MX2016010017A - Sensor de iones basado en medida diferencial y metodo de fabricacion. - Google Patents

Sensor de iones basado en medida diferencial y metodo de fabricacion.

Info

Publication number
MX2016010017A
MX2016010017A MX2016010017A MX2016010017A MX2016010017A MX 2016010017 A MX2016010017 A MX 2016010017A MX 2016010017 A MX2016010017 A MX 2016010017A MX 2016010017 A MX2016010017 A MX 2016010017A MX 2016010017 A MX2016010017 A MX 2016010017A
Authority
MX
Mexico
Prior art keywords
microdeposit
sensor based
ion
differential measurement
manufacturing
Prior art date
Application number
MX2016010017A
Other languages
English (en)
Spanish (es)
Inventor
BALDI COLL Antoni
DOMÍNGUEZ HORNA Carlos
Jiménez Jorquera Cecilia
FERNÁNDEZ SÁNCHEZ César
LLOBERA ADAN Andreu
Merlos Domingo Ángel
CADARSO BUSTO Alfredo
Burdallo Bautista Isabel
Vera Gras Ferrán
Original Assignee
Consejo Superior De Investig Científicas (Csic)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consejo Superior De Investig Científicas (Csic) filed Critical Consejo Superior De Investig Científicas (Csic)
Publication of MX2016010017A publication Critical patent/MX2016010017A/es

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/403Cells and electrode assemblies
    • G01N27/414Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/201Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates the substrates comprising an insulating layer on a semiconductor body, e.g. SOI
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P54/00Cutting or separating of wafers, substrates or parts of devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/131Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/015Manufacture or treatment of bond wires
    • H10W72/01515Forming coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/931Shapes of bond pads
    • H10W72/932Plan-view shape, i.e. in top view

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Molecular Biology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Computer Hardware Design (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
MX2016010017A 2014-02-11 2015-01-29 Sensor de iones basado en medida diferencial y metodo de fabricacion. MX2016010017A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ES201430180A ES2542927R1 (es) 2014-02-11 2014-02-11 Sensor de iones basado en medida diferencial, método de fabricación y método de medida
PCT/ES2015/070063 WO2015121516A1 (es) 2014-02-11 2015-01-29 Sensor de iones basado en medida diferencial y método de fabricación

Publications (1)

Publication Number Publication Date
MX2016010017A true MX2016010017A (es) 2016-10-07

Family

ID=52633296

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016010017A MX2016010017A (es) 2014-02-11 2015-01-29 Sensor de iones basado en medida diferencial y metodo de fabricacion.

Country Status (9)

Country Link
US (3) US10067085B2 (https=)
EP (1) EP3106865B1 (https=)
JP (1) JP2017505443A (https=)
KR (1) KR20160119096A (https=)
CN (1) CN106104265A (https=)
CA (1) CA2938155A1 (https=)
ES (2) ES2542927R1 (https=)
MX (1) MX2016010017A (https=)
WO (1) WO2015121516A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2542927R1 (es) * 2014-02-11 2015-09-09 Consejo Superior De Investigaciones Científicas (Csic) Sensor de iones basado en medida diferencial, método de fabricación y método de medida
ES2597129B1 (es) * 2015-07-13 2017-11-08 Consejo Superior De Investigaciones Científicas (Csic) Sensor de iones de medida diferencial
US12117415B2 (en) * 2017-05-15 2024-10-15 Analog Devices International Unlimited Company Integrated ion sensing apparatus and methods
CA3088168A1 (en) 2017-11-07 2019-05-16 Lic Automation Limited System and method for analysis of a fluid
JP7173731B2 (ja) * 2017-12-15 2022-11-16 株式会社 堀場アドバンスドテクノ 電磁気センサ
CN108565262A (zh) * 2018-04-17 2018-09-21 重庆第二师范学院 一种用于生化分析的阵列式传感器集成芯片及其制备方法
US20200316002A1 (en) * 2019-04-03 2020-10-08 Devicare SL Prevention of urinary tract device encrustation
CN114930166A (zh) * 2020-01-13 2022-08-19 贝克曼库尔特有限公司 固态离子选择性电极
JP7611795B2 (ja) * 2021-09-29 2025-01-10 ラピスセミコンダクタ株式会社 測定装置、測定方法、イオン感応半導体デバイス
SE545362C2 (en) * 2021-12-22 2023-07-18 Senseair Ab Capped semiconductor based sensor and method for its fabrication
CN119470598B (zh) * 2025-01-14 2025-04-22 南京大学 一种半导体场效应晶体管液体传感器及其制造方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2096825A (en) * 1981-04-09 1982-10-20 Sibbald Alastair Chemical sensitive semiconductor field effect transducer
EP0155725A1 (en) 1984-02-27 1985-09-25 Sentron v.o.f. Ion concentration measurement system that employs measuring and reference field effect transistor electrodes sensitive to the same ion
JPS63128253A (ja) * 1986-11-19 1988-05-31 Seitai Kinou Riyou Kagakuhin Shinseizou Gijutsu Kenkyu Kumiai 半導体化学センサ
US4874499A (en) * 1988-05-23 1989-10-17 Massachusetts Institute Of Technology Electrochemical microsensors and method of making such sensors
US5250168A (en) 1990-07-03 1993-10-05 Hitachi, Ltd. Integrated ion sensor
JPH0580026A (ja) * 1991-09-24 1993-03-30 Fuji Electric Co Ltd 半導体イオンセンサ
TW533593B (en) * 2002-05-20 2003-05-21 Univ Nat Yunlin Sci & Tech Method of manufacturing amorphous hydrocarbon pH ion sensitive field effect transistor and method and device of measuring temperature parameter, drift and hysteresis thereof
GB2416210B (en) * 2004-07-13 2008-02-20 Christofer Toumazou Ion sensitive field effect transistors
JP4731544B2 (ja) * 2007-12-17 2011-07-27 株式会社日立製作所 生体分子検出装置及びそれを用いた生体分子検出方法
WO2009119319A1 (ja) * 2008-03-27 2009-10-01 株式会社堀場製作所 イオンセンサ
CN102170820A (zh) * 2008-08-05 2011-08-31 Ph值诊断公司 用于确定哺乳动物的生理状态的装置、方法和系统
US9518953B2 (en) * 2011-09-07 2016-12-13 Technion Research And Development Foundation Ltd. Ion sensitive detector
EP2570803B1 (en) * 2011-09-16 2018-03-21 Nxp B.V. pH sensor and manufacturing method
US20130158378A1 (en) * 2011-09-22 2013-06-20 The Ohio State University Ionic barrier for floating gate in vivo biosensors
US9304103B2 (en) * 2011-09-30 2016-04-05 Sentient Technologies, Inc. Self-calibrating ion meter
US20130084214A1 (en) * 2011-09-30 2013-04-04 Frederick Quincy Johnson Ion-Selective Ion Concentration Meter
US9689835B2 (en) * 2011-10-31 2017-06-27 Taiwan Semiconductor Manufacturing Company, Ltd. Amplified dual-gate bio field effect transistor
US9459234B2 (en) * 2011-10-31 2016-10-04 Taiwan Semiconductor Manufacturing Company, Ltd., (“TSMC”) CMOS compatible BioFET
US8963216B2 (en) * 2013-03-13 2015-02-24 Life Technologies Corporation Chemical sensor with sidewall spacer sensor surface
RU2649049C2 (ru) * 2013-04-18 2018-03-29 Соленис Текнолоджиз Кейман, Л.П. Устройство и способ для обнаружения и анализа отложений
KR101540254B1 (ko) * 2013-06-24 2015-07-30 경북대학교 산학협력단 당을 감지하는 화학감각수용체를 발현하는 세포를 이용한 바이오 센서 및 이를 포함하는 알츠하이머 진단 기기
US9978689B2 (en) * 2013-12-18 2018-05-22 Nxp Usa, Inc. Ion sensitive field effect transistors with protection diodes and methods of their fabrication
ES2542927R1 (es) * 2014-02-11 2015-09-09 Consejo Superior De Investigaciones Científicas (Csic) Sensor de iones basado en medida diferencial, método de fabricación y método de medida
US9733210B2 (en) * 2014-12-31 2017-08-15 International Business Machines Corporation Nanofluid sensor with real-time spatial sensing

Also Published As

Publication number Publication date
US10436743B2 (en) 2019-10-08
US20170010237A1 (en) 2017-01-12
WO2015121516A1 (es) 2015-08-20
JP2017505443A (ja) 2017-02-16
US20190017958A1 (en) 2019-01-17
US20200025710A1 (en) 2020-01-23
US10067085B2 (en) 2018-09-04
US11029278B2 (en) 2021-06-08
CA2938155A1 (en) 2015-08-20
CN106104265A (zh) 2016-11-09
ES2542927A2 (es) 2015-08-12
KR20160119096A (ko) 2016-10-12
EP3106865A1 (en) 2016-12-21
ES2542927R1 (es) 2015-09-09
EP3106865B1 (en) 2020-06-10
ES2818111T3 (es) 2021-04-09

Similar Documents

Publication Publication Date Title
MX2016010017A (es) Sensor de iones basado en medida diferencial y metodo de fabricacion.
IN2014CN03520A (https=)
BR112015032445A2 (pt) componente semicondutor orgânico
BR112015016904A2 (pt) elementos eletrônicos encapsulados
MA38539A1 (fr) Dispositif de conservation à élévations tridimensionnelles
MX2016002058A (es) Suministro selectivo de material a celulas.
EA201690210A1 (ru) Структура сборки стекла и способ сборки стекла, использующий эту структуру
BR112015022763A8 (pt) sensor para detectar um analito
AR093122A1 (es) Conductor aereo recubierto y metodo para hacerlo
ITUB20161187A1 (it) Sistema e procedimento per l’associazione dei risultati di analisi eseguite su campioni biologici, in particolare campioni biologici sottoposti ad indagini cliniche, con variabili pre-analitiche a cui detti campioni sono esposti.
BR112015019923A2 (pt) membro de lente óptica que compreende elemento de referência de subsuperfície
JP2015213072A5 (ja) 表示装置の作製方法
JP2012256411A5 (https=)
JP2016192576A5 (https=)
JP2011216870A5 (https=)
WO2014183013A3 (en) Guanine chemiluminescence compound and applications
CY1125447T1 (el) Ειδικες πρωτεινες για baff και b7rp1 και χρησεις αυτων
MX390764B (es) Ensayos dispersables en agua
DK3172565T3 (da) Kapillærassayindretning med indvendig hydrofil coating
KR102276146B9 (ko) 박막 트랜지스터 기판 및 이의 제조 방법
EP3611812A4 (en) SURFACE-EMITTING SEMICONDUCTOR LASER AND SENSOR MODULE
GB2529952A (en) Trigate transistor structure with unrecessed field insulator and thinner electrodes over the field insulator
EP2973724A4 (en) Iii-nitride transistor with engineered substrate
JP2013218311A5 (https=)
WO2017052308A3 (ko) 유기소자에 사용되는 유기화합물 및 이를 이용한 유기소자의 제조방법