 (en)
EP (1) EP1756333B1 (en)
JP (1) JP5059605B2 (en)
KR (1) KR101201689B1 (en)
CN (1) CN1957112B (en)
AU (1) AU2005245599B2 (en)
BR (1) BRPI0511437B1 (en)
ES (1) ES2581210T3 (en)
IT (1) ITMI20041006A1 (en)
MX (1) MXPA06013444A (en)
MY (1) MY142728A (en)
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Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20061947A1 (en) * 2006-10-11 2008-04-12 Industrie De Nora Spa CATHODE FOR ELECTROLYTIC PROCESSES
CN100412233C (en) * 2006-10-13 2008-08-20 扬州大学 Technological method for treating carbolic acid waste water by electrochemical oxidation
JP2010095764A (en) * 2008-10-16 2010-04-30 Japan Carlit Co Ltd:The Electrode for electrolysis and method for producing the same
WO2012040503A2 (en) 2010-09-24 2012-03-29 Det Norske Veritas As Method and apparatus for the electrochemical reduction of carbon dioxide
CN102320683B (en) * 2011-06-03 2013-03-06 大连海事大学 Titanium-based tin-antimony-platinum oxide electrode material and preparation method thereof
ITMI20111132A1 (en) * 2011-06-22 2012-12-23 Industrie De Nora Spa ANODE FOR EVOLUTION OF OXYGEN
ITMI20122035A1 (en) * 2012-11-29 2014-05-30 Industrie De Nora Spa ELECTRODE FOR EVOLUTION OF OXYGEN IN INDUSTRIAL ELECTROCHEMICAL PROCESSES
RU2577402C1 (en) * 2014-09-30 2016-03-20 Акционерное общество "Ордена Трудового Красного Знамени научно-исследовательский физико-химический институт им. Л.Я. Карпова" Anode for extracting oxygen and method of making same
CN105154913B (en) * 2015-07-02 2017-05-31 北京师范大学 A kind of water process preparation method in electro catalytic electrode middle level
CN108299868A (en) * 2016-08-25 2018-07-20 先丰通讯股份有限公司 Catalyst coating and use its anode
US11668017B2 (en) * 2018-07-30 2023-06-06 Water Star, Inc. Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes
CN109868464A (en) * 2019-03-11 2019-06-11 江阴安诺电极有限公司 Anode plate with noble coatings
JP2020153000A (en) * 2019-03-22 2020-09-24 株式会社豊田中央研究所 Electrochemical reaction device
CN114272920B (en) * 2021-11-22 2023-10-03 广东省科学院资源利用与稀土开发研究所 Composite oxide coating electrode for degrading organic pollutants and preparation method thereof
CN114351179A (en) * 2021-12-02 2022-04-15 江苏友诺环保科技有限公司 Iridium tantalum manganese coating titanium anode plate with intermediate layer and preparation method thereof

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2596776B1 (en) * 1986-04-03 1988-06-03 Atochem CATHODE FOR ELECTROLYSIS AND A METHOD FOR MANUFACTURING SAID CATHODE
JPS62284095A (en) * 1986-06-02 1987-12-09 Permelec Electrode Ltd Durable electrolytic electrode and its production
JP2574699B2 (en) * 1989-04-21 1997-01-22 ダイソー 株式会社 Oxygen generating anode and its manufacturing method
AT397436B (en) * 1990-07-26 1994-04-25 Avl Verbrennungskraft Messtech ANODE OF AN ELECTROCHEMICAL SENSOR ARRANGEMENT AND METHOD FOR THE PRODUCTION THEREOF
CA2061390A1 (en) * 1991-03-01 1992-09-02 Oronzio De Nora Metal anodes for electrolytic acid solutions containing fluorides or fluoroanionic complexes
JP3212327B2 (en) * 1991-08-30 2001-09-25 ペルメレック電極株式会社 Electrode for electrolysis
NL9101753A (en) * 1991-10-21 1993-05-17 Magneto Chemie Bv ANODES WITH EXTENDED LIFE AND METHODS FOR THEIR MANUFACTURE.
JP3236653B2 (en) * 1992-02-25 2001-12-10 ペルメレック電極株式会社 Electrode for electrolysis
LU88516A1 (en) 1993-07-21 1996-02-01 Furukawa Electric Co Ltd Electrode for generating oxygen - obtd. by coating and depositing titanium cpd. on surface of base material, applying pyrolysis to titanium cpd., under oxygen@-contg. atmos.
JP2925938B2 (en) * 1994-04-04 1999-07-28 古河電気工業株式会社 Oxygen generating electrode and method for producing the same
JPH11221570A (en) * 1998-02-05 1999-08-17 Matsushita Electric Ind Co Ltd Decomposition electrode for organic polluted water, decomposing method of organic polluted water using same and decomposing device of organic polluted water using same
JP2931812B1 (en) * 1998-04-24 1999-08-09 ティーディーケイ株式会社 Electrode for electrolysis and method for producing the same
US7247229B2 (en) 1999-06-28 2007-07-24 Eltech Systems Corporation Coatings for the inhibition of undesirable oxidation in an electrochemical cell
ITMI20020535A1 (en) * 2002-03-14 2003-09-15 De Nora Elettrodi Spa OXYGEN DEVELOPMENT ANODE AND ITS SUBSTRATE
ITMI20021128A1 (en) * 2002-05-24 2003-11-24 De Nora Elettrodi Spa ELECTRODE FOR GAS DEVELOPMENT AND METHOD FOR ITS OBTAINING

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RU2006145304A (en) 2008-06-27
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AU2005245599A1 (en) 2005-12-01
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US8083921B2 (en) 2011-12-27
KR20070012721A (en) 2007-01-26
ZA200609264B (en) 2008-05-28
WO2005113861A1 (en) 2005-12-01
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ITMI20041006A1 (en) 2004-08-20
TW200540297A (en) 2005-12-16
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