KR100200728B1 - Chamber of semiconductor apparatus - Google Patents

Chamber of semiconductor apparatus Download PDF

Info

Publication number
KR100200728B1
KR100200728B1 KR1019960040695A KR19960040695A KR100200728B1 KR 100200728 B1 KR100200728 B1 KR 100200728B1 KR 1019960040695 A KR1019960040695 A KR 1019960040695A KR 19960040695 A KR19960040695 A KR 19960040695A KR 100200728 B1 KR100200728 B1 KR 100200728B1
Authority
KR
South Korea
Prior art keywords
chamber
semiconductor apparatus
semiconductor
Prior art date
Application number
KR1019960040695A
Other languages
Korean (ko)
Inventor
Young-Seon Kim
Young-Wook Park
Sung-Hee Nam
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Priority to KR1019960040695A priority Critical patent/KR100200728B1/en
Application granted granted Critical
Publication of KR100200728B1 publication Critical patent/KR100200728B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR1019960040695A 1996-09-18 1996-09-18 Chamber of semiconductor apparatus KR100200728B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960040695A KR100200728B1 (en) 1996-09-18 1996-09-18 Chamber of semiconductor apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960040695A KR100200728B1 (en) 1996-09-18 1996-09-18 Chamber of semiconductor apparatus

Publications (1)

Publication Number Publication Date
KR100200728B1 true KR100200728B1 (en) 1999-06-15

Family

ID=19474295

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960040695A KR100200728B1 (en) 1996-09-18 1996-09-18 Chamber of semiconductor apparatus

Country Status (1)

Country Link
KR (1) KR100200728B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100449787B1 (en) * 2000-12-12 2004-09-22 니뽄 가이시 가부시키가이샤 A method for fabricating a iii-v nitride film and an apparatus for fabricating the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100449787B1 (en) * 2000-12-12 2004-09-22 니뽄 가이시 가부시키가이샤 A method for fabricating a iii-v nitride film and an apparatus for fabricating the same
US7955437B2 (en) 2000-12-12 2011-06-07 Ngk Insulators, Ltd. Apparatus for fabricating a III-V nitride film

Similar Documents

Publication Publication Date Title
TW475491U (en) Apparatus of cleaning semiconductor wafer
TW474456U (en) Semiconductor apparatus
SG67448A1 (en) Substrate treatment apparatus
ZA977564B (en) Method of treatment
EP0744770A3 (en) Semiconductor apparatus
EP0933803A4 (en) Method of plasma treatment
EP0743677A3 (en) Dummy Wafer
HUP9802482A3 (en) Procedure for drying silicon
GB2312411B (en) Apparatus for the taking over of sweets
KR100238220B1 (en) Plattening method of semiconductor device
KR100200728B1 (en) Chamber of semiconductor apparatus
SG55300A1 (en) Holding apparatus of an antenna apparatus
ZA973988B (en) Method of treatment
GB2318529B (en) Gas treatment apparatus
GB9717451D0 (en) Apparatus for treatment of surfaces
GB2312086B (en) Anechoic chamber
GB2308235B (en) High frequency apparatus
PL330733A1 (en) Sterilising chamber
KR100239411B1 (en) Method of manufacturing semiconductor device
TW324390U (en) Improvement of elevating device
KR0109662Y1 (en) Cleaning apparatus of wafer
TW300446U (en) Improved structure of back-patting apparatus
PL313849A1 (en) Beta-aminoesters of o-hydrobenzylamides
TW310730U (en) Improved structure of apparatus for generating ozone
PL315474A1 (en) Method of obtaining peptides containing alpha-hydroxymethylserine

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20070228

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee