MA47052A1 - Élimination des dépôts dans la production d'acide phosphorique et installations de manipulation - Google Patents

Élimination des dépôts dans la production d'acide phosphorique et installations de manipulation

Info

Publication number
MA47052A1
MA47052A1 MA47052A MA47052A MA47052A1 MA 47052 A1 MA47052 A1 MA 47052A1 MA 47052 A MA47052 A MA 47052A MA 47052 A MA47052 A MA 47052A MA 47052 A1 MA47052 A1 MA 47052A1
Authority
MA
Morocco
Prior art keywords
phosphoric acid
deposits
methods
deposit
compositions
Prior art date
Application number
MA47052A
Other languages
English (en)
Other versions
MA47052B1 (fr
Inventor
Sankar Bhattacharja
Paul Wiatr
Jasbir Gill
Yuhuan Jin
Original Assignee
Ecolab Usa Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ecolab Usa Inc filed Critical Ecolab Usa Inc
Publication of MA47052A1 publication Critical patent/MA47052A1/fr
Publication of MA47052B1 publication Critical patent/MA47052B1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
    • C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/30—Accessories for evaporators ; Constructional details thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B25/00—Phosphorus; Compounds thereof
    • C01B25/16—Oxyacids of phosphorus; Salts thereof
    • C01B25/18—Phosphoric acid
    • C01B25/22—Preparation by reacting phosphate-containing material with an acid, e.g. wet process
    • C01B25/222—Preparation by reacting phosphate-containing material with an acid, e.g. wet process with sulfuric acid, a mixture of acids mainly consisting of sulfuric acid or a mixture of compounds forming it in situ, e.g. a mixture of sulfur dioxide, water and oxygen
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B25/00—Phosphorus; Compounds thereof
    • C01B25/16—Oxyacids of phosphorus; Salts thereof
    • C01B25/18—Phosphoric acid
    • C01B25/234—Purification; Stabilisation; Concentration
    • C01B25/2343—Concentration concomitant with purification, e.g. elimination of fluorine
    • C01B25/2346—Concentration
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B25/00—Phosphorus; Compounds thereof
    • C01B25/16—Oxyacids of phosphorus; Salts thereof
    • C01B25/26—Phosphates
    • C01B25/32—Phosphates of magnesium, calcium, strontium, or barium
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/02—Treatment of water, waste water, or sewage by heating
    • C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
    • C02F1/042—Prevention of deposits
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/02—Treatment of water, waste water, or sewage by heating
    • C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
    • C02F1/06—Flash evaporation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
    • C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
    • C02F5/14—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F14/00—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes
    • C23F14/02—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes by chemical means
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/101—Sulfur compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/22—Eliminating or preventing deposits, scale removal, scale prevention

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Detergent Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Fertilizers (AREA)

Abstract

L'invention concerne des compositions et des méthodes d'atténuation de dépôts dans des installations d'acide phosphorique et de phosphate d'ammonium. Les compositions d'atténuation de dépôts de l'invention peuvent être ajoutées à de l'acide phosphorique avant ou pendant la concentration dans le cycle d'évaporation d'une installation d'acide phosphorique. Les compositions retardent la formation de dépôt sur des surfaces en contact avec l'acide phosphorique, et ainsi le temps entre les nettoyages est allongé et la productivité de l'installation augmente. En outre, le dépôt qui se forme est plus mou et plus facilement nettoyé des surfaces, réduisant le temps de non-fonctionnement de l'installation et/ou de l'évaporateur. L'invention concerne également des méthodes d'atténuation de la formation de dépôt dans la production d'acide phosphorique et des installations de manipulation d'acide phosphorique. Dans les méthodes, les dépôts s'accumulent plus lentement et sont plus mous, plus tractables et plus facilement nettoyés des surfaces auxquelles ils adhèrent.
MA47052A 2017-04-20 2018-04-19 Élimination des dépôts dans la production d'acide phosphorique et installations de manipulation MA47052B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201710264732.5A CN108726494B (zh) 2017-04-20 2017-04-20 磷酸生产和处理设备中的垢控制
PCT/US2018/028320 WO2018195288A1 (fr) 2017-04-20 2018-04-19 Élimination des dépôts dans la production d'acide phosphorique et installations de manipulation

Publications (2)

Publication Number Publication Date
MA47052A1 true MA47052A1 (fr) 2019-12-31
MA47052B1 MA47052B1 (fr) 2020-10-28

Family

ID=62117018

Family Applications (1)

Application Number Title Priority Date Filing Date
MA47052A MA47052B1 (fr) 2017-04-20 2018-04-19 Élimination des dépôts dans la production d'acide phosphorique et installations de manipulation

Country Status (6)

Country Link
US (2) US10584049B2 (fr)
CN (1) CN108726494B (fr)
MA (1) MA47052B1 (fr)
RU (1) RU2765778C2 (fr)
SA (1) SA519410302B1 (fr)
WO (1) WO2018195288A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108726494B (zh) * 2017-04-20 2023-05-02 艺康美国股份有限公司 磷酸生产和处理设备中的垢控制
WO2022020313A1 (fr) * 2020-07-22 2022-01-27 Heritage Research Group Procédés et méthodes d'élimination de sels et de solides contenant de l'acide polyphosphorique

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4196172A (en) * 1976-07-07 1980-04-01 Occidental Petroleum Corporation Hemihydrate type phosphoric acid process
DE69217580T2 (de) * 1991-05-31 1997-06-26 Calgon Corp Polyether-Polyamino-Methylenphosphonaten zur Kontrolle von Ablagerungen bei hohem pH-Wert
US5338477A (en) * 1991-05-31 1994-08-16 Calgon Corporation Polyether polyamino methylene phosphonates for high pH scale control
US5454954A (en) * 1993-09-21 1995-10-03 Calgon Corporation Scale control in metal mining circuits using polyether polyamino methylene phosphonates
US5534157A (en) * 1994-11-10 1996-07-09 Calgon Corporation Polyether polyamino methylene phosphonates for high pH scale control
JP4043551B2 (ja) 1997-05-23 2008-02-06 栗田工業株式会社 スケール防止剤及びスケール防止方法
CN100431985C (zh) 2005-08-31 2008-11-12 刘天暘 湿法磷酸生产用阻垢剂
CN101172718B (zh) * 2006-10-31 2010-05-12 中国石油化工股份有限公司 一种阻垢剂及其在水处理中的应用
CN101774558B (zh) * 2009-12-25 2011-10-19 中国海洋石油总公司 提高浓缩磷酸产量的方法
CN102241441B (zh) * 2010-05-14 2015-12-02 纳尔科公司 包含aa-amps共聚物和pma的组合物及其用途
US9221700B2 (en) * 2010-12-22 2015-12-29 Ecolab Usa Inc. Method for inhibiting the formation and deposition of silica scale in aqueous systems
US8900539B2 (en) * 2011-03-22 2014-12-02 Cytec Technology Corp. Preventing or reducing scale in wet-process phosphoric acid production
US9567507B2 (en) * 2012-09-07 2017-02-14 Prestone Products Corporation Heat transfer fluids and corrosion inhibitor formulations for use thereof
CN203307051U (zh) * 2013-07-22 2013-11-27 湖北宜化松滋肥业有限公司 磷酸浓缩系统
BR112016019054A8 (pt) * 2014-03-06 2019-12-10 Solenis Technologies Cayman Lp método para o controle, a prevenção e/ou a inibição da formação de incrustações e/ou depósitos em um sistema aquoso e composição
CN204550064U (zh) * 2015-04-23 2015-08-12 武汉宜田科技发展有限公司 一种磷酸浓缩设备
CN108726494B (zh) * 2017-04-20 2023-05-02 艺康美国股份有限公司 磷酸生产和处理设备中的垢控制

Also Published As

Publication number Publication date
US11027998B2 (en) 2021-06-08
MA47052B1 (fr) 2020-10-28
SA519410302B1 (ar) 2022-12-05
RU2019137021A3 (fr) 2021-08-05
RU2019137021A (ru) 2021-05-20
WO2018195288A1 (fr) 2018-10-25
RU2765778C2 (ru) 2022-02-02
US20180305234A1 (en) 2018-10-25
US20200180987A1 (en) 2020-06-11
CN108726494A (zh) 2018-11-02
CN108726494B (zh) 2023-05-02
US10584049B2 (en) 2020-03-10

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