MX2018008853A - Una composición de resina fotocurable para la fabricación estereolitográfica de artículos tridimensionales producidos con dicha composición y un método relativo de fabricación. - Google Patents

Una composición de resina fotocurable para la fabricación estereolitográfica de artículos tridimensionales producidos con dicha composición y un método relativo de fabricación.

Info

Publication number
MX2018008853A
MX2018008853A MX2018008853A MX2018008853A MX2018008853A MX 2018008853 A MX2018008853 A MX 2018008853A MX 2018008853 A MX2018008853 A MX 2018008853A MX 2018008853 A MX2018008853 A MX 2018008853A MX 2018008853 A MX2018008853 A MX 2018008853A
Authority
MX
Mexico
Prior art keywords
acro
manufacturing
compound
composition
photocurable resin
Prior art date
Application number
MX2018008853A
Other languages
English (en)
Inventor
Hagiwara Tsuneo
Iketani Satoshi
Original Assignee
Dws Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dws Srl filed Critical Dws Srl
Publication of MX2018008853A publication Critical patent/MX2018008853A/es

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2033/00—Use of polymers of unsaturated acids or derivatives thereof as moulding material
    • B29K2033/04—Polymers of esters
    • B29K2033/08—Polymers of acrylic acid esters, e.g. PMA, i.e. polymethylacrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2033/00—Use of polymers of unsaturated acids or derivatives thereof as moulding material
    • B29K2033/04—Polymers of esters
    • B29K2033/12—Polymers of methacrylic acid esters, e.g. PMMA, i.e. polymethylmethacrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2075/00—Use of PU, i.e. polyureas or polyurethanes or derivatives thereof, as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

La invencion se refiere a una composicion de resina liquida fotocurable para estereolitografia, que comprende (i) al menos un compuesto polimerizable por radicales (A) representado por la siguiente formula general (I): R4O-CO-NH-R2-NH-CO-O-R1-O-CO-NH-R3- NHCO- OR4 (I), en donde R1 es un residuo de politetrametilenglicol lineal o ramificado que tiene un peso molecular promedio de 200 a 3,000 g/mol; R2 es un residuo compuesto de diisocianato; R3 es un residuo de compuesto de diisocianato que es el mismo o diferente de R2; y R4 se seleccionan de AcrO-CH2-CH2-, (AcrO-CH2)2CH-, (AcrO-CH2)3C-CH2-, AcrO CH2-CHCH3-, AcrO-CH2-CHC2H5- y (AcrO-CH2)2C(C2H5)CH2-, preferiblemente de AcrO-CH2-CH2- y (AcrO-CH2)2CH-, mas preferiblemente es AcrO-CH2-CH2-; en donde Acr es CH2=C(R)-CO- y R es un atomo de hidrogeno o un grupo de metilo; (ii) al menos un compuesto organico radicalmente polimerizable (B) diferente del compuesto (A); y (iii) un iniciador de polimerizacion de radicales fotosensibles (C), en donde el contenido de dicho compuesto polimerizable por radicales (A) varia de 5% a 70% en peso basado en la cantidad total de compuestos (A) y (B). La invencion describe ademas un uso y metodo estereolitografico correspondiente y articulos tridimensionales producidos con el mismo.
MX2018008853A 2016-01-28 2017-01-27 Una composición de resina fotocurable para la fabricación estereolitográfica de artículos tridimensionales producidos con dicha composición y un método relativo de fabricación. MX2018008853A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ITUB2016A000408A ITUB20160408A1 (it) 2016-01-28 2016-01-28 Composizione di resina fotoindurente per produzioni stereolitografiche, articoli tridimensionali prodotti con detta composizione e relativo metodo di produzione
PCT/IB2017/050449 WO2017130153A1 (en) 2016-01-28 2017-01-27 A photocurable resin composition for stereolithographic manufacturing, three-dimensional articles produced with said composition and a relative manufacturing method

Publications (1)

Publication Number Publication Date
MX2018008853A true MX2018008853A (es) 2019-01-14

Family

ID=55806678

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2018008853A MX2018008853A (es) 2016-01-28 2017-01-27 Una composición de resina fotocurable para la fabricación estereolitográfica de artículos tridimensionales producidos con dicha composición y un método relativo de fabricación.

Country Status (15)

Country Link
US (1) US11042088B2 (es)
EP (1) EP3408708B1 (es)
JP (1) JP6970673B2 (es)
KR (1) KR20180098382A (es)
CN (1) CN108475011A (es)
BR (1) BR112018014407A2 (es)
CA (1) CA3009615A1 (es)
HK (1) HK1258601A1 (es)
IL (1) IL260355A (es)
IT (1) ITUB20160408A1 (es)
MX (1) MX2018008853A (es)
RU (1) RU2689578C1 (es)
SG (1) SG11201805416RA (es)
TW (1) TWI648331B (es)
WO (1) WO2017130153A1 (es)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR112020010358A2 (pt) * 2017-12-01 2020-11-10 Lego A/S cubo de construção de brinquedo fabricado de maneira aditiva
CN115284609B (zh) * 2022-08-01 2024-06-18 深圳市金石三维打印科技有限公司 光固化3d打印机的构件表面平滑打印方法、装置及设备

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1352063A (en) 1971-01-08 1974-05-15 Ici Ltd Polymerisable compositions and resins derived thererom
GB1465897A (en) 1973-04-24 1977-03-02 Ici Ltd Dental compositions
GB1498421A (en) 1974-05-21 1978-01-18 Ici Ltd Dental compositions
IT1190382B (it) 1985-07-26 1988-02-16 Montedison Spa Diesteri acrilici per bisfenolo alchil etere,relativi polimeri e compositi per uso dentale
DE3820498A1 (de) 1988-06-16 1989-12-21 Bayer Ag Dentalwerkstoffe
GB8815065D0 (en) 1988-06-24 1988-08-03 Ici Plc Prosthetic devices
JPH0452042Y2 (es) 1988-07-13 1992-12-08
JP3276388B2 (ja) 1992-01-13 2002-04-22 株式会社ジーシー 歯科用修復材組成物
JP3419488B2 (ja) 1993-03-09 2003-06-23 株式会社クラレ 光重合性歯科用組成物
DE4443702A1 (de) 1994-12-08 1996-06-13 Ivoclar Ag Feinkörnige unter Druck oder Scherbeanspruchung fließfähige polymerisierbare Zusammensetzungen
JPH0970897A (ja) * 1995-07-06 1997-03-18 Japan Synthetic Rubber Co Ltd 光造形法
JPH09217004A (ja) * 1996-02-09 1997-08-19 Takemoto Oil & Fat Co Ltd 光学的立体造形用光硬化性組成物
EP0802455B1 (en) * 1996-04-15 2002-10-16 Teijin Seiki Co., Ltd. Use of a photocurable resin composition for the production of a stereolithographed object
JP2000171969A (ja) * 1998-12-03 2000-06-23 Mitsubishi Chemicals Corp 感光性樹脂積層体
JP4315507B2 (ja) * 1999-01-08 2009-08-19 ナブテスコ株式会社 耐熱性に優れる光硬化性樹脂組成物
JP4067718B2 (ja) * 1999-09-20 2008-03-26 Ｊｓｒ株式会社 樹脂製型の処理法および樹脂製型
DE19961342B4 (de) 1999-12-17 2004-02-19 3M Espe Ag Radikalisch härtbare Urethanpräpolymere und deren Verwendung
DE10114290B4 (de) 2001-03-23 2004-08-12 Ivoclar Vivadent Ag Desktop-Verfahren zur Herstellung von Dentalprodukten unter Verwendung des 3D-Plottings
FR2857668B1 (fr) 2003-07-16 2006-01-13 Commissariat Energie Atomique Composition photopolymerisable a base d'une resine expoxyvinylester et d'une resine urethane acrylate et utilisation de ladite composition pour realiser des preformes et/ou des maquettes de protheses dentaires.
US7262228B2 (en) 2003-11-21 2007-08-28 Curators Of The University Of Missouri Photoinitiator systems with anthracene-based electron donors for curing cationically polymerizable resins
JP4564834B2 (ja) * 2004-09-24 2010-10-20 Ｊｓｒ株式会社 光ファイバアップジャケット用液状硬化性樹脂組成物
RU2408627C2 (ru) * 2005-10-27 2011-01-10 Хантсман Эдвантс Матириалз (Свитзерланд) Гмбх Свободная от сурьмы фотоотверждаемая полимерная композиция и трехмерное изделие
DE602006044294C5 (de) 2005-11-30 2019-10-31 3Shape A/S Herstellung eines Dentalmodells
DE102007010624B4 (de) 2007-03-02 2009-04-30 Deltamed Gmbh Vorrichtung zur schichtweisen generativen Herstellung dreidimensionaler Formteile, Verfahren zur Herstellung dieser Formteile sowie diese Formteile
EP2151214B1 (de) 2008-07-30 2013-01-23 Ivoclar Vivadent AG Lichthärtende Schlicker für die stereolithographische Herstellung von Dentalkeramiken
WO2010045950A1 (de) 2008-10-20 2010-04-29 Ivoclar Vivadent Ag Vorrichtung und verfahren zur verarbeitung von lichtpolymerisierbarem material zum schichtweisen aufbau von formkörpern
CN101776844A (zh) * 2009-01-14 2010-07-14 北京光创物成材料科技有限公司 一种用于立体成像的光固化组份
KR20110127137A (ko) * 2009-02-04 2011-11-24 니폰 가야꾸 가부시끼가이샤 활성 에너지선 경화형 하드코트용 수지 조성물과 그의 용도
JP2011085614A (ja) 2009-10-13 2011-04-28 Jsr Corp 歯牙模型およびその製造方法
RU2557961C2 (ru) 2009-12-22 2015-07-27 3М Инновейтив Пропертиз Компани Стоматологические композиции, заготовки для стоматологического протезирования и способы
US8292625B2 (en) * 2010-07-23 2012-10-23 Pulpdent Corporation Radically curable urethane dimethacrylates and compositions thereof for tougher dental prosthetics
US9120270B2 (en) 2012-04-27 2015-09-01 University Of Southern California Digital mask-image-projection-based additive manufacturing that applies shearing force to detach each added layer
JP2013242941A (ja) * 2012-05-22 2013-12-05 Nippon Kayaku Co Ltd 紫外線硬化型樹脂組成物
JP6197043B2 (ja) * 2012-11-14 2017-09-13 デンツプライ シロナ インコーポレーテッド 歯科製品を製造するための三次元加工材料系
JP2015043793A (ja) * 2013-08-27 2015-03-12 ディーダブルエス エス・アール・エル 人工歯の製造方法
CN103642382B (zh) * 2013-11-25 2015-07-22 中国科学院长春应用化学研究所 紫外光固化抗污涂料及其制备方法
JP6158742B2 (ja) * 2014-04-17 2017-07-05 株式会社オートネットワーク技術研究所 光硬化性防水剤およびワイヤーハーネス

Also Published As

Publication number Publication date
BR112018014407A2 (pt) 2018-12-11
KR20180098382A (ko) 2018-09-03
CA3009615A1 (en) 2017-08-03
EP3408708A1 (en) 2018-12-05
IL260355A (en) 2018-08-30
WO2017130153A1 (en) 2017-08-03
US20190011832A1 (en) 2019-01-10
ITUB20160408A1 (it) 2017-07-28
HK1258601A1 (zh) 2019-11-15
RU2689578C1 (ru) 2019-05-28
SG11201805416RA (en) 2018-07-30
TWI648331B (zh) 2019-01-21
JP6970673B2 (ja) 2021-11-24
TW201726797A (zh) 2017-08-01
CN108475011A (zh) 2018-08-31
EP3408708B1 (en) 2020-03-18
JP2019505628A (ja) 2019-02-28
US11042088B2 (en) 2021-06-22

Similar Documents

Publication Publication Date Title
ATE548431T1 (de) Hard-coat-zusammensetzung
EP2147937A4 (en) LIGHT AND / OR HEAT-CURABLE COPOLYMER, HARDENABLE RESIN COMPOSITIONS AND HARDENED OBJECTS
ATE514690T1 (de) Pyrazolderivate mit affinität zu cb1 und/oder cb2 rezeptoren
SG11201901510VA (en) Negative type photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, and method of producing cured film
TW200619852A (en) Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same
ATE460419T1 (de) Organosiliciumverbindungen, ihre herstellung und ihre verwendung
ATE412703T1 (de) Sulfoniuminitiatoren, verfahren zur herstellung und verwendung für kationische polymerisierbare zusammensetzungen
MX2015005793A (es) Composicion reticulable curable para uso como material para perdida de circulacion.
WO2002083763A1 (fr) Regulateurs de polymerisation et compositions pour resine
NO20085274L (no) Malingsammensetning
MX2018008853A (es) Una composición de resina fotocurable para la fabricación estereolitográfica de artículos tridimensionales producidos con dicha composición y un método relativo de fabricación.
ATE527308T1 (de) Ungesättigtes polyesterharz oder vinylesterharz enthaltende zusammensetzung
WO2014021355A4 (en) (meth)acrylate compound, optical composition, molded article, and optical element
EP4102262A3 (en) Thermoplastic resin, method for manufacturing same, and optical lens
SG11201908747YA (en) (meth)acrylic copolymer, method for producing same, resin composition and antifouling paint composition
MY187872A (en) Fluidity modifier, composition containing same, and cured product of said composition
MX2021007004A (es) Materiales de polihidroxialquilamida para su uso como reticulantes.
IN2014DN07594A (es)
WO2008105138A1 (ja) ポリチオウレタン系光学材料用重合触媒、それを含む重合性組成物、それより得られる光学材料、およびその製造方法
JP2014509689A5 (es)
PL2447294T3 (pl) Mieszane aminy policykloalifatyczne (MPCA) i alkilaty MPCA
MX2017016634A (es) Polimero como espesante y agente de suspension.
IN2012DN04933A (es)
KR20180084460A (ko) 신규한 비닐페닐옥시기를 포함하는 화합물 및 이를 포함하는 감광성 포토레지스트 조성물
WO2011090668A3 (en) Epoxy compositions and surfacing films therefrom