KR980005736A - Method of Cleaning Semiconductor Devices - Google Patents
Method of Cleaning Semiconductor Devices Download PDFInfo
- Publication number
- KR980005736A KR980005736A KR1019960023905A KR19960023905A KR980005736A KR 980005736 A KR980005736 A KR 980005736A KR 1019960023905 A KR1019960023905 A KR 1019960023905A KR 19960023905 A KR19960023905 A KR 19960023905A KR 980005736 A KR980005736 A KR 980005736A
- Authority
- KR
- South Korea
- Prior art keywords
- contact hole
- hbf
- diffusion
- oxide film
- semiconductor devices
- Prior art date
Links
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
본 발명에 의한 반도체 소자의 세정 방법은 HBF4와 NH4F를 사용하여 산화막에 대한 낮은 식각율, 공정시간마진(Time Margine)의 충분한 확보, 공정의 안정화를 기하고, 콘택홀 형성시 발생하는 파티클, 자연산화막, 폴리머 등을 충분히 제거함으로써 콘택홀 측벽에 결함이 발생하는 것을 막을 수 있고, 상기 HBF4와 NH4F의 혼합액에 탈이온수나 유지용제의 양을 조절함으로써 확산 및 포토 공정전(Pre-Diffusion/Pre-Photo)의 세정에 사용할 수 있는 슬라이트 식각액(Slingt Etchant)으로의 역할을 할 수 있다는 잇점이 있다.The method for cleaning a semiconductor device according to the present invention uses HBF 4 and NH 4 F to lower the etching rate for the oxide film, to secure sufficient time margin, to stabilize the process, and to generate the contact hole. particles, by sufficiently remove the natural oxide film, polymer and the like can be prevented that a defect occurs in the contact hole side wall, by adjusting the amount of deionized water and maintaining a solvent to the mixed liquid of the HBF 4 and NH 4 F diffusion and photolithography in ( The advantage is that it can serve as a slitting etchant that can be used to clean pre-diffusion / pre-photo.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960023905A KR980005736A (en) | 1996-06-25 | 1996-06-25 | Method of Cleaning Semiconductor Devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960023905A KR980005736A (en) | 1996-06-25 | 1996-06-25 | Method of Cleaning Semiconductor Devices |
Publications (1)
Publication Number | Publication Date |
---|---|
KR980005736A true KR980005736A (en) | 1998-03-30 |
Family
ID=66287659
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960023905A KR980005736A (en) | 1996-06-25 | 1996-06-25 | Method of Cleaning Semiconductor Devices |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR980005736A (en) |
-
1996
- 1996-06-25 KR KR1019960023905A patent/KR980005736A/en not_active Application Discontinuation
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