KR970064183U - 반도체 금속박막 공정챔버의 쉴드 - Google Patents

반도체 금속박막 공정챔버의 쉴드

Info

Publication number
KR970064183U
KR970064183U KR2019960012219U KR19960012219U KR970064183U KR 970064183 U KR970064183 U KR 970064183U KR 2019960012219 U KR2019960012219 U KR 2019960012219U KR 19960012219 U KR19960012219 U KR 19960012219U KR 970064183 U KR970064183 U KR 970064183U
Authority
KR
South Korea
Prior art keywords
shield
thin film
process chamber
metal thin
film process
Prior art date
Application number
KR2019960012219U
Other languages
English (en)
Other versions
KR0134539Y1 (ko
Inventor
김회재
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019960012219U priority Critical patent/KR0134539Y1/ko
Publication of KR970064183U publication Critical patent/KR970064183U/ko
Application granted granted Critical
Publication of KR0134539Y1 publication Critical patent/KR0134539Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR2019960012219U 1996-05-16 1996-05-16 반도체 금속박막 공정챔버의 쉴드 KR0134539Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960012219U KR0134539Y1 (ko) 1996-05-16 1996-05-16 반도체 금속박막 공정챔버의 쉴드

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960012219U KR0134539Y1 (ko) 1996-05-16 1996-05-16 반도체 금속박막 공정챔버의 쉴드

Publications (2)

Publication Number Publication Date
KR970064183U true KR970064183U (ko) 1997-12-11
KR0134539Y1 KR0134539Y1 (ko) 1999-03-20

Family

ID=19456327

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960012219U KR0134539Y1 (ko) 1996-05-16 1996-05-16 반도체 금속박막 공정챔버의 쉴드

Country Status (1)

Country Link
KR (1) KR0134539Y1 (ko)

Also Published As

Publication number Publication date
KR0134539Y1 (ko) 1999-03-20

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