KR970017902A - Method for forming alignment key pattern of semiconductor device - Google Patents

Method for forming alignment key pattern of semiconductor device Download PDF

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Publication number
KR970017902A
KR970017902A KR1019950029338A KR19950029338A KR970017902A KR 970017902 A KR970017902 A KR 970017902A KR 1019950029338 A KR1019950029338 A KR 1019950029338A KR 19950029338 A KR19950029338 A KR 19950029338A KR 970017902 A KR970017902 A KR 970017902A
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KR
South Korea
Prior art keywords
alignment key
key pattern
semiconductor device
forming
forming alignment
Prior art date
Application number
KR1019950029338A
Other languages
Korean (ko)
Inventor
여정호
이창환
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950029338A priority Critical patent/KR970017902A/en
Publication of KR970017902A publication Critical patent/KR970017902A/en

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

반도체 장치의 얼라인 키 패턴 형성방법이 개시되어 있다. 베리어층이 형성된 반도체 기판 상에 금속을 플로우(flow) 한 후 모서리 부위의 면적을 최소화하는 얼라인 키 패턴을 형성하여 모서리 거칠음을 방지하는 것을 특징으로 하는 반도체 장치의 얼라인 키 패턴 형성방법이 제공된다. 따라서, 얼라인 키 패턴 인식시 인시에러를 방지할 수 있다.A method of forming an alignment key pattern of a semiconductor device is disclosed. Provided is a method for forming an alignment key pattern of a semiconductor device, characterized by forming an alignment key pattern for minimizing an area of an edge portion after flowing a metal on a semiconductor substrate on which a barrier layer is formed. do. Therefore, it is possible to prevent the incidence during alignment key pattern recognition.

Description

반도체 장치의 얼라인 키 패턴 형성방법Method for forming alignment key pattern of semiconductor device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제3A도 및 제3B도는 본 발명의 일 실시예에 따른 얼라인 키 패턴의 평면도 및 단면도.3A and 3B are plan and cross-sectional views of an alignment key pattern according to an embodiment of the present invention.

Claims (3)

베리어층이 형성된 반도체 기판 상에 금속을 플로우(flow) 한 후 모서리 부위의 면적을 최소화하는 얼라인 키 패턴을 형성하여 모서리 거칠음을 방지하는 것을 특징으로 하는 반도체 장치의 얼라인 키 패턴 형성방법.A method for forming an alignment key pattern of a semiconductor device, characterized by preventing an edge roughness by forming an alignment key pattern which minimizes an area of an edge portion after flowing a metal on a semiconductor substrate on which a barrier layer is formed. 제1항에 있어서, 상기 얼라인 키 패턴은 좁은 면적을 갖는 바(bar) 또는 트랜치 (trench)형으로 형성하는 것을 특징으로 하는 반도체 장치의 얼라인 키 패턴 형성방법.The method of claim 1, wherein the alignment key pattern is formed in a bar or trench type having a narrow area. 제1항에 있어서, 상기 얼라인 키 패턴의 폭을 1~2㎛로 형성하는 것을 특징으로 하는 반도체 장치의 얼라인 키 패턴 형성방법.The alignment key pattern forming method of claim 1, wherein the alignment key pattern has a width of 1 μm to 2 μm. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950029338A 1995-09-07 1995-09-07 Method for forming alignment key pattern of semiconductor device KR970017902A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950029338A KR970017902A (en) 1995-09-07 1995-09-07 Method for forming alignment key pattern of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950029338A KR970017902A (en) 1995-09-07 1995-09-07 Method for forming alignment key pattern of semiconductor device

Publications (1)

Publication Number Publication Date
KR970017902A true KR970017902A (en) 1997-04-30

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KR1019950029338A KR970017902A (en) 1995-09-07 1995-09-07 Method for forming alignment key pattern of semiconductor device

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KR (1) KR970017902A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100790250B1 (en) * 2006-08-09 2008-01-02 동부일렉트로닉스 주식회사 Alignment key assembly and method of manufacturing the alignment key assembly

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100790250B1 (en) * 2006-08-09 2008-01-02 동부일렉트로닉스 주식회사 Alignment key assembly and method of manufacturing the alignment key assembly

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