MX2021007195A - Metodo para suprimir el aumento de la concentracion de zinc de una solucion de chapado y metodo para producir una pieza de chapado a base de zinc. - Google Patents
Metodo para suprimir el aumento de la concentracion de zinc de una solucion de chapado y metodo para producir una pieza de chapado a base de zinc.Info
- Publication number
- MX2021007195A MX2021007195A MX2021007195A MX2021007195A MX2021007195A MX 2021007195 A MX2021007195 A MX 2021007195A MX 2021007195 A MX2021007195 A MX 2021007195A MX 2021007195 A MX2021007195 A MX 2021007195A MX 2021007195 A MX2021007195 A MX 2021007195A
- Authority
- MX
- Mexico
- Prior art keywords
- plating
- zinc
- separator
- positive electrode
- plating solution
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/06—Filtering particles other than ions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Se proporciona un método para suprimir el aumento en la concentración de zinc de una solución de chapado cuando una pieza de chapado de aleación de zinc que utiliza níquel como elemento de aleación se fabrica utilizando un aparato de chapado de aleación de zinc. El aparato de chapado incluye: un tanque de chapado capaz de alojar la solución de chapado ácida; un primer tanque de diafragma que es capaz de alojar la primera solución electrolítica y tiene un primer diafragma compuesto por una membrana de intercambio catiónico; una pieza de sujeción catódica para catodizar por electrólisis una pieza para chapar que está en contacto con la solución de chapado en el interior del tanque de chapado durante el uso; una primera pieza de sujeción anódica para anodizar por electrólisis una pieza que contiene zinc soluble que está en contacto con la primera solución electrolítica en el interior del primer tanque de diafragma durante el uso; la pieza que contiene zinc soluble sujeta por la primera pieza de sujeción anódica; una pieza que contiene metal soluble que incluye níquel, que es el elemento de aleación; y una segunda pieza de sujeción anódica para anodizar por electrólisis la pieza que contiene metal soluble. El primer tanque de diafragma está dispuesto de manera que la primera solución electrolítica está en contacto con una superficie del primer diafragma y la solución de chapado está en contacto con la otra superficie del primer diafragma durante el uso.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019214897A JP6750186B1 (ja) | 2019-11-28 | 2019-11-28 | めっき液の亜鉛濃度の上昇を抑制する方法および亜鉛系めっき部材の製造方法 |
PCT/JP2020/031629 WO2021106291A1 (ja) | 2019-11-28 | 2020-08-21 | めっき液の亜鉛濃度の上昇を抑制する方法および亜鉛系めっき部材の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2021007195A true MX2021007195A (es) | 2022-03-18 |
Family
ID=72240854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2021007195A MX2021007195A (es) | 2019-11-28 | 2020-08-21 | Metodo para suprimir el aumento de la concentracion de zinc de una solucion de chapado y metodo para producir una pieza de chapado a base de zinc. |
Country Status (6)
Country | Link |
---|---|
US (1) | US20220298668A1 (es) |
EP (1) | EP3868924A4 (es) |
JP (1) | JP6750186B1 (es) |
CN (1) | CN113195798A (es) |
MX (1) | MX2021007195A (es) |
WO (1) | WO2021106291A1 (es) |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2084191A (en) * | 1980-09-23 | 1982-04-07 | Vandervell Products Ltd | Electro-deposition of alloys |
DE19834353C2 (de) | 1998-07-30 | 2000-08-17 | Hillebrand Walter Gmbh & Co Kg | Alkalisches Zink-Nickelbad |
US8377283B2 (en) * | 2002-11-25 | 2013-02-19 | Coventya, Inc. | Zinc and zinc-alloy electroplating |
US7135103B2 (en) * | 2003-10-20 | 2006-11-14 | Waseda University | Preparation of soft magnetic thin film |
JP4822268B2 (ja) * | 2005-04-19 | 2011-11-24 | ユケン工業株式会社 | 回収型電気亜鉛めっき方法および装置 |
JP4738910B2 (ja) * | 2005-06-21 | 2011-08-03 | 日本表面化学株式会社 | 亜鉛−ニッケル合金めっき方法 |
EP1870495A1 (de) * | 2006-06-21 | 2007-12-26 | Atotech Deutschland Gmbh | Wässriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- und Zinklegierungsüberzügen |
DE102008056776A1 (de) * | 2008-11-11 | 2010-05-12 | Enthone Inc., West Haven | Galvanisches Bad und Verfahren zur Abscheidung von zinkhaltigen Schichten |
US20160024683A1 (en) * | 2013-03-21 | 2016-01-28 | Atotech Deutschland Gmbh | Apparatus and method for electrolytic deposition of metal layers on workpieces |
-
2019
- 2019-11-28 JP JP2019214897A patent/JP6750186B1/ja active Active
-
2020
- 2020-08-21 EP EP20886179.9A patent/EP3868924A4/en not_active Withdrawn
- 2020-08-21 MX MX2021007195A patent/MX2021007195A/es unknown
- 2020-08-21 WO PCT/JP2020/031629 patent/WO2021106291A1/ja unknown
- 2020-08-21 US US17/297,470 patent/US20220298668A1/en not_active Abandoned
- 2020-08-21 CN CN202080006376.7A patent/CN113195798A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
JP6750186B1 (ja) | 2020-09-02 |
WO2021106291A1 (ja) | 2021-06-03 |
JP2021085068A (ja) | 2021-06-03 |
US20220298668A1 (en) | 2022-09-22 |
CN113195798A (zh) | 2021-07-30 |
EP3868924A1 (en) | 2021-08-25 |
EP3868924A4 (en) | 2022-03-09 |
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