KR970008546A - 반도체 리드프레임 제조방법 및 그를 이용한 반도체 칩 패키지 제조방법 - Google Patents
반도체 리드프레임 제조방법 및 그를 이용한 반도체 칩 패키지 제조방법 Download PDFInfo
- Publication number
- KR970008546A KR970008546A KR1019950023471A KR19950023471A KR970008546A KR 970008546 A KR970008546 A KR 970008546A KR 1019950023471 A KR1019950023471 A KR 1019950023471A KR 19950023471 A KR19950023471 A KR 19950023471A KR 970008546 A KR970008546 A KR 970008546A
- Authority
- KR
- South Korea
- Prior art keywords
- film
- lead frame
- manufacturing
- pad
- leadframe
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49503—Lead-frames or other flat leads characterised by the die pad
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49503—Lead-frames or other flat leads characterised by the die pad
- H01L23/49513—Lead-frames or other flat leads characterised by the die pad having bonding material between chip and die pad
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49121—Beam lead frame or beam lead device
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Die Bonding (AREA)
Abstract
본 발명은 리드프레임 패드의 저면에 폴리아믹 에시드(polyamic acid)필름을 부착하고, 그 폴리아믹 에시드 필름을 열압착으로 폴리이미드 필름으로 형성시켜, 상기 리드프레임 패드와 폴리이미드 필름을 접착제에 의해 접착될 경우에 상기 두재료간의 박리를 방지할 수 있는 동시에 에칭법 또는 스탬핑법에 의해 그 폴리이미드 필름에 딤플을 형성하여 성형수지와 리드프레임간의 결합력을 증대시킬 수 있는 것이다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제5A도는 본 발명에 의한 리드프레임 패드의 저면에 폴리이미드 필름이 부착된 리드프레임의 저면도, 제5B도는 제5A도의 D-D선 단면도.
Claims (8)
- 리드프레임 패드의 필름을 접착하는 방법으로, 리드프레임을 준비하여 그 리드프레임 패드에 필름을 부착하는 단계와; 열발생장치를 이용하여 상기 필름을 상기 리드프레임 패드에 열압착하는 단계를 포함하는 것을 특징으로 하는 반도체 리드프레임 제조방법.
- 제1항에 있어서, 상기 열압착되는 온도가 350∼420℃인 것을 특징으로 하는 반도체 리드프레임 제조방법.
- 제1항에 있어서, 상기 필름이 폴리아믹 애시드 필름인 것을 특징으로 하는 반도체 리드프레임 제조방법.
- 제1항에 있어서, 상기 필름이 상기 리드프레임 패드의 저면에 부착되는 것을 특징으로 하는 반도체 리드프레임 제조방법.
- 제3항에 있어서, 상기 폴리아믹 애시드 필름이 열압착된 후에 폴리이미드 필름으로 변형되는 것을 특징으로 하는 반도체 리드프레임 제조방법.
- 리드프레임을 준비하여 그 리드프레임 패드에 필름을 부착하는 단계와; 열발생장치를 이용하여 상기 필름을 상기 리드프레임 패드에 열압착하는 단계; 그 리드프레임 패드의 상면에 칩을 접착하는 단계와; 그 칩상에 형성된 본딩패드들과 그들에 대응되는 내부리드들을 전기적 연결하는 단계와; 그 칩이 탑재된 리드프레임의 소정영역을 성형하는단계를 포함하는 것을 특징으로 하는 반도체 리드프레임 제조방법을 이용한 반도체 칩 패키지 제조방법.
- 제6항에 있어서, 상기 필름에 적어도 하나 이상의 홈이 형성된 것을 특징으로 하는 반도체 리드프레임 제조방법을 이용한 반도체 칩 패키지 제조방법.
- 제6항에 있어서, 상기 리드프레임 패드상에 필름이 형성된 것을 특징으로 하는 반도체 리드프레임 제조방법을 이용한 반도체 칩 패키지 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950023471A KR0148080B1 (ko) | 1995-07-31 | 1995-07-31 | 반도체 리드프레임 제조방법 및 그를 이용한 반도체 칩 패키지 제조방법 |
TW084111091A TW288192B (en) | 1995-07-31 | 1995-10-20 | Process for manufacturing lead frame for semiconductor package |
DE19540306A DE19540306C1 (de) | 1995-07-31 | 1995-10-28 | Verfahren zur Herstellung von Leiterrahmen für Halbleiterbauelemente |
CN95119249A CN1080931C (zh) | 1995-07-31 | 1995-11-14 | 用于生产半导体封装引线框架的工艺 |
US08/557,540 US5633206A (en) | 1995-07-31 | 1995-11-14 | Process for manufacturing lead frame for semiconductor package |
JP7296900A JP2637715B2 (ja) | 1995-07-31 | 1995-11-15 | 半導体リードフレームの製造方法およびそれを利用した半導体チップパッケージの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950023471A KR0148080B1 (ko) | 1995-07-31 | 1995-07-31 | 반도체 리드프레임 제조방법 및 그를 이용한 반도체 칩 패키지 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970008546A true KR970008546A (ko) | 1997-02-24 |
KR0148080B1 KR0148080B1 (ko) | 1998-08-01 |
Family
ID=19422430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950023471A KR0148080B1 (ko) | 1995-07-31 | 1995-07-31 | 반도체 리드프레임 제조방법 및 그를 이용한 반도체 칩 패키지 제조방법 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5633206A (ko) |
JP (1) | JP2637715B2 (ko) |
KR (1) | KR0148080B1 (ko) |
CN (1) | CN1080931C (ko) |
DE (1) | DE19540306C1 (ko) |
TW (1) | TW288192B (ko) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09260550A (ja) * | 1996-03-22 | 1997-10-03 | Mitsubishi Electric Corp | 半導体装置 |
US5929511A (en) * | 1996-07-15 | 1999-07-27 | Matsushita Electronics Corporation | Lead frame for resin sealed semiconductor device |
US5922167A (en) * | 1997-01-16 | 1999-07-13 | Occidential Chemical Corporation | Bending integrated circuit chips |
TW434760B (en) * | 1998-02-20 | 2001-05-16 | United Microelectronics Corp | Interlaced grid type package structure and its manufacturing method |
US6249045B1 (en) | 1999-10-12 | 2001-06-19 | International Business Machines Corporation | Tented plated through-holes and method for fabrication thereof |
US6929485B1 (en) * | 2004-03-16 | 2005-08-16 | Agilent Technologies, Inc. | Lead frame with interdigitated pins |
DE102006028815B3 (de) * | 2006-06-21 | 2007-08-30 | Hansa Tronic Gmbh | Verfahren zur Herstellung eines elektrischen Hybridbauteils |
KR101150020B1 (ko) * | 2010-07-15 | 2012-05-31 | 엘지이노텍 주식회사 | 리드 프레임 |
CN102501343B (zh) * | 2011-11-18 | 2014-07-16 | 毕翊 | 半导体引线框架除溢胶全自动生产线 |
KR20170096258A (ko) * | 2016-02-15 | 2017-08-24 | 삼성전자주식회사 | 검사장치 |
CN115599027B (zh) * | 2022-12-16 | 2023-03-14 | 西北工业大学 | 一种低维飞行器芯片微系统、制备及控制方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4369090A (en) * | 1980-11-06 | 1983-01-18 | Texas Instruments Incorporated | Process for etching sloped vias in polyimide insulators |
US4890157A (en) * | 1986-01-31 | 1989-12-26 | Texas Instruments Incorporated | Integrated circuit product having a polyimide film interconnection structure |
US4709468A (en) * | 1986-01-31 | 1987-12-01 | Texas Instruments Incorporated | Method for producing an integrated circuit product having a polyimide film interconnection structure |
JPS62266852A (ja) * | 1986-05-14 | 1987-11-19 | Mitsubishi Electric Corp | 半導体集積回路装置 |
JPS6442847A (en) * | 1987-08-10 | 1989-02-15 | Toshiba Corp | Lead frame |
JP2587074B2 (ja) * | 1987-12-25 | 1997-03-05 | 日東電工株式会社 | 半導体装置 |
US5070039A (en) * | 1989-04-13 | 1991-12-03 | Texas Instruments Incorporated | Method of making an integrated circuit using a pre-served dam bar to reduce mold flash and to facilitate flash removal |
US4916519A (en) * | 1989-05-30 | 1990-04-10 | International Business Machines Corporation | Semiconductor package |
JPH0320066A (ja) * | 1989-06-16 | 1991-01-29 | Matsushita Electron Corp | 半導体パッケージ部品 |
US5208188A (en) * | 1989-10-02 | 1993-05-04 | Advanced Micro Devices, Inc. | Process for making a multilayer lead frame assembly for an integrated circuit structure and multilayer integrated circuit die package formed by such process |
US4965654A (en) * | 1989-10-30 | 1990-10-23 | International Business Machines Corporation | Semiconductor package with ground plane |
US5313102A (en) * | 1989-12-22 | 1994-05-17 | Texas Instruments Incorporated | Integrated circuit device having a polyimide moisture barrier coating |
US5122858A (en) * | 1990-09-10 | 1992-06-16 | Olin Corporation | Lead frame having polymer coated surface portions |
EP0504634A3 (en) * | 1991-03-08 | 1994-06-01 | Japan Gore Tex Inc | Resin-sealed semiconductor device containing porous fluorocarbon resin |
JP2994171B2 (ja) * | 1993-05-11 | 1999-12-27 | 株式会社東芝 | 半導体装置の製造方法および封止用部材の製造方法 |
US5384690A (en) * | 1993-07-27 | 1995-01-24 | International Business Machines Corporation | Flex laminate package for a parallel processor |
US5429992A (en) * | 1994-05-25 | 1995-07-04 | Texas Instruments Incorporated | Lead frame structure for IC devices with strengthened encapsulation adhesion |
-
1995
- 1995-07-31 KR KR1019950023471A patent/KR0148080B1/ko not_active IP Right Cessation
- 1995-10-20 TW TW084111091A patent/TW288192B/zh not_active IP Right Cessation
- 1995-10-28 DE DE19540306A patent/DE19540306C1/de not_active Expired - Fee Related
- 1995-11-14 CN CN95119249A patent/CN1080931C/zh not_active Expired - Fee Related
- 1995-11-14 US US08/557,540 patent/US5633206A/en not_active Expired - Lifetime
- 1995-11-15 JP JP7296900A patent/JP2637715B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0945833A (ja) | 1997-02-14 |
CN1142122A (zh) | 1997-02-05 |
TW288192B (en) | 1996-10-11 |
KR0148080B1 (ko) | 1998-08-01 |
CN1080931C (zh) | 2002-03-13 |
DE19540306C1 (de) | 1996-11-28 |
US5633206A (en) | 1997-05-27 |
JP2637715B2 (ja) | 1997-08-06 |
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