KR970003813A - Field oxide film formation method of semiconductor device - Google Patents
Field oxide film formation method of semiconductor device Download PDFInfo
- Publication number
- KR970003813A KR970003813A KR1019950018547A KR19950018547A KR970003813A KR 970003813 A KR970003813 A KR 970003813A KR 1019950018547 A KR1019950018547 A KR 1019950018547A KR 19950018547 A KR19950018547 A KR 19950018547A KR 970003813 A KR970003813 A KR 970003813A
- Authority
- KR
- South Korea
- Prior art keywords
- oxide film
- field oxide
- semiconductor device
- etching
- film
- Prior art date
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- Local Oxidation Of Silicon (AREA)
Abstract
본 발명은 반도체 소자의 필드산화막 형성방법에 관한 것으로, 버즈빅의 발생을 최소화시키기 위하여 버즈빅(Bird's Beak)이 발생되는 부분의 질화막을 두껍게 형성하므로써 활성영역(Active Region)의 크기 감소를 방지할 수 있도록 한 반도체 소자의 필드산화막 형성방법에 관한 것이다.The present invention relates to a method of forming a field oxide film of a semiconductor device, and to reduce the size of an active region by forming a thick nitride film of a part where a bird's beak is generated in order to minimize the occurrence of a buzz beak. A method of forming a field oxide film of a semiconductor device is provided.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2E도는 본 발명에 따른 반도체 소자의 필드산화막 형성방법을 설명하기 위한 소자의 단면도.2E is a cross-sectional view of a device for explaining a method of forming a field oxide film in a semiconductor device according to the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950018547A KR970003813A (en) | 1995-06-30 | 1995-06-30 | Field oxide film formation method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950018547A KR970003813A (en) | 1995-06-30 | 1995-06-30 | Field oxide film formation method of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970003813A true KR970003813A (en) | 1997-01-29 |
Family
ID=66526580
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950018547A KR970003813A (en) | 1995-06-30 | 1995-06-30 | Field oxide film formation method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970003813A (en) |
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1995
- 1995-06-30 KR KR1019950018547A patent/KR970003813A/en not_active Application Discontinuation
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