KR980005729A - Manufacturing method of semiconductor device - Google Patents
Manufacturing method of semiconductor device Download PDFInfo
- Publication number
- KR980005729A KR980005729A KR1019960023461A KR19960023461A KR980005729A KR 980005729 A KR980005729 A KR 980005729A KR 1019960023461 A KR1019960023461 A KR 1019960023461A KR 19960023461 A KR19960023461 A KR 19960023461A KR 980005729 A KR980005729 A KR 980005729A
- Authority
- KR
- South Korea
- Prior art keywords
- oxide
- semiconductor device
- silicon substrate
- manufacturing
- forming
- Prior art date
Links
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- Insulated Gate Type Field-Effect Transistor (AREA)
- Semiconductor Memories (AREA)
Abstract
본 발명은 반도체 소자의 제조방법을 제공하는 것으로, 채널길이를 스페이서에 으해 결정하므로 마스크의 부정합에 의한 마진이 필요없게 되어 짧은 채널을 균일하게 형성할 수 있는 효과가 있다.The present invention provides a method for manufacturing a semiconductor device, and since the channel length is determined by the spacer, there is no need for a margin due to mismatching of the mask, and thus the short channel can be uniformly formed.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2a도 내지 제2f도는 본 발명에 따른 반도체 소자의 제조방법을 설명하기 위한 소자의 단면도.2A to 2F are cross-sectional views of a device for explaining a method of manufacturing a semiconductor device according to the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960023461A KR980005729A (en) | 1996-06-25 | 1996-06-25 | Manufacturing method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960023461A KR980005729A (en) | 1996-06-25 | 1996-06-25 | Manufacturing method of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR980005729A true KR980005729A (en) | 1998-03-30 |
Family
ID=66288339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960023461A KR980005729A (en) | 1996-06-25 | 1996-06-25 | Manufacturing method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR980005729A (en) |
-
1996
- 1996-06-25 KR KR1019960023461A patent/KR980005729A/en not_active Application Discontinuation
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Legal Events
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WITN | Withdrawal due to no request for examination |