MX2019006705A - Arreglos que incluyen una película de resina y una capa de polímero con patrón. - Google Patents

Arreglos que incluyen una película de resina y una capa de polímero con patrón.

Info

Publication number
MX2019006705A
MX2019006705A MX2019006705A MX2019006705A MX2019006705A MX 2019006705 A MX2019006705 A MX 2019006705A MX 2019006705 A MX2019006705 A MX 2019006705A MX 2019006705 A MX2019006705 A MX 2019006705A MX 2019006705 A MX2019006705 A MX 2019006705A
Authority
MX
Mexico
Prior art keywords
resin film
polymer layer
support
discrete areas
epoxy poss
Prior art date
Application number
MX2019006705A
Other languages
English (en)
Inventor
A Brown Andrew
N George Wayne
Richez Alexandre
Rose ZAK Audrey
Shane Bowen M
Yuan Dajun
M Ramirez Sean
Campos Raymond
Original Assignee
Illumina Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Illumina Inc filed Critical Illumina Inc
Publication of MX2019006705A publication Critical patent/MX2019006705A/es

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • CCHEMISTRY; METALLURGY
    • C12BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12QMEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
    • C12Q1/00Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
    • C12Q1/68Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions involving nucleic acids
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • C09D183/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/24Homopolymers or copolymers of amides or imides
    • C09D133/26Homopolymers or copolymers of acrylamide or methacrylamide
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups

Abstract

Un ejemplo de un arreglo incluye un soporte, una película de resina de silsesquioxano poliédrico oligomérico (POSS) de epoxi reticulada en una superficie del soporte, y una capa de polímero hidrófobo patrón en la película de resina epoxi de POSS reticulada. La capa de polímero hidrófobo patrón define las áreas discretas expuestas de la película de resina epoxi de POSS reticulada, y una capa de polímero se une a las áreas discretas expuestas. Otro ejemplo de un arreglo incluye un soporte, una película de resina epoxi de POSS modificada en una superficie del soporte, y una capa de polímero hidrófobo patrón en la película de resina epoxi de POSS modificada. La película de resina epoxi de POSS modificada incluye un sitio de iniciación de crecimiento de polímero, y la capa de polímero hidrófobo patrón define áreas discretas expuestas de la película de resina epoxi de POSS modificada. Un cepillo de polímero se une al sitio de iniciación de crecimiento de polímero en las áreas discretas expuestas.
MX2019006705A 2016-12-22 2017-12-20 Arreglos que incluyen una película de resina y una capa de polímero con patrón. MX2019006705A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201662438024P 2016-12-22 2016-12-22
PCT/US2017/067557 WO2018119053A1 (en) 2016-12-22 2017-12-20 Arrays including a resin film and a patterned polymer layer

Publications (1)

Publication Number Publication Date
MX2019006705A true MX2019006705A (es) 2019-11-08

Family

ID=62625689

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2019006705A MX2019006705A (es) 2016-12-22 2017-12-20 Arreglos que incluyen una película de resina y una capa de polímero con patrón.

Country Status (15)

Country Link
US (2) US11512339B2 (es)
EP (1) EP3558511A4 (es)
JP (1) JP7123928B2 (es)
KR (1) KR102512186B1 (es)
CN (1) CN110248725B (es)
AU (1) AU2017382202B2 (es)
CA (1) CA3046532A1 (es)
IL (1) IL267444A (es)
MX (1) MX2019006705A (es)
PH (1) PH12019501411A1 (es)
RU (1) RU2760391C2 (es)
SA (1) SA519402158B1 (es)
TW (1) TWI757396B (es)
WO (1) WO2018119053A1 (es)
ZA (1) ZA201903898B (es)

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Also Published As

Publication number Publication date
KR20190099489A (ko) 2019-08-27
WO2018119053A1 (en) 2018-06-28
US20180179575A1 (en) 2018-06-28
TWI757396B (zh) 2022-03-11
IL267444A (en) 2019-08-29
CA3046532A1 (en) 2018-06-28
TW201840665A (zh) 2018-11-16
PH12019501411A1 (en) 2020-06-08
US11512339B2 (en) 2022-11-29
RU2760391C2 (ru) 2021-11-24
CN110248725A (zh) 2019-09-17
AU2017382202B2 (en) 2022-06-09
US11932900B2 (en) 2024-03-19
AU2017382202A1 (en) 2019-06-20
JP2020503854A (ja) 2020-02-06
RU2019117660A3 (es) 2021-03-23
JP7123928B2 (ja) 2022-08-23
RU2019117660A (ru) 2021-01-22
US20230109614A1 (en) 2023-04-06
CN110248725B (zh) 2022-08-02
KR102512186B1 (ko) 2023-03-20
EP3558511A1 (en) 2019-10-30
BR112019013076A2 (pt) 2020-02-04
EP3558511A4 (en) 2020-11-25
ZA201903898B (en) 2023-12-20
SA519402158B1 (ar) 2023-03-14

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