LT2005020A - Holograpihic device and method for determination of photoelectric parameters of a semiconductor - Google Patents

Holograpihic device and method for determination of photoelectric parameters of a semiconductor

Info

Publication number
LT2005020A
LT2005020A LT2005020A LT2005020A LT2005020A LT 2005020 A LT2005020 A LT 2005020A LT 2005020 A LT2005020 A LT 2005020A LT 2005020 A LT2005020 A LT 2005020A LT 2005020 A LT2005020 A LT 2005020A
Authority
LT
Lithuania
Prior art keywords
semiconductor
determination
optical
photoelectric
photoelectric parameters
Prior art date
Application number
LT2005020A
Other languages
Lithuanian (lt)
Other versions
LT5402B (en
Inventor
Kestutis Jarasiunas
Markas Sudzius
Original Assignee
Kestutis Jarasiunas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kestutis Jarasiunas filed Critical Kestutis Jarasiunas
Priority to LT2005020A priority Critical patent/LT5402B/en
Priority to PCT/LT2006/000001 priority patent/WO2006093399A1/en
Publication of LT2005020A publication Critical patent/LT2005020A/en
Publication of LT5402B publication Critical patent/LT5402B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G03H2001/0033—Adaptation of holography to specific applications in hologrammetry for measuring or analysing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0268—Inorganic recording material, e.g. photorefractive crystal [PRC]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2222/00—Light sources or light beam properties
    • G03H2222/33—Pulsed light beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/26—Means providing optical delay, e.g. for path length matching

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)

Abstract

The invention is intended for measurement of a semiconductor photoelectric properties by optical means and, thus, can be used for contactless characterization of semiconductor crystals, structures, or evaluation of their fabrication technology. A holographic method for determination of photoelectric parameters of a semiconductor uses for optical excitation two beams with identical wave fronts that are created by an optical mask, monitors the light-induced spatially-modulated structure within the investigated semiconductor by optical probe pulse, measures the diffraction characteristics of the probe beam which diffracts on the structure, and determines the photoelectric parameters of a semiconductor from the diffraction characteristics. A holographic device for determination of photoelectric parameters of a semiconductor employs a diffraction grating and beam-aligning elements positioned in the optical excitation channels, variable delay line for the probe beam, and set of detectors to monitor char
LT2005020A 2005-03-01 2005-03-01 Holograpihic device and method for determination of photoelectric parameters of a semiconductor LT5402B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
LT2005020A LT5402B (en) 2005-03-01 2005-03-01 Holograpihic device and method for determination of photoelectric parameters of a semiconductor
PCT/LT2006/000001 WO2006093399A1 (en) 2005-03-01 2006-01-13 Holographic device and method for determination of photoelectric parameters of a semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LT2005020A LT5402B (en) 2005-03-01 2005-03-01 Holograpihic device and method for determination of photoelectric parameters of a semiconductor

Publications (2)

Publication Number Publication Date
LT2005020A true LT2005020A (en) 2006-09-25
LT5402B LT5402B (en) 2007-02-26

Family

ID=36941413

Family Applications (1)

Application Number Title Priority Date Filing Date
LT2005020A LT5402B (en) 2005-03-01 2005-03-01 Holograpihic device and method for determination of photoelectric parameters of a semiconductor

Country Status (2)

Country Link
LT (1) LT5402B (en)
WO (1) WO2006093399A1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU494063A1 (en) * 1974-05-08 1978-01-05 Вильнюсский Ордена Трудового Красного Знамени Государственный Университет Им.В.Капсукаса Method of determining the photoelectric characteristics of a semiconductor
SU1545866A1 (en) * 1988-01-13 1995-08-27 Физико-технический институт им.А.Ф.Иоффе Method for determining photoelectric parameters of noncompensated impurity semiconductors
JPH03230543A (en) * 1990-02-06 1991-10-14 Fujitsu Ltd Inspecting method of semiconductor device

Also Published As

Publication number Publication date
WO2006093399A1 (en) 2006-09-08
LT5402B (en) 2007-02-26

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Effective date: 20100301