KR960027784U - 반도체 제조장치의 가스확산기구 - Google Patents

반도체 제조장치의 가스확산기구

Info

Publication number
KR960027784U
KR960027784U KR2019950000541U KR19950000541U KR960027784U KR 960027784 U KR960027784 U KR 960027784U KR 2019950000541 U KR2019950000541 U KR 2019950000541U KR 19950000541 U KR19950000541 U KR 19950000541U KR 960027784 U KR960027784 U KR 960027784U
Authority
KR
South Korea
Prior art keywords
gas diffusion
semiconductor manufacturing
manufacturing equipment
diffusion mechanism
equipment
Prior art date
Application number
KR2019950000541U
Other languages
English (en)
Other versions
KR0127584Y1 (ko
Inventor
김혜동
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950000541U priority Critical patent/KR0127584Y1/ko
Publication of KR960027784U publication Critical patent/KR960027784U/ko
Application granted granted Critical
Publication of KR0127584Y1 publication Critical patent/KR0127584Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
KR2019950000541U 1995-01-14 1995-01-14 반도체 제조장치의 가스확산기구 KR0127584Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950000541U KR0127584Y1 (ko) 1995-01-14 1995-01-14 반도체 제조장치의 가스확산기구

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950000541U KR0127584Y1 (ko) 1995-01-14 1995-01-14 반도체 제조장치의 가스확산기구

Publications (2)

Publication Number Publication Date
KR960027784U true KR960027784U (ko) 1996-08-17
KR0127584Y1 KR0127584Y1 (ko) 1998-12-01

Family

ID=19406722

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950000541U KR0127584Y1 (ko) 1995-01-14 1995-01-14 반도체 제조장치의 가스확산기구

Country Status (1)

Country Link
KR (1) KR0127584Y1 (ko)

Also Published As

Publication number Publication date
KR0127584Y1 (ko) 1998-12-01

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Legal Events

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E701 Decision to grant or registration of patent right
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Payment date: 20050621

Year of fee payment: 8

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