LT2005020A - PUSLAIDININKINIU MEDZIAGU FOTOELEKTRINIU PARAMETRU HOLOGRAFINIS MATAVIMO BuDAS IR IRENGINYS - Google Patents
PUSLAIDININKINIU MEDZIAGU FOTOELEKTRINIU PARAMETRU HOLOGRAFINIS MATAVIMO BuDAS IR IRENGINYSInfo
- Publication number
- LT2005020A LT2005020A LT2005020A LT2005020A LT2005020A LT 2005020 A LT2005020 A LT 2005020A LT 2005020 A LT2005020 A LT 2005020A LT 2005020 A LT2005020 A LT 2005020A LT 2005020 A LT2005020 A LT 2005020A
- Authority
- LT
- Lithuania
- Prior art keywords
- semiconductor
- determination
- optical
- photoelectric
- photoelectric parameters
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 7
- 238000000034 method Methods 0.000 title abstract 2
- 230000003287 optical effect Effects 0.000 abstract 5
- 239000000523 sample Substances 0.000 abstract 3
- 230000005284 excitation Effects 0.000 abstract 2
- 238000012512 characterization method Methods 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 238000011156 evaluation Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H2001/0033—Adaptation of holography to specific applications in hologrammetry for measuring or analysing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0268—Inorganic recording material, e.g. photorefractive crystal [PRC]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2222/00—Light sources or light beam properties
- G03H2222/33—Pulsed light beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2223/00—Optical components
- G03H2223/26—Means providing optical delay, e.g. for path length matching
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
Pasiulymas yra is medziagu metrologijos srities, o butent- puslaidininkiniu medziagu fotoelektriniuparametru matavimo srities, ir gali buti panaudotas puslaidininkiniu kristalu bei ju dariniu fotoelektriniams parametrams ismatuoti bekontakciu budu.Puslaidininkiu medziagu holografiniame fotoelektriniu parametru matavimo bude, kuriame erdviskai moduliuota optini zadinimo kanala suformuoja panaudodami optini transparanta ir tiriamajame objekte sukuria erdviskai periodine suzadintu juosteliu seka,tiriamaji objekta zonduoja kitu optines spinduliuotes saltiniu, naujai erdviskai moduliuota optinizadinimo kanala suformuoja panaudodami fazini optini transparanta - difrakcine gardele, kurios pagalba sukuria du vienodai pakreipto bangos fronto optinius zadinimo pluostelius- du optinio zadinimo kanalus, kuriais apsviecia tiriamojo objekto pavirsiu ir jame uzraso dinamine gardele, zonduojanciu optiniu pluosteliu ismatuoja sios gardeles difrakcini efektyvuma ir is difrakcinio efektyvumo charakteristiku nustato tiriamojo objekto medziagos fotoelektrinius parametrus. Matavimo buda realizuojanciame irenginyje, sudarytame is optinio zadinimo kanalo - impulsines spinduliuotes pirmojo saltinio, optinio transparanto, tiriamojo objekto ir pirmojofotodetektoriaus, bei optinio zondavimo kanalo- zonduojancios spinduliuotes antrojo saltinio, optiniovelinimo irenginio, tiriamojo objekto ir uz jo patalpinto antrojo fotodetektorius, fotodetektoriai sujungti su duomenu surinkimo bloku,naujai optinistransparantas padarytas difrakcines gardeles pavidalu, o tarp difrakcines gardeles ir tiriamojo objekto papildomai patalpinti du justiravimo elementai, isdestyti salia vien
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
LT2005020A LT5402B (lt) | 2005-03-01 | 2005-03-01 | Puslaidininkinių medžiagų fotoelektrinių parametrų holografinis matavimo būdas ir įrenginys |
PCT/LT2006/000001 WO2006093399A1 (en) | 2005-03-01 | 2006-01-13 | Holographic device and method for determination of photoelectric parameters of a semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
LT2005020A LT5402B (lt) | 2005-03-01 | 2005-03-01 | Puslaidininkinių medžiagų fotoelektrinių parametrų holografinis matavimo būdas ir įrenginys |
Publications (2)
Publication Number | Publication Date |
---|---|
LT2005020A true LT2005020A (lt) | 2006-09-25 |
LT5402B LT5402B (lt) | 2007-02-26 |
Family
ID=36941413
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
LT2005020A LT5402B (lt) | 2005-03-01 | 2005-03-01 | Puslaidininkinių medžiagų fotoelektrinių parametrų holografinis matavimo būdas ir įrenginys |
Country Status (2)
Country | Link |
---|---|
LT (1) | LT5402B (lt) |
WO (1) | WO2006093399A1 (lt) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU494063A1 (ru) * | 1974-05-08 | 1978-01-05 | Вильнюсский Ордена Трудового Красного Знамени Государственный Университет Им.В.Капсукаса | Способ определени фотоэлектрических характеристик полупроводника |
SU1545866A1 (ru) * | 1988-01-13 | 1995-08-27 | Физико-технический институт им.А.Ф.Иоффе | Способ определения фотоэлектрических параметров примесных некомпенсированных полупроводников |
JPH03230543A (ja) * | 1990-02-06 | 1991-10-14 | Fujitsu Ltd | 半導体装置の検査方法 |
-
2005
- 2005-03-01 LT LT2005020A patent/LT5402B/lt not_active IP Right Cessation
-
2006
- 2006-01-13 WO PCT/LT2006/000001 patent/WO2006093399A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2006093399A1 (en) | 2006-09-08 |
LT5402B (lt) | 2007-02-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM9A | Lapsed patents |
Effective date: 20100301 |