LU70712A1 - - Google Patents

Info

Publication number
LU70712A1
LU70712A1 LU70712A LU70712A LU70712A1 LU 70712 A1 LU70712 A1 LU 70712A1 LU 70712 A LU70712 A LU 70712A LU 70712 A LU70712 A LU 70712A LU 70712 A1 LU70712 A1 LU 70712A1
Authority
LU
Luxembourg
Application number
LU70712A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of LU70712A1 publication Critical patent/LU70712A1/xx

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00Charge transfer devices
    • H10D44/40Charge-coupled devices [CCD]
    • H10D44/45Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • H10D44/472Surface-channel CCD
    • H10D44/474Two-phase CCD
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00Charge transfer devices
    • H10D44/40Charge-coupled devices [CCD]
    • H10D44/45Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213Channel regions of field-effect devices
    • H10D62/335Channel regions of field-effect devices of charge-coupled devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/051Etching
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/143Shadow masking
LU70712A 1973-08-14 1974-08-12 LU70712A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2341154A DE2341154C2 (de) 1973-08-14 1973-08-14 Verfahren zur Herstellung einer Zweiphasen-Ladungsverschiebeanordnung

Publications (1)

Publication Number Publication Date
LU70712A1 true LU70712A1 (https=) 1974-12-10

Family

ID=5889756

Family Applications (1)

Application Number Title Priority Date Filing Date
LU70712A LU70712A1 (https=) 1973-08-14 1974-08-12

Country Status (15)

Country Link
US (1) US3908262A (https=)
JP (1) JPS5051277A (https=)
AT (1) AT341580B (https=)
BE (1) BE818885A (https=)
CA (1) CA1001775A (https=)
CH (1) CH573662A5 (https=)
DE (1) DE2341154C2 (https=)
DK (1) DK139369C (https=)
FR (1) FR2241142B1 (https=)
GB (1) GB1444452A (https=)
IE (1) IE39610B1 (https=)
IT (1) IT1019904B (https=)
LU (1) LU70712A1 (https=)
NL (1) NL7410201A (https=)
SE (1) SE394766B (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1534896A (en) * 1975-05-19 1978-12-06 Itt Direct metal contact to buried layer
US4035906A (en) * 1975-07-23 1977-07-19 Texas Instruments Incorporated Silicon gate CCD structure
US4027382A (en) * 1975-07-23 1977-06-07 Texas Instruments Incorporated Silicon gate CCD structure
US4060427A (en) * 1976-04-05 1977-11-29 Ibm Corporation Method of forming an integrated circuit region through the combination of ion implantation and diffusion steps
US4167017A (en) * 1976-06-01 1979-09-04 Texas Instruments Incorporated CCD structures with surface potential asymmetry beneath the phase electrodes
US4182023A (en) * 1977-10-21 1980-01-08 Ncr Corporation Process for minimum overlap silicon gate devices
US4525919A (en) * 1982-06-16 1985-07-02 Raytheon Company Forming sub-micron electrodes by oblique deposition
FR2571177B1 (fr) * 1984-10-02 1987-02-27 Thomson Csf Procede de realisation de grilles en siliciure ou en silicium pour circuit integre comportant des elements du type grille - isolant - semi-conducteur
EP0233862A1 (en) * 1985-08-27 1987-09-02 LOCKHEED MISSILES & SPACE COMPANY, INC. Gate alignment procedure in fabricating semiconductor devices
NL8502765A (nl) * 1985-10-10 1987-05-04 Philips Nv Werkwijze ter vervaardiging van een halfgeleiderinrichting.
JPH0834194B2 (ja) * 1989-06-30 1996-03-29 松下電器産業株式会社 イオン注入方法及び本方法を用いた半導体装置の製造方法
KR940010932B1 (ko) * 1991-12-23 1994-11-19 금성일렉트론주식회사 Ccd영상소자 제조방법
US5290358A (en) * 1992-09-30 1994-03-01 International Business Machines Corporation Apparatus for directional low pressure chemical vapor deposition (DLPCVD)
US5328854A (en) * 1993-03-31 1994-07-12 At&T Bell Laboratories Fabrication of electronic devices with an internal window
IL106892A0 (en) * 1993-09-02 1993-12-28 Pierre Badehi Methods and apparatus for producing integrated circuit devices
IL108359A (en) * 1994-01-17 2001-04-30 Shellcase Ltd Method and apparatus for producing integrated circuit devices
US5444007A (en) * 1994-08-03 1995-08-22 Kabushiki Kaisha Toshiba Formation of trenches having different profiles
US5668018A (en) * 1995-06-07 1997-09-16 International Business Machines Corporation Method for defining a region on a wall of a semiconductor structure
GB9512089D0 (en) * 1995-06-14 1995-08-09 Evans Jonathan L Semiconductor device fabrication
JP2965061B2 (ja) * 1996-04-19 1999-10-18 日本電気株式会社 電荷結合素子およびその製造方法
DE10115912A1 (de) * 2001-03-30 2002-10-17 Infineon Technologies Ag Verfahren zur Herstellung einer Halbleiteranordnung und Verwendung einer Ionenstrahlanlage zur Durchführung des Verfahrens

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2666814A (en) * 1949-04-27 1954-01-19 Bell Telephone Labor Inc Semiconductor translating device
GB1355806A (en) * 1970-12-09 1974-06-05 Mullard Ltd Methods of manufacturing a semiconductor device
US3796932A (en) * 1971-06-28 1974-03-12 Bell Telephone Labor Inc Charge coupled devices employing nonuniform concentrations of immobile charge along the information channel
US3851379A (en) * 1973-05-16 1974-12-03 Westinghouse Electric Corp Solid state components

Also Published As

Publication number Publication date
FR2241142B1 (https=) 1977-10-14
CH573662A5 (https=) 1976-03-15
GB1444452A (en) 1976-07-28
SE7410186L (https=) 1975-02-17
CA1001775A (en) 1976-12-14
IE39610L (en) 1975-02-14
NL7410201A (nl) 1975-02-18
DK139369B (da) 1979-02-05
AT341580B (de) 1978-02-10
US3908262A (en) 1975-09-30
ATA631774A (de) 1977-06-15
IE39610B1 (en) 1978-11-22
FR2241142A1 (https=) 1975-03-14
DK430874A (https=) 1975-04-14
DE2341154B1 (de) 1974-11-07
DK139369C (da) 1979-08-20
IT1019904B (it) 1977-11-30
BE818885A (fr) 1974-12-02
JPS5051277A (https=) 1975-05-08
DE2341154C2 (de) 1975-06-26
SE394766B (sv) 1977-07-04

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