KR970046631U - 반도체 디바이스 제조장치의 가스 분사장치 - Google Patents

반도체 디바이스 제조장치의 가스 분사장치

Info

Publication number
KR970046631U
KR970046631U KR2019950052980U KR19950052980U KR970046631U KR 970046631 U KR970046631 U KR 970046631U KR 2019950052980 U KR2019950052980 U KR 2019950052980U KR 19950052980 U KR19950052980 U KR 19950052980U KR 970046631 U KR970046631 U KR 970046631U
Authority
KR
South Korea
Prior art keywords
gas injection
manufacturing equipment
semiconductor device
injection device
device manufacturing
Prior art date
Application number
KR2019950052980U
Other languages
English (en)
Other versions
KR200145605Y1 (ko
Inventor
조병길
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950052980U priority Critical patent/KR200145605Y1/ko
Publication of KR970046631U publication Critical patent/KR970046631U/ko
Application granted granted Critical
Publication of KR200145605Y1 publication Critical patent/KR200145605Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
KR2019950052980U 1995-12-29 1995-12-29 반도체 디바이스 제조장치의 가스 분사장치 KR200145605Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950052980U KR200145605Y1 (ko) 1995-12-29 1995-12-29 반도체 디바이스 제조장치의 가스 분사장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950052980U KR200145605Y1 (ko) 1995-12-29 1995-12-29 반도체 디바이스 제조장치의 가스 분사장치

Publications (2)

Publication Number Publication Date
KR970046631U true KR970046631U (ko) 1997-07-31
KR200145605Y1 KR200145605Y1 (ko) 1999-06-15

Family

ID=19442039

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950052980U KR200145605Y1 (ko) 1995-12-29 1995-12-29 반도체 디바이스 제조장치의 가스 분사장치

Country Status (1)

Country Link
KR (1) KR200145605Y1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990066468A (ko) * 1998-01-26 1999-08-16 윤종용 반도체 장치의 알루미늄 샤워 헤드

Also Published As

Publication number Publication date
KR200145605Y1 (ko) 1999-06-15

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