KR960032580A - Reticle and manufacturing method of semiconductor device using same - Google Patents

Reticle and manufacturing method of semiconductor device using same Download PDF

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Publication number
KR960032580A
KR960032580A KR1019950002250A KR19950002250A KR960032580A KR 960032580 A KR960032580 A KR 960032580A KR 1019950002250 A KR1019950002250 A KR 1019950002250A KR 19950002250 A KR19950002250 A KR 19950002250A KR 960032580 A KR960032580 A KR 960032580A
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KR
South Korea
Prior art keywords
reticle
semiconductor device
manufacturing
alignment key
key pattern
Prior art date
Application number
KR1019950002250A
Other languages
Korean (ko)
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KR0144925B1 (en
Inventor
남인호
Original Assignee
김광호
삼성전자 주식회사
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Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950002250A priority Critical patent/KR0144925B1/en
Publication of KR960032580A publication Critical patent/KR960032580A/en
Application granted granted Critical
Publication of KR0144925B1 publication Critical patent/KR0144925B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

반도체 장치 제조에 사용되는 레티클(reticle) 및 그를 이용한 반도체장치 제조방법에 관하여 개시되어 있다. 반도체 장치를 제조하기 위한 사진공정에 사용되는 레티클(reticle)에 있어서, 하나의 레티클에 두가지 이상의 장비에 필요한 얼라인 키 패턴(align key pattern)을 구비한다. 사진공정시 두가지 이상의 장비를 호환성있게 사용할 수 있으므로, 각 장비의 특성을 살려서 특성 사진공정의 특징에 맞는 효율적인 공정 진행이 가능하다.A reticle used for manufacturing a semiconductor device and a method of manufacturing a semiconductor device using the same are disclosed. In a reticle used in a photographic process for manufacturing a semiconductor device, one reticle is provided with an alignment key pattern required for two or more pieces of equipment. Since two or more equipments can be used interchangeably in the photographing process, it is possible to proceed efficiently according to the characteristics of the characteristic photographing process by utilizing the characteristics of each equipment.

Description

레티클(reticle) 및 그를 이용한 반도체장치 제조방법Reticle and manufacturing method of semiconductor device using same

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제3도는 본 발명에 의한 레티클 형태의 일 실시로 Nikon사의 I-라인 스테퍼와 SVG사의 MSII를 호환성있게 사용하는 경우 얼라인 키 패턴을 도시한 레이아웃도.3 is a layout diagram showing an alignment key pattern in the case of using Nikon's I-line stepper and SVG's MSII in a reticle form according to the present invention.

제4도는 본 발명에 의한 레티클로 첫번째 사진공정을 진행한 경우 웨이퍼상에 형성되는 패턴을 도시한 개략도.4 is a schematic diagram showing a pattern formed on a wafer when the first photographic process is performed with the reticle according to the present invention.

Claims (4)

반도체 장치를 제조하기 위한 사진공정에 사용되는 레티클(reticle)에 있어서, 하나의 레티클에 두가지 이상의 장비에 필요한 얼라인 키 패턴(align key pattern)을 구비하는 것을 특징으로 하는 레티클.A reticle used in a photographic process for manufacturing a semiconductor device, wherein the reticle has an align key pattern required for two or more pieces of equipment in one reticle. 제1항에 있어서, 상기 얼라인 키 패턴은 스크라이브 라인 내에 형성된 것을 특징으로 하는 레티클.The reticle of claim 1, wherein the alignment key pattern is formed in a scribe line. 두가지 이상의 장비에 필요한 얼라인 키 패턴(align key pattern)을 구비하는 레티클을 사용하여 사진공정을 진행하여 웨이퍼상에 얼라인 키 패턴을 프린팅하고, 상기 프린팅된 여러종류의 얼라인 키패턴 중에서, 사용되는 장비에 적합한 얼라인 키 패턴을 적용하여 후속 사진공정을 진행하는 것을 특징으로 하는 반도제 장치 제조방법.Photographic process using a reticle having an alignment key pattern required for two or more pieces of equipment to print the alignment key pattern on the wafer, and among the various types of printed alignment key patterns Method of manufacturing a semiconductor device, characterized in that the subsequent photo process by applying an alignment key pattern suitable for the equipment. 제3항에 있어서, 상기 후속 사진공정시에 프린팅되는 칩의 방향이 이전 단계의 사진공정에서 프린팅되는 칩의 방향과 서로 다를 경우, 동일한 방향으로 프린팅하기 위해 웨이퍼 또는 레티클을 각각의 방향에 맞게 회전시키는 것을 특징으로 하는 반도체 장치 제조방법.The wafer or reticle of claim 3, wherein when the direction of the chip to be printed in the subsequent photographing process is different from the direction of the chip to be printed in the previous photographing process, the wafer or the reticle is rotated in each direction to print in the same direction. The semiconductor device manufacturing method characterized by the above-mentioned. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950002250A 1995-02-08 1995-02-08 Reticle and the manufacture method of semiconductor device using the same KR0144925B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950002250A KR0144925B1 (en) 1995-02-08 1995-02-08 Reticle and the manufacture method of semiconductor device using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950002250A KR0144925B1 (en) 1995-02-08 1995-02-08 Reticle and the manufacture method of semiconductor device using the same

Publications (2)

Publication Number Publication Date
KR960032580A true KR960032580A (en) 1996-09-17
KR0144925B1 KR0144925B1 (en) 1998-08-17

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KR1019950002250A KR0144925B1 (en) 1995-02-08 1995-02-08 Reticle and the manufacture method of semiconductor device using the same

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990021288A (en) * 1997-08-30 1999-03-25 윤종용 Reticle for Semiconductor Device Manufacturing
KR102203245B1 (en) 2017-11-01 2021-01-13 주식회사 엘지화학 Apparatus and method for estimating SOC of battery

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KR0144925B1 (en) 1998-08-17

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