MX2014003359A - Soporte de transportador para una instalacion de tratamiento de vacio. - Google Patents

Soporte de transportador para una instalacion de tratamiento de vacio.

Info

Publication number
MX2014003359A
MX2014003359A MX2014003359A MX2014003359A MX2014003359A MX 2014003359 A MX2014003359 A MX 2014003359A MX 2014003359 A MX2014003359 A MX 2014003359A MX 2014003359 A MX2014003359 A MX 2014003359A MX 2014003359 A MX2014003359 A MX 2014003359A
Authority
MX
Mexico
Prior art keywords
carousel
vacuum treatment
treatment installation
carousel carrier
carrier
Prior art date
Application number
MX2014003359A
Other languages
English (en)
Other versions
MX349213B (es
Inventor
Juergen Gwehenberger
Original Assignee
Oerlikon Trading Ag Trübbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading Ag Trübbach filed Critical Oerlikon Trading Ag Trübbach
Publication of MX2014003359A publication Critical patent/MX2014003359A/es
Publication of MX349213B publication Critical patent/MX349213B/es

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q7/00—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting
    • B23Q7/02—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting by means of drums or rotating tables or discs
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
  • Handcart (AREA)

Abstract

La presente invención se relaciona con una instalación de tratamiento de vacío que tiene soportes de transportador, en los cuales el impulsor de transportador se coloca en la pared que está ubicada opuesta a la puerta de la instalación de tratamiento de vacío. De esta manera, el acoplamiento del transportador del soporte de transportador al impulsor de transportador se asegura sin mecanismo adicional alguno.
MX2014003359A 2011-09-19 2012-08-29 Soporte de transportador para una instalacion de tratamiento de vacio. MX349213B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011113563A DE102011113563A1 (de) 2011-09-19 2011-09-19 Karussellschlitten für Vakuumbehandlungsanlage
PCT/EP2012/003625 WO2013041179A1 (de) 2011-09-19 2012-08-29 Karussellschlitten für vakuumbehandlungsanlage

Publications (2)

Publication Number Publication Date
MX2014003359A true MX2014003359A (es) 2015-03-23
MX349213B MX349213B (es) 2017-07-18

Family

ID=46801424

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2014003359A MX349213B (es) 2011-09-19 2012-08-29 Soporte de transportador para una instalacion de tratamiento de vacio.

Country Status (16)

Country Link
US (1) US9527179B2 (es)
EP (1) EP2758562B1 (es)
JP (1) JP6208132B2 (es)
KR (1) KR102028768B1 (es)
CN (1) CN103797154B (es)
AR (1) AR087906A1 (es)
CA (1) CA2849024C (es)
DE (1) DE102011113563A1 (es)
ES (1) ES2554683T3 (es)
HU (1) HUE026486T2 (es)
MX (1) MX349213B (es)
MY (1) MY175540A (es)
PL (1) PL2758562T3 (es)
RU (1) RU2606105C2 (es)
SG (1) SG11201400776YA (es)
WO (1) WO2013041179A1 (es)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7119007B2 (ja) 2017-06-14 2022-08-16 バット ホールディング アーゲー 第１チャンバおよび第２チャンバを有するアセンブリ
BR112021022306A2 (pt) 2019-05-07 2021-12-28 Oerlikon Surface Solutions Ag Pfaeffikon Dispositivo transportador de peça de trabalho e sistema de tratamento de superfície

Family Cites Families (31)

* Cited by examiner, † Cited by third party
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US1200620A (en) * 1915-06-07 1916-10-10 Francis T Johnson Driving mechanism.
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US2033303A (en) * 1933-10-04 1936-03-10 Frank J Ross Jig clamping device
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SU475428A1 (ru) * 1972-06-28 1975-06-30 Предприятие П/Я Х-5594 Устройство дл вакуумного напылени слоев
US4776744A (en) * 1985-09-09 1988-10-11 Applied Materials, Inc. Systems and methods for wafer handling in semiconductor process equipment
SU1405361A1 (ru) * 1985-12-27 1992-08-30 Предприятие П/Я Ю-9192 Устройство дл ионно-плазменной обработки подложек в вакууме
US4960006A (en) * 1988-09-19 1990-10-02 General Electric Company Turning gear engagement device
JPH03253566A (ja) * 1990-03-02 1991-11-12 Shin Meiwa Ind Co Ltd スパッタリング装置
US5186594A (en) * 1990-04-19 1993-02-16 Applied Materials, Inc. Dual cassette load lock
JP2702261B2 (ja) * 1990-05-23 1998-01-21 シャープ株式会社 ファクシミリ装置
SU1824458A1 (en) * 1991-05-06 1993-06-30 Nii Vychislitelnoj Tekhn Apparatus for application of coatings
JPH07305165A (ja) * 1994-05-02 1995-11-21 Sony Corp スパッタリング装置
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DE19549045C1 (de) 1995-12-28 1997-06-05 Jenoptik Jena Gmbh Einrichtung zur Handhabung von scheibenförmigen Objekten
US5961798A (en) * 1996-02-13 1999-10-05 Diamond Black Technologies, Inc. System and method for vacuum coating of articles having precise and reproducible positioning of articles
US5762873A (en) * 1996-02-21 1998-06-09 Biomerieux Vitek, Inc. Automatic sample testing machine
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US6521104B1 (en) * 2000-05-22 2003-02-18 Basic Resources, Inc. Configurable vacuum system and method
DE10061628B4 (de) * 2000-12-11 2006-06-08 Leica Microsystems Wetzlar Gmbh Vorrichtung und Verfahren zum Ergreifen und Transportieren von Wafern
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AU2003215514A1 (en) * 2003-02-18 2004-09-09 Creavac-Creative Vakuumbeschichtung Gmbh High vacuum sputtering installation
EP1524329A1 (de) * 2003-10-17 2005-04-20 Platit AG Modulare Vorrichtung zur Beschichtung von Oberflächen
PL1617456T3 (pl) * 2004-05-28 2007-03-30 Applied Mat Gmbh & Co Kg Mechanizm napędowy dla instalacji do obróbki próżniowej
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KR100661908B1 (ko) * 2005-02-07 2006-12-28 세메스 주식회사 기판 처리 장치
ES2324493T3 (es) * 2005-08-29 2009-08-07 Oerlikon Trading Ag, Trubbach Dispositivo portador de piezas de trabajo.
JP4781337B2 (ja) * 2007-09-12 2011-09-28 株式会社昭和真空 成膜装置
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DE102010001218A1 (de) 2010-01-26 2011-07-28 Esser, Stefan, Dr.-Ing., 52072 Substratteller und Beschichtungsanlage zum Beschichten von Substraten

Also Published As

Publication number Publication date
WO2013041179A1 (de) 2013-03-28
KR20140068971A (ko) 2014-06-09
CA2849024C (en) 2019-10-01
RU2014115546A (ru) 2015-10-27
JP2014528030A (ja) 2014-10-23
DE102011113563A1 (de) 2013-03-21
CN103797154A (zh) 2014-05-14
US20140346724A1 (en) 2014-11-27
EP2758562B1 (de) 2015-09-16
ES2554683T3 (es) 2015-12-22
PL2758562T3 (pl) 2016-03-31
MY175540A (en) 2020-07-01
JP6208132B2 (ja) 2017-10-04
AR087906A1 (es) 2014-04-23
KR102028768B1 (ko) 2019-10-04
EP2758562A1 (de) 2014-07-30
RU2606105C2 (ru) 2017-01-10
US9527179B2 (en) 2016-12-27
HUE026486T2 (en) 2016-06-28
CA2849024A1 (en) 2013-03-28
CN103797154B (zh) 2016-02-17
MX349213B (es) 2017-07-18
SG11201400776YA (en) 2014-09-26

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Legal Events

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FG Grant or registration
HC Change of company name or juridical status

Owner name: ALEVO INTERNATIONAL S.A.