KR940016646A - Alignment Testing Method - Google Patents
Alignment Testing Method Download PDFInfo
- Publication number
- KR940016646A KR940016646A KR1019920024499A KR920024499A KR940016646A KR 940016646 A KR940016646 A KR 940016646A KR 1019920024499 A KR1019920024499 A KR 1019920024499A KR 920024499 A KR920024499 A KR 920024499A KR 940016646 A KR940016646 A KR 940016646A
- Authority
- KR
- South Korea
- Prior art keywords
- testing method
- vernier
- bar
- wafer
- alignment testing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
본 발명은 포토마스크 공정 작업시 실시하는 얼라인먼트(alignment) 테스팅 방법에 관한 것으로, 특히 마스크 상에 CD바/버어니어(3)를 웨이퍼(5)의 스크라이브 라인(1)에 맞추어 정렬 되도록 형성하는 제 1 단계, 상기 제 1 단계 후에 노광기의 브레이드(4)를 사용하여 웨이퍼(5)에 상기 CD바/버어니어(3)만을 노광시키는 제 2 단계, 상기 제 2 단계 후에 상기 CD바/버어니어(3) 해당하는 웨이퍼(5) 지역만을 현상하는 제 3 단계를 포함하여 이루어지는 것을 특징으로 하는 얼라인먼트 테스팅 방법에 관한 것이다.TECHNICAL FIELD The present invention relates to an alignment testing method performed during a photomask processing operation, and in particular, an agent for forming a CD bar / vernier 3 on a mask to be aligned with the scribe line 1 of the wafer 5. Step 1, a second step of exposing only the CD bar / vernier 3 to the wafer 5 using the braid 4 of the exposure machine after the first step, and the CD bar / vernier after the second step ( 3) an alignment testing method comprising a third step of developing only a region of a corresponding wafer (5).
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제 2 도는 본 발명에 따른 얼라인먼트 테스팅 형성도.2 is an alignment testing formation diagram according to the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019920024499A KR960004643B1 (en) | 1992-12-16 | 1992-12-16 | Method of testing alignment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019920024499A KR960004643B1 (en) | 1992-12-16 | 1992-12-16 | Method of testing alignment |
Publications (2)
Publication Number | Publication Date |
---|---|
KR940016646A true KR940016646A (en) | 1994-07-23 |
KR960004643B1 KR960004643B1 (en) | 1996-04-11 |
Family
ID=19345783
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920024499A KR960004643B1 (en) | 1992-12-16 | 1992-12-16 | Method of testing alignment |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960004643B1 (en) |
-
1992
- 1992-12-16 KR KR1019920024499A patent/KR960004643B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR960004643B1 (en) | 1996-04-11 |
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